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Patent applications and USPTO patent grants for Son; Eun-Kyung.The latest application filed is for "photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same".
Patent | Date |
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Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same Grant 7,419,761 - Lee , et al. September 2, 2 | 2008-09-02 |
Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same Grant 7,344,820 - Son , et al. March 18, 2 | 2008-03-18 |
Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same App 20060057494 - Lee; Jae-Woo ;   et al. | 2006-03-16 |
Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same App 20060019192 - SON; Eun-Kyung ;   et al. | 2006-01-26 |
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