| Patent | Date |
|---|
Method and apparatus for optimizing an optical proximity correction model
Grant 7,788,609 - Kim , et al. August 31, 2 | 2010-08-31 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
Grant 7,657,864 - Tabery , et al. February 2, 2 | 2010-02-02 |
Method And Apparatus For Optimizing An Optical Proximity Correction Model
App 20090249261 - KIM; HUNG-EIL ; et al. | 2009-10-01 |
System and method for designing an integrated circuit device
Grant 7,543,256 - Lukanc , et al. June 2, 2 | 2009-06-02 |
Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin
Grant 7,313,769 - Lukanc , et al. December 25, 2 | 2007-12-25 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
Grant 7,269,804 - Tabery , et al. September 11, 2 | 2007-09-11 |
System And Method For Integrated Circuit Device Design And Manufacture Using Optical Rule Checking To Screen Resolution Enhancement Techniques
App 20070209030 - Tabery; Cyrus E. ; et al. | 2007-09-06 |
Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results
Grant 7,207,017 - Tabery , et al. April 17, 2 | 2007-04-17 |
System and method for design rule creation and selection
Grant 7,194,725 - Lukanc , et al. March 20, 2 | 2007-03-20 |
Method for evaluation of reticle image using aerial image simulator
Grant 7,120,285 - Spence October 10, 2 | 2006-10-10 |
Predefined critical spaces in IC patterning to reduce line end pull back
Grant 7,071,085 - Lukanc , et al. July 4, 2 | 2006-07-04 |
Device and method for determining an illumination intensity profile of an illuminator for a lithography system
Grant 7,027,130 - Spence , et al. April 11, 2 | 2006-04-11 |
Reduce line end pull back by exposing and etching space after mask one trim and etch
Grant 7,015,148 - Lukanc , et al. March 21, 2 | 2006-03-21 |
Semiconductor manufacturing resolution enhancement system and method for simultaneously patterning different feature types
Grant 6,994,939 - Ghandehari , et al. February 7, 2 | 2006-02-07 |
Lithographic photomask and method of manufacture to improve photomask test measurement
Grant 6,974,652 - Lukanc , et al. December 13, 2 | 2005-12-13 |
Device and method for determining an illumination intensity profile of an illuminator for a lithography system
App 20050243299 - Spence, Christopher A. ; et al. | 2005-11-03 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
App 20050229125 - Tabery, Cyrus E. ; et al. | 2005-10-13 |
Method of extending the areas of clear field phase shift generation
Grant 6,818,358 - Lukanc , et al. November 16, 2 | 2004-11-16 |
Method and enhancing clear field phase shift masks with border around edges of phase regions
Grant 6,797,438 - Lukanc , et al. September 28, 2 | 2004-09-28 |
Method of enhancing clear field phase shift masks with chrome border around phase 180 regions
Grant 6,749,971 - Lukanc , et al. June 15, 2 | 2004-06-15 |
Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions
Grant 6,749,970 - Lukanc , et al. June 15, 2 | 2004-06-15 |
Method of enhancing clear field phase shift masks with chrome border around phase 180 regions
App 20040023123 - Lukanc, Todd P. ; et al. | 2004-02-05 |
Method of enhancing clear field phase shift masks with border regions around phase 0 and phase 180 regions
App 20040009407 - Lukanc, Todd P. ; et al. | 2004-01-15 |
Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region
Grant 6,675,369 - Lukanc , et al. January 6, 2 | 2004-01-06 |
Method of and system for improving stability of photomasks
Grant 6,627,355 - Levinson , et al. September 30, 2 | 2003-09-30 |
Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansion
Grant 6,492,066 - Capodieci , et al. December 10, 2 | 2002-12-10 |
Method of and system for improving stability of photomasks
App 20020132171 - Levinson, Harry J. ; et al. | 2002-09-19 |
Piezo programmable reticle for EUV lithography
Grant 6,356,340 - Spence March 12, 2 | 2002-03-12 |
Mask quality measurements by fourier space analysis
Grant 6,187,483 - Capodieci , et al. February 13, 2 | 2001-02-13 |
Minimizing transistor size in integrated circuits
Grant 6,146,954 - Klein , et al. November 14, 2 | 2000-11-14 |
Forming local interconnects in integrated circuits
Grant 6,051,881 - Klein , et al. April 18, 2 | 2000-04-18 |
Method for self-aligning polysilicon gates with field isolation and the resultant structure
Grant 6,046,088 - Klein , et al. April 4, 2 | 2000-04-04 |
Attenuated phase shift mask
Grant 5,928,813 - Krivokapic , et al. July 27, 1 | 1999-07-27 |
Method of optical lithography using phase shift masking
Grant 5,766,806 - Spence June 16, 1 | 1998-06-16 |
Method of optical lithography using phase shift masking
Grant 5,766,804 - Spence June 16, 1 | 1998-06-16 |
Mask for optical lithography using phase shift masking and integrated circuit produced therefrom
Grant 5,702,848 - Spence December 30, 1 | 1997-12-30 |
Attenuated phase shift mask comprising phase shifting layer with parabolically shaped sidewalls
Grant 5,601,954 - Krivokapic , et al. February 11, 1 | 1997-02-11 |
Method of optical lithography using phase shift masking
Grant 5,573,890 - Spence November 12, 1 | 1996-11-12 |
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