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Patent applications and USPTO patent grants for Spaziano; Gregory.The latest application filed is for "device manufacturing process utilizing a double patterning process".
Patent | Date |
---|---|
Device manufacturing process utilizing a double patterning process App 20080199814 - Brzozowy; Dave ;   et al. | 2008-08-21 |
Photosensitive bilayer composition Grant 6,929,897 - Foster , et al. August 16, 2 | 2005-08-16 |
Thermally cured underlayer for lithographic application Grant 6,924,339 - De , et al. August 2, 2 | 2005-08-02 |
Novel photosensitive bilayer composition App 20050042542 - Foster, Patrick ;   et al. | 2005-02-24 |
Thermally cured underlayer for lithographic application App 20030204035 - De, Binod B. ;   et al. | 2003-10-30 |
Thermally cured underlayer for lithographic application Grant 6,610,808 - De , et al. August 26, 2 | 2003-08-26 |
Novel beta-oxo compounds and their use in photoresist App 20030078354 - Medina, Art ;   et al. | 2003-04-24 |
Free-acid containing polymers and their use in photoresists App 20030064321 - Malik, Sanjay ;   et al. | 2003-04-03 |
Thermally cured underlayer for lithographic application App 20020173594 - De, Binod B. ;   et al. | 2002-11-21 |
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