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name:-0.015125036239624
name:-0.0018689632415771
name:-0.012938976287842
Soundararajan; Hari Patent Filings

Soundararajan; Hari

Patent Applications and Registrations

Patent applications and USPTO patent grants for Soundararajan; Hari.The latest application filed is for "insulated fluid lines in chemical mechanical polishing".

Company Profile
16.1.20
  • Soundararajan; Hari - Sunnyvale CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Steam treatment stations for chemical mechanical polishing system
Grant 11,446,711 - Wu , et al. September 20, 2
2022-09-20
Insulated Fluid Lines In Chemical Mechanical Polishing
App 20220282807 - Pollard; Chad ;   et al.
2022-09-08
Apparatus And Method For Cmp Temperature Control
App 20210402555 - Kumar; Surajit ;   et al.
2021-12-30
Control Of Steam Generation For Chemical Mechanical Polishing
App 20210402554 - Soundararajan; Hari ;   et al.
2021-12-30
Temperature And Slurry Flow Rate Control In Cmp
App 20210402553 - Wu; Haosheng ;   et al.
2021-12-30
Slurry Temperature Control By Mixing At Dispensing
App 20210046603 - Wu; Haosheng ;   et al.
2021-02-18
Low-temperature Metal Cmp For Minimizing Dishing And Corrosion, And Improving Pad Asperity
App 20210046602 - Wu; Haosheng ;   et al.
2021-02-18
Apparatus And Method For Cmp Temperature Control
App 20210046604 - Wu; Haosheng ;   et al.
2021-02-18
Steam Generation For Chemical Mechanical Polishing
App 20200406310 - Soundararajan; Hari ;   et al.
2020-12-31
Steam Cleaning Of Cmp Components
App 20200376522 - Wu; Haosheng ;   et al.
2020-12-03
Use Of Steam For Pre-heating Of Cmp Components
App 20200376626 - Wu; Haosheng ;   et al.
2020-12-03
Steam Treatment Stations For Chemical Mechanical Polishing System
App 20200376523 - Wu; Haosheng ;   et al.
2020-12-03
Temperature-based In-situ Edge Assymetry Correction During Cmp
App 20200331114 - Wu; Haosheng ;   et al.
2020-10-22
Temperature-based Assymetry Correction During Cmp And Nozzle For Media Dispensing
App 20200331117 - Wu; Haosheng ;   et al.
2020-10-22
Chemical Mechanical Polishing Temperature Scanning Apparatus For Temperature Control
App 20200331113 - Soundararajan; Hari ;   et al.
2020-10-22
Apparatus and Method for CMP Temperature Control
App 20200262024 - Chang; Shou-Sung ;   et al.
2020-08-20
Temperature Control of Chemical Mechanical Polishing
App 20200001427 - Soundararajan; Hari ;   et al.
2020-01-02
Temperature Control of Chemical Mechanical Polishing
App 20200001426 - Soundararajan; Hari ;   et al.
2020-01-02
Temperature Control of Chemical Mechanical Polishing
App 20190143476 - Wu; Haosheng ;   et al.
2019-05-16

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