Sooriyakumaran; Ratnam

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sooriyakumaran; Ratnam.The latest application filed is for "multifunctional polymers".

Company Profile

3.129.97

Sooriyakumaran; Ratnam - San Jose CA
Sooriyakumaran; Ratnam - SanJose CA
Sooriyakumaran; Ratnam - Fishkill NY
Sooriyakumaran; Ratnam - East Fishkill NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Multifunctional Polymers App 20200278607 - Bozano; Luisa D. ; et al.	2020-09-03
Negative-tone resist compositions and multifunctional polymers therein Grant 10,345,700 - Bozano , et al. July 9, 2	2019-07-09
Adhesive resins for wafer bonding Grant 10,174,229 - Allen , et al. J	2019-01-08
Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators Grant 9,983,475 - Ishimaru , et al. May 29, 2	2018-05-29
Non-ionic low diffusing photo-acid generators Grant 9,950,999 - Ishimaru , et al. April 24, 2	2018-04-24
Non-ionic aryl ketone based polymeric photo-acid generators Grant 9,951,164 - Ishimaru , et al. April 24, 2	2018-04-24
Adhesive Resins For Wafer Bonding App 20180072926 - ALLEN; ROBERT D. ; et al.	2018-03-15
Fluorinated Sulfonate Esters Of Aryl Ketones For Non-ionic Photo-acid Generators App 20180046077 - Ishimaru; Takehisa ; et al.	2018-02-15
Non-ionic Low Diffusing Photo-acid Generators App 20180044284 - Ishimaru; Takehisa ; et al.	2018-02-15
Non-ionic Aryl Ketone Based Polymeric Photo-acid Generators App 20180044459 - Ishimaru; Takehisa ; et al.	2018-02-15
Adhesive resins for wafer bonding Grant 9,850,406 - Allen , et al. December 26, 2	2017-12-26
Wet strippable gap fill materials Grant 9,671,694 - Glodde , et al. June 6, 2	2017-06-06
Composite membranes and methods of preparation thereof Grant 9,579,608 - Na , et al. February 28, 2	2017-02-28
Composite membrane with multi-layered active layer Grant 9,504,967 - Allen , et al. November 29, 2	2016-11-29
Composite filtration membranes and methods of preparation thereof Grant 9,352,286 - Na , et al. May 31, 2	2016-05-31
Acid-strippable silicon-containing antireflective coating Grant 9,348,228 - Glodde , et al. May 24, 2	2016-05-24
Adhesive Resins For Wafer Bonding App 20160133499 - ALLEN; ROBERT D. ; et al.	2016-05-12
Dielectric tone inversion materials Grant 9,337,033 - Glodde , et al. May 10, 2	2016-05-10
Thin film composite membranes embedded with molecular cage compounds Grant 9,333,465 - Diep , et al. May 10, 2	2016-05-10
Dielectric Tone Inversion Materials App 20160126097 - Glodde; Martin ; et al.	2016-05-05
Negative-tone Resist Compositions And Multifunctional Polymers Therein App 20160070169 - Bozano; Luisa D. ; et al.	2016-03-10
Dielectric tone inversion materials Grant 9,281,212 - Glodde , et al. March 8, 2	2016-03-08
Non-ionic photo-acid generating polymers for resist applications Grant 9,244,345 - Ishimaru , et al. January 26, 2	2016-01-26
Chemically amplified negative resist composition and pattern forming process Grant 9,244,348 - Masunaga , et al. January 26, 2	2016-01-26
Planarization over topography with molecular glass materials Grant 9,235,124 - Allen , et al. January 12, 2	2016-01-12
Composite Membranes And Methods Of Preparation Thereof App 20150202575 - Na; Young-Hye ; et al.	2015-07-23
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20150189743 - Allen; Robert D. ; et al.	2015-07-02
Composite membranes and methods of preparation thereof Grant 9,022,227 - Na , et al. May 5, 2	2015-05-05
Photo-patternable dielectric materials and formulations and methods of use Grant 9,012,587 - Allen , et al. April 21, 2	2015-04-21
Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof Grant 9,006,373 - Brock , et al. April 14, 2	2015-04-14
Silicon-containing antireflective coatings including non-polymeric silsesquioxanes Grant 8,999,625 - Glodde , et al. April 7, 2	2015-04-07
Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof Grant 8,981,031 - Miller , et al. March 17, 2	2015-03-17
Self-topcoating resist for photolithography Grant 8,945,808 - David , et al. February 3, 2	2015-02-03
Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof Grant 8,946,371 - Brock , et al. February 3, 2	2015-02-03
