SOMEYA; Yasuo
Patent Applications and Registrations
Patent applications and USPTO patent grants for SOMEYA; Yasuo.The latest application filed is for "resist composition and method of forming resist pattern".
- SOMEYA; Yasuo - Kawasaki-shi JP
- SOMEYA; Yasuo - Incheon KR
| Patent | Date |
|---|---|
| Resist Composition And Method Of Forming Resist Pattern App 20220214615 - KAIHO; Takaaki ; et al. | 2022-07-07 |
| Resist Composition And Method Of Forming Resist Pattern App 20220179315 - SOMEYA; Yasuo ; et al. | 2022-06-09 |
| Resist Composition And Method Of Forming Resist Pattern App 20210181632 - KAIHO; Takaaki ; et al. | 2021-06-17 |
| Chemical For Photolithography With Improved Liquid Transfer Property And Resist Composition Comprising The Same App 20170343897 - YONEMURA; Koji ; et al. | 2017-11-30 |
| Chemical For Photolithography With Improved Liquid Transfer Property And Resist Composition Comprising The Same App 20160306278 - YONEMURA; Koji ; et al. | 2016-10-20 |
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