Somervell; Mark H.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Somervell; Mark H..The latest application filed is for "uv-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly".

Company Profile

5.35.43

Somervell; Mark H. - Austin TX
Somervell; Mark H - Austin TX
Somervell; Mark H. - Richardson TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods for sensitizing photoresist using flood exposures Grant 11,061,332 - Carcasi , et al. July 13, 2	2021-07-13
Facilitation of spin-coat planarization over feature topography during substrate fabrication Grant 10,622,267 - Burns , et al.	2020-04-14
Uv-assisted Stripping Of Hardened Photoresist To Create Chemical Templates For Directed Self-assembly App 20200066509 - Somervell; Mark H. ; et al.	2020-02-27
Photo-sensitized chemically amplified resist (PS-CAR) simulation Grant 10,429,745 - Carcasi , et al. O	2019-10-01
Methods For Sensitizing Photoresist Using Flood Exposures App 20190094698 - Carcasi; Michael A. ; et al.	2019-03-28
Subtractive methods for creating dielectric isolation structures within open features Grant 10,170,354 - Somervell , et al. J	2019-01-01
Chemical Amplification Methods And Techniques For Developable Bottom Anti-reflective Coatings And Dyed Implant Resists App 20180315596 - Scheer; Steven ; et al.	2018-11-01
Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists Grant 10,020,195 - Scheer , et al. July 10, 2	2018-07-10
Facilitation Of Spin-coat Planarization Over Feature Topography During Substrate Fabrication App 20180096905 - Burns; Ryan L. ; et al.	2018-04-05
Use of grapho-epitaxial directed self-assembly applications to precisely cut logic lines Grant 9,793,137 - Somervell , et al. October 17, 2	2017-10-17
Mitigation of EUV shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (PS-CAR) Grant 9,746,774 - Carcasi , et al. August 29, 2	2017-08-29
Photo-sensitized Chemically Amplified Resist (PS-CAR) simulation App 20170242342 - Carcasi; Michael ; et al.	2017-08-24
Use of topography to direct assembly of block copolymers in grapho-epitaxial applications Grant 9,715,172 - Rathsack , et al. July 25, 2	2017-07-25
Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective deposition Grant 9,633,847 - Rathsack , et al. April 25, 2	2017-04-25
Integration of absorption based heating bake methods into a photolithography track system Grant 9,613,801 - Carcasi , et al. April 4, 2	2017-04-04
Line Pattern Collapse Mitigation Through Gap-fill Material Application App 20160363868 - SOMERVELL; Mark H. ; et al.	2016-12-15
Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR) Grant 9,519,227 - Carcasi , et al. December 13, 2	2016-12-13
Techniques for Spin-on-Carbon Planarization App 20160358786 - Hooge; Joshua S. ; et al.	2016-12-08
Use Of Grapho-epitaxial Directed Self-assembly Applications To Precisely Cut Logic Lines App 20160343588 - Somervell; Mark H. ; et al.	2016-11-24
Using Sub-resolution Openings To Aid In Image Reversal, Directed Self-assembly, And Selective Deposition App 20160300711 - Rathsack; Benjamen M. ; et al.	2016-10-13
Subtractive Methods For Creating Dielectric Isolation Structures Within Open Features App 20160300756 - Somervell; Mark H. ; et al.	2016-10-13
Line pattern collapse mitigation through gap-fill material application Grant 9,454,081 - Somervell , et al. September 27, 2	2016-09-27
Use Of Topography To Direct Assembly Of Block Copolymers In Grapho-epitaxial Applications App 20160268132 - Rathsack; Benjamen M. ; et al.	2016-09-15
Use of topography to direct assembly of block copolymers in grapho-epitaxial applications Grant 9,418,860 - Somervell , et al. August 16, 2	2016-08-16
Use of grapho-epitaxial directed self-assembly to precisely cut lines Grant 9,412,611 - Somervell , et al. August 9, 2	2016-08-09
Use of topography to direct assembly of block copolymers in grapho-epitaxial applications Grant 9,349,604 - Rathsack , et al. May 24, 2	2016-05-24
Integration Of Absorption Based Heating Bake Methods Into A Photolithography Track System App 20160013052 - Carcasi; Michael A. ; et al.	2016-01-14
Topography minimization of neutral layer overcoats in directed self-assembly applications Grant 9,147,574 - Somervell , et al. September 29, 2	2015-09-29