Thin Film Composite Membranes Embedded With Molecular Cage Compounds App 20150021262 - Diep; Jacquana T. ; et al.	2015-01-22
Interconnect structure and method of fabricating Grant 8,916,978 - Lin , et al. December 23, 2	2014-12-23
Composite Membrane With Multi-layered Active Layer App 20140353253 - Allen; Robert David ; et al.	2014-12-04
Thin film composite membranes embedded with molecular cage compounds Grant 8,895,104 - Na , et al. November 25, 2	2014-11-25
Composite membrane with multi-layered active layer Grant 8,857,629 - Allen , et al. October 14, 2	2014-10-14
Silicon-containing Antireflective Coatings Including Non-polymeric Silsesquioxanes App 20140227641 - Glodde; Martin ; et al.	2014-08-14
Water-dispersible electrically conductive fluorine-containing polyaniline compositions for lithography Grant 8,802,351 - Bozano , et al. August 12, 2	2014-08-12
Silicon containing coating compositions and methods of use Grant 8,802,347 - Allen , et al. August 12, 2	2014-08-12
Composite Filtration Membranes And Methods Of Preparation Thereof App 20140217014 - Na; Young-Hye ; et al.	2014-08-07
Acid-strippable Silicon-containing Antireflective Coating App 20140186774 - Glodde; Martin ; et al.	2014-07-03
Polyamide membranes with fluoroalcohol functionality Grant 8,754,139 - Allen , et al. June 17, 2	2014-06-17
Methods of forming topographical features using segregating polymer mixtures Grant 8,734,904 - Cheng , et al. May 27, 2	2014-05-27
Composite filtration membranes and methods of preparation thereof Grant 8,727,135 - Cheng , et al. May 20, 2	2014-05-20
Composite filtration membranes and methods of preparation thereof Grant 8,709,536 - Na , et al. April 29, 2	2014-04-29
Water-dispersible Electrically Conductive Fluorine-containing Polyaniline Compositions For Lithography App 20140038104 - Bozano; Luisa Dominica ; et al.	2014-02-06
Poly-oxycarbosilane compositions for use in imprint lithography Grant 8,617,786 - Dipietro , et al. December 31, 2	2013-12-31
Organic Solvent Developable Photoresist Composition App 20130344441 - SOORIYAKUMARAN; RATNAM ; et al.	2013-12-26
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials Grant 8,603,584 - Allen , et al. December 10, 2	2013-12-10
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20130292163 - Allen; Robert David ; et al.	2013-11-07
Fluoroalcohol containing molecular photoresist materials and processes of use Grant 8,530,136 - Bozano , et al. September 10, 2	2013-09-10
Chemically Amplified Negative Resist Composition And Pattern Forming Process App 20130209922 - MASUNAGA; Keiichi ; et al.	2013-08-15
Photo-patternable Dielectric Materials Curable To Porous Dielectric Materials, Formulations, Precursors And Methods Of Use Thereof App 20130207278 - Brock; Phillip J. ; et al.	2013-08-15
Photo-patternable Dielectric Materials Curable To Porous Dielectric Materials, Formulations, Precursors And Methods Of Use Thereof App 20130197253 - Miller; Robert D. ; et al.	2013-08-01
Photo-patternable Dielectric Materials Curable To Porous Dielectric Materials, Formulations, Precursors And Methods Of Use Thereof App 20130189836 - Brock; Phillip J. ; et al.	2013-07-25
Methods for aligning polymer films and related structures Grant 8,486,489 - Cheng , et al. July 16, 2	2013-07-16
Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles Grant 8,470,516 - Allen , et al. June 25, 2	2013-06-25
Planarization Over Topography With Molecular Glass Materials App 20130125787 - Allen; Robert D. ; et al.	2013-05-23
Photo-patternable dielectric materials and formulations and methods of use Grant 8,431,670 - Allen , et al. April 30, 2	2013-04-30
Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof Grant 8,389,663 - Brock , et al. March 5, 2	2013-03-05
Planarization over topography with molecular glass materials Grant 8,377,631 - Allen , et al. February 19, 2	2013-02-19
Polymeric films made from polyhedral oligomeric silsesquioxane (POSS) and a hydrophilic comonomer Grant 8,353,410 - Allen , et al. January 15, 2	2013-01-15
Interconnect Structure And Method Of Fabricating App 20130009323 - Lin; Qinghuang ; et al.	2013-01-10
Thin Film Composite Membranes Embedded With Molecular Cage Compounds App 20130001153 - Na; Young-Hye ; et al.	2013-01-03
