Soyano; Akimasa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Soyano; Akimasa.The latest application filed is for "radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound".

Company Profile

0.8.12

Soyano; Akimasa - Tokyo JP
Soyano; Akimasa - Mie JP
Soyano; Akimasa - Rotselaar BE
Soyano; Akimasa - Yokkaichi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound Grant 9,261,780 - Asano , et al. February 16, 2	2016-02-16
Radiation-sensitive resin composition Grant 8,916,333 - Tomioka , et al. December 23, 2	2014-12-23
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, And Polymer And Compound App 20140004463 - Asano; Yusuke ; et al.	2014-01-02
Radiation-sensitive resin composition, polymer, and compound Grant 8,507,575 - Matsumura , et al. August 13, 2	2013-08-13
Radiation-sensitive Resin Composition, Method For Forming Resist Pattern, And Polymer And Compound App 20130143160 - Asano; Yusuke ; et al.	2013-06-06
Radiation-sensitive Resin Composition App 20130022926 - Tomioka; Hiroshi ; et al.	2013-01-24
Radiation-sensitive Resin Composition, Polymer, And Compound App 20120065291 - Matsumura; Nobuji ; et al.	2012-03-15
Radiation-sensitive Resin Composition For Liquid Immersion Lithography, Polymer, And Resist Pattern-forming Method App 20110151378 - MATSUMURA; Nobuji ; et al.	2011-06-23
Radiation-sensitive Resin Composition App 20110143279 - SHIMOKAWA; Tsutomu ; et al.	2011-06-16
Photoresist polymer compositions Grant 7,510,817 - Benoit , et al. March 31, 2	2009-03-31
Watermark Defect Reduction By Resist Optimization App 20080213689 - Kocsis; Michael ; et al.	2008-09-04
Photoresist polymer compositions App 20060257781 - Benoit; Didier ; et al.	2006-11-16
Radiation-sensitive resin composition Grant 6,800,419 - Soyano , et al. October 5, 2	2004-10-05
Radiation-sensitive resin composition App 20030203307 - Soyano, Akimasa ; et al.	2003-10-30
Radiation-sensitive resin composition Grant 6,623,907 - Numata , et al. September 23, 2	2003-09-23
Radiation-sensitive resin composition App 20010023050 - Numata, Jun ; et al.	2001-09-20

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