Metrology For Measurement Of Photosensitizer Concentration Within Photo-sensitized Chemically-amplified Resist (ps-car) App 20150241793 - CARCASI; Michael A. ; et al.	2015-08-27
Chemical Amplification Methods and Techniques for Developable Bottom Anti-reflective Coatings and Dyed Implant Resists App 20150241782 - SCHEER; Steven ; et al.	2015-08-27
Mitigation Of Euv Shot Noise Replicating Into Acid Shot Noise In Photo-sensitized Chemically-amplified Resist (ps-car) App 20150241781 - CARCASI; Michael A. ; et al.	2015-08-27
Line Pattern Collapse Mitigation Through Gap-fill Material Application App 20150125791 - SOMERVELL; Mark H. ; et al.	2015-05-07
Use Of Grapho-epitaxial Directed Self-assembly To Precisely Cut Lines App 20150108087 - Somervell; Mark H. ; et al.	2015-04-23
Use Of Topography To Direct Assembly Of Block Copolymers In Grapho-epitaxial Applications App 20150111387 - Somervell; Mark H. ; et al.	2015-04-23
Use Of Topography To Direct Assembly Of Block Copolymers In Grapho-epitaxial Applications App 20150111386 - Rathsack; Benjamen M. ; et al.	2015-04-23
Method of forming patterns using block copolymers and articles thereof Grant 9,005,877 - Rathsack , et al. April 14, 2	2015-04-14
Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents Grant 8,980,538 - Somervell , et al. March 17, 2	2015-03-17
Track processing to remove organic films in directed self-assembly chemo-epitaxy applications Grant 8,975,009 - Somervell , et al. March 10, 2	2015-03-10
Methods For Controlling Across-wafer Directed Self-assembly App 20140291878 - Somervell; Mark H.	2014-10-02
Chemi-epitaxy In Directed Self-assembly Applications Using Photo-decomposable Agents App 20140272723 - Somervell; Mark H. ; et al.	2014-09-18
Integration Of Absorption Based Heating Bake Methods Into A Photolithography Track System App 20140273534 - Carcasi; Michael A. ; et al.	2014-09-18
Track Processing To Remove Organic Films In Directed Self-assembly Chemo-epitaxy Applications App 20140273472 - Somervell; Mark H. ; et al.	2014-09-18
Topography Minimization Of Neutral Layer Overcoats In Directed Self-assembly Applications App 20140273514 - Somervell; Mark H. ; et al.	2014-09-18
Solvent Anneal Processing For Directed-self Assembly Applications App 20140273290 - Somervell; Mark H.	2014-09-18
Line pattern collapse mitigation through gap-fill material application Grant 8,795,952 - Somervell , et al. August 5, 2	2014-08-05
Method Of Forming Patterns Using Block Copolymers And Articles Thereof App 20130309457 - Rathsack; Benjamen M. ; et al.	2013-11-21
Substrate treatment to reduce pattern roughness Grant 8,449,293 - Rathsack , et al. May 28, 2	2013-05-28
Method of slimming radiation-sensitive material lines in lithographic applications Grant 8,435,728 - Carcasi , et al. May 7, 2	2013-05-07
Method Of Slimming Radiation-sensitive Material Lines In Lithographic Applications App 20130107237 - Carcasi; Michael A. ; et al.	2013-05-02
Method of slimming radiation-sensitive material lines in lithographic applications Grant 8,338,086 - Carcasi , et al. December 25, 2	2012-12-25
Use of blended solvents in defectivity prevention Grant 8,263,306 - Somervell , et al. September 11, 2	2012-09-11
Composition and method for reducing pattern collapse Grant 8,263,309 - Somervell September 11, 2	2012-09-11
Use of blended solvents in defectivity prevention Grant 8,129,089 - Somervell , et al. March 6, 2	2012-03-06
Substrate Treatment To Reduce Pattern Roughness App 20110269078 - Rathsack; Benjamin M. ; et al.	2011-11-03
Composition And Method For Reducing Pattern Collapse App 20110244391 - Somervell; Mark H.	2011-10-06
Method Of Slimming Radiation-sensitive Material Lines In Lithographic Applications App 20110244403 - Carcasi; Michael A. ; et al.	2011-10-06
Method Of Slimming Radiation-sensitive Material Lines In Lithographic Applications App 20110244402 - Carcasi; Michael A. ; et al.	2011-10-06
Line Pattern Collapse Mitigation Through Gap-fill Material Application App 20110205505 - SOMERVELL; Mark H. ; et al.	2011-08-25
Use of Blended Solvents in Defectivity Prevention App 20100101487 - SOMERVELL; Mark H. ; et al.	2010-04-29
Use of Blended Solvents