Interconnect structure and method of fabricating Grant 8,334,203 - Lin , et al. December 18, 2	2012-12-18
Functionalized carbosilane polymers and photoresist compositions containing the same Grant 8,334,088 - Allen , et al. December 18, 2	2012-12-18
Composite Membranes And Methods Of Preparation Thereof App 20120241373 - Na; Young-Hye ; et al.	2012-09-27
Fluoroalcohol Containing Molecular Photoresist Materials and Processes of Use App 20120156611 - Bozano; Luisa D. ; et al.	2012-06-21
Methods Of Forming Topographical Features Using Segregating Polymer Mixtures App 20120135146 - Cheng; Joy ; et al.	2012-05-31
Low activation energy photoresist composition and process for its use Grant 8,168,366 - Allen , et al. May 1, 2	2012-05-01
Composite Filtration Membranes And Methods Of Preparation Thereof App 20120048798 - Cheng; Joy ; et al.	2012-03-01
Composite Filtration Membranes And Methods Of Preparation Thereof App 20120048799 - Na; Young-Hye ; et al.	2012-03-01
Composite Membrane With Multi-layered Active Layer App 20120012527 - Allen; Robert David ; et al.	2012-01-19
Interconnect Structure And Method Of Fabricating App 20110304053 - Lin; Qinghuang ; et al.	2011-12-15
Polyhedral Oligomeric Silsesquioxane Based Imprint Materials And Imprint Process Using Polyhedral Oligomeric Silsesquioxane Based Imprint Materials App 20110256713 - Allen; Robert David ; et al.	2011-10-20
High contact angle topcoat material and use thereof in lithography process Grant 8,034,532 - Allen , et al. October 11, 2	2011-10-11
Photopatternable dielectric materials for BEOL applications and methods for use Grant 8,029,971 - Allen , et al. October 4, 2	2011-10-04
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials Grant 8,026,293 - Allen , et al. September 27, 2	2011-09-27
Composite membranes with performance enhancing layers Grant 8,011,517 - Allen , et al. September 6, 2	2011-09-06
Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films Grant 7,989,026 - Cheng , et al. August 2, 2	2011-08-02
Poly-oxycarbosilane Compositions For Use In Imprint Lithography App 20110136928 - Dipietro; Richard Anthony ; et al.	2011-06-09
Low outgassing photoresist compositions Grant 7,951,525 - DiPietro , et al. May 31, 2	2011-05-31
Self-topcoating photoresist for photolithography Grant 7,951,524 - Allen , et al. May 31, 2	2011-05-31
Polymeric Films Made From Polyhedral Oligomeric Silsesquioxane (poss) And A Hydrophilic Comonomer App 20110120940 - Allen; Robert David ; et al.	2011-05-26
Composite Membranes With Performance Enhancing Layers App 20110120941 - Allen; Robert David ; et al.	2011-05-26
Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures Grant 7,944,055 - Allen , et al. May 17, 2	2011-05-17
Silicon Containing Coating Compositions And Methods Of Use App 20110111345 - Allen; Robert D. ; et al.	2011-05-12
Method of step-and-flash imprint lithography Grant 7,927,664 - Dipietro , et al. April 19, 2	2011-04-19
Photo-patternable Dielectric Materials Curable To Porous Dielectric Materials, Formulations, Precursors And Methods Of Use Thereof App 20110083887 - Brock; Phillip Joe ; et al.	2011-04-14
Planarization Over Topography With Molecular Glass Materials App 20110079579 - Allen; Robert D. ; et al.	2011-04-07
Photopatternable dielectric materials for BEOL applications and methods for use Grant 7,919,225 - Allen , et al. April 5, 2	2011-04-05
Photoresist topcoat for a photolithographic process Grant 7,910,290 - Allen , et al. March 22, 2	2011-03-22
Aligning polymer films Grant 7,906,031 - Cheng , et al. March 15, 2	2011-03-15
Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition Grant 7,901,864 - Huang , et al. March 8, 2	2011-03-08
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20110048787 - Allen; Robert David ; et al.	2011-03-03
Method of Forming a Relief Pattern by E-Beam Lithography Using Chemical Amplification, and Derived Articles App 20110045387 - Allen; Robert D. ; et al.	2011-02-24
Functionalized Carbosilane Polymers and Photoresist Compositions Containing the Same App 20110045407 - Allen; Robert D. ; et al.	2011-02-24
Functionalized carbosilane polymers and photoresist compositions containing the same Grant 7,883,828 - Allen , et al. February 8, 2	2011-02-08
Low Activation Energy Photoresist Composition and Process for Its Use App 20110008727 - Allen; Robert David ; et al.	2011-01-13
Method of use for photopatternable dielectric materials for BEOL applications Grant 7,867,689 - Allen , et al. January 11, 2	2011-01-11
Functionalized carbosilane polymers and photoresist compositions containing the same Grant 7,824,845 - Allen , et al. November 2, 2	2010-11-02
Method for patterning a low activation energy photoresist Grant 7,820,369 - Allen , et al. October 26, 2	2010-10-26
Interfacial Polymerization Methods For Making Fluoroalcohol-containing Polyamides App 20100216967 - Allen; Robert David ; et al.	2010-08-26
Polyamide Membranes With Fluoroalcohol Functionality App 20100216899 - Allen; Robert David ; et al.	2010-08-26
Spin-on Antireflective Coating For Integration Of Patternable Dielectric Materials And Interconnect Structures App 20100207276 - Allen; Robert D. ; et al.	2010-08-19
Low activation energy dissolution modification agents for photoresist applications Grant 7,759,044 - Allen , et al. July 20, 2	2010-07-20
Patternable low dielectric constant materials and their use in ULSI interconnection Grant 7,714,079 - Lin , et al. May 11, 2	2010-05-11
Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures Grant 7,709,370 - Allen , et al. May 4, 2	2010-05-04
Photopatternable Dielectric Materials For Beol Applications And Methods For Use App 20090291389 - Allen; Robert D. ; et al.	2009-11-26
Low blur molecular resist Grant 7,622,240 - Sooriyakumaran , et al. November 24, 2	2009-11-24
Photopatternable Dielectric Materials For Beol Applications And Methods For Use App 20090233226 - Allen; Robert D. ; et al.	2009-09-17
Methods For Aligning Polymer Films And Related Structures App 20090214823 - Cheng; Joy ; et al.	2009-08-27
Aligning polymer films App 20090212016 - Cheng; Joy ; et al.	2009-08-27
Negative resists based on acid-catalyzed elimination of polar molecules Grant 7,563,558 - Allen , et al. July 21, 2	2009-07-21
Method Of Use Of Epoxy-containing Cycloaliphatic Acrylic Polymers As Orientation Control Layers For Block Copolymer Thin Films App 20090179001 - Cheng; Joy ; et al.	2009-07-16
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions Grant 7,550,254 - Sooriyakumaran , et al. June 23, 2	2009-06-23
Topcoat material and use thereof in immersion lithography processes Grant 7,521,172 - David , et al. April 21, 2	2009-04-21
Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films Grant 7,521,090 - Cheng , et al. April 21, 2	2009-04-21
Spin-on Antireflective Coating For Integration Of Patternable Dielectric Materials And Interconnect Structures App 20090081418 - Allen; Robert D. ; et al.	2009-03-26
Functionalized Carbosilane Polymers And Photoresist Compositions Containing The Same App 20090081585 - Allen; Robert D. ; et al.	2009-03-26
Functionalized Carbosilane Polymers And Photoresist Compositions Containing The Same App 20090081598 - Allen; Robert D. ; et al.	2009-03-26
Functionalized Carbosilane Polymers And Photoresist Compositions Containing The Same App 20090081579 - Allen; Robert D. ; et al.	2009-03-26
Functionalized Carbosilane Polymers And Photoresist Compositions Containing The Same App 20090081597 - Allen; Robert D. ; et al.	2009-03-26
Low activation energy photoresist composition and process for its use Grant 7,476,492 - Allen , et al. January 13, 2	2009-01-13
Photoresist Topcoat For A Photolithographic Process App 20090011377 - Allen; Robert David ; et al.	2009-01-08
Imprint process using polyhedral oligomeric silsesquioxane based imprint materials Grant 7,468,330 - Allen , et al. December 23, 2	2008-12-23
Method Of Use For Photopatternable Dielectric Materials For Beol Applications App 20080286467 - Allen; Robert D. ; et al.	2008-11-20
Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules App 20080233517 - Allen; Robert David ; et al.	2008-09-25
Self-topcoating Photoresist For Photolithography App 20080193879 - Allen; Robert ; et al.	2008-08-14
Photoresist topcoat for a photolithographic process Grant 7,399,581 - Allen , et al. July 15, 2	2008-07-15
Polyhedral Oligomeric Silsesquioxane Based Imprint Materials And Imprint Process Using Polyhedral Oligomeric Silsesquioxane Based Imprint Materials App 20080166871 - Allen; Robert David ; et al.	2008-07-10
Negative resists based on acid-catalyzed elimination of polar molecules Grant 7,393,624 - Allen , et al. July 1, 2	2008-07-01
Low Activation Energy Dissolution Modification Agents For Photoresist Applications App 20080153034 - Allen; Robert David ; et al.	2008-06-26
Low activation energy dissolution modification agents for photoresist applications Grant 7,358,029 - Allen , et al. April 15, 2	2008-04-15
Patternable Low Dielectric Constant Materials And Their Use In Ulsi Interconnection App 20080063880 - Lin; Qinghuang ; et al.	2008-03-13
Compositions Comprising Poly-oxycarbosilane and Methods for Their Use in Imprint Lithography App 20080050530 - Dipietro; Richard Anthony ; et al.	2008-02-28
Patternable low dielectric constant materials and their use in ULSI interconnection Grant 7,306,853 - Lin , et al. December 11, 2	2007-12-11
Low activation energy photoresist composition and process for its use App 20070275324 - Allen; Robert David ; et al.	2007-11-29
Negative resists based on a acid-catalyzed elimination of polar molecules Grant 7,300,739 - Allen , et al. November 27, 2	2007-11-27
Negative resists based on acid-catalyzed elimination of polar molecules App 20070259274 - Allen; Robert David ; et al.	2007-11-08
Self-topcoating Resist For Photolithography App 20070254235 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
Topcoat Material And Use Thereof In Immersion Lithography Processes App 20070254237 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
High Contact Angle Topcoat Material And Use Thereof In Lithography Process App 20070254236 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
Polyhedral oligomeric silsesquioxane based imprint materials and imprint process using polyhedral oligomeric silsesquioxane based imprint materials App 20070238317 - Allen; Robert David ; et al.	2007-10-11
Low activation energy dissolution modification agents for photoresist applications App 20070231734 - Allen; Robert David ; et al.	2007-10-04
Silicon-containing compositions for spin-on ARC/hardmask materials Grant 7,270,931 - Angelopoulos , et al. September 18, 2	2007-09-18
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions App 20070202440 - Sooriyakumaran; Ratnam ; et al.	2007-08-30
Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions Grant 7,261,992 - Sooriyakumaran , et al. August 28, 2	2007-08-28
Low activation energy photoresists Grant 7,193,023 - Allen , et al. March 20, 2	2007-03-20
Negative Resists Based On A Acid-catalyzed Elimination Of Polar Molecules App 20070026339 - Allen; Robert David ; et al.	2007-02-01
Molecular photoresists containing nonpolymeric silsesquioxanes Grant 7,141,692 - Allen , et al. November 28, 2	2006-11-28
Photoresist composition Grant 7,135,595 - Allen , et al. November 14, 2	2006-11-14
Low blur molecular resist App 20060194144 - Sooriyakumaran; Ratnam ; et al.	2006-08-31
Photoresist topcoat for a photolithographic process App 20060189779 - Allen; Robert David ; et al.	2006-08-24
photoresist composition App 20060128914 - Allen; Robert David ; et al.	2006-06-15
Patternable low dielectric constant materials and their use in ULSI interconnection App 20060105181 - Lin; Qinghuang ; et al.	2006-05-18
Patternable low dielectric constant materials and their use in ULSI interconnection Grant 7,041,748 - Lin , et al. May 9, 2	2006-05-09
Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition App 20060063103 - Huang; Wu-Song ; et al.	2006-03-23
Photoresist composition Grant 7,014,980 - Allen , et al. March 21, 2	2006-03-21
Low-activation energy silicon-containing resist system Grant 6,939,664 - Huang , et al. September 6, 2	2005-09-06
Underlayer compositions for multilayer lithographic processes Grant 6,927,015 - Khojasteh , et al. August 9, 2	2005-08-09
Method for patterning a low activation energy photoresist App 20050123852 - Allen, Robert David ; et al.	2005-06-09
Low activation energy photoresists App 20050124774 - Allen, Robert David ; et al.	2005-06-09
Molecular photoresists containing nonpolymeric silsesquioxanes App 20050112382 - Allen, Robert David ; et al.	2005-05-26
Silicon-containing resist systems with cyclic ketal protecting groups App 20050106494 - Huang, Wu-Song ; et al.	2005-05-19
Low-activation Energy Silicon-containing Resist System App 20050089792 - Huang, Wu-Song ; et al.	2005-04-28
Photoresist composition App 20050019696 - Allen, Robert David ; et al.	2005-01-27
Underlayer compositions for multilayer lithographic processes App 20050019704 - Khojasteh, Mahmoud M. ; et al.	2005-01-27
Underlayer compositions for multilayer lithographic processes Grant 6,818,381 - Khojasteh , et al. November 16, 2	2004-11-16
Photoresist composition Grant 6,806,026 - Allen , et al. October 19, 2	2004-10-19
Modified polycyclic polymers Grant 6,794,459 - Jayaraman , et al. September 21, 2	2004-09-21
Low silicon-outgassing resist for bilayer lithography Grant 6,770,419 - Khojasteh , et al. August 3, 2	2004-08-03
Patternable low dielectric constsnt materials and their use in ULSI interconnection App 20040137241 - Lin, Qinghuang ; et al.	2004-07-15
Antireflective SiO-containing compositions for hardmask layer Grant 6,730,454 - Pfeiffer , et al. May 4, 2	2004-05-04
Low silicon-outgassing resist for bilayer lithography App 20040048187 - Khojasteh, Mahmoud M. ; et al.	2004-03-11
Photoresist composition App 20030224283 - Allen, Robert David ; et al.	2003-12-04
High silicon content monomers and polymers suitable for 193 nm bilayer resists Grant 6,653,048 - Brock , et al. November 25, 2	2003-11-25
Antireflective SiO-containing compositions for hardmask layer App 20030198877 - Pfeiffer, Dirk ; et al.	2003-10-23
Process for using bilayer photoresist Grant RE38,282 - Allen , et al. October 21, 2	2003-10-21
Modified polycyclic polymers App 20030018153 - Jayaraman, Saikumar ; et al.	2003-01-23
Modified polycyclic polymers Grant 6,451,945 - Jayaraman , et al. September 17, 2	2002-09-17
High silicon content monomers and polymers suitable for 193 nm bilayer resists App 20020127490 - Brock, Phillip Joe ; et al.	2002-09-12
High silicon content monomers and polymers suitable for 193 nm bilayer resists Grant 6,444,408 - Brock , et al. September 3, 2	2002-09-03
Norbornene sulfonamide polymers Grant 6,420,503 - Jayaraman , et al. July 16, 2	2002-07-16
Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications App 20020090572 - Sooriyakumaran, Ratnam ; et al.	2002-07-11
Substantially transparent aqueous base soluble polymer system for use in 157 nm resist applications App 20020081520 - Sooriyakumaran, Ratnam ; et al.	2002-06-27
Underlayer compositions for multilayer lithographic processes App 20020058204 - Khojasteh, Mahmoud M. ; et al.	2002-05-16
Process for imaging of photoresist Grant 6,277,546 - Breyta , et al. August 21, 2	2001-08-21
Lithographic photoresist composition and process for its use in the manufacture of integrated circuits Grant 6,165,678 - Allen , et al. December 26, 2	2000-12-26
Polycyclic resist compositions with increased etch resistance Grant 6,147,177 - Jayaraman , et al. November 14, 2	2000-11-14
Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method Grant 6,087,064 - Lin , et al. July 11, 2	2000-07-11
Process for using bilayer photoresist Grant 5,985,524 - Allen , et al. November 16, 1	1999-11-16
Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent Grant 5,962,184 - Allen , et al. October 5, 1	1999-10-05
Making of microlithographic structures with an underlayer film containing a thermolyzed azide compound Grant 5,795,701 - Conley , et al. August 18, 1	1998-08-18
Acid scavengers for use in chemically amplified photoresists Grant 5,609,989 - Bantu , et al. March 11, 1	1997-03-11
Mid and deep-UV antireflection coatings and methods for use thereof Grant 5,554,485 - Dichiara , et al. September 10, 1	1996-09-10
Photoresist composition Grant 5,492,793 - Breyta , et al. February 20, 1	1996-02-20
Mid and deep-UV antireflection coatings and methods for use thereof Grant 5,401,614 - Dichiara , et al. March 28, 1	1995-03-28
Silicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymer Grant 5,385,804 - Premlatha , et al. January 31, 1	1995-01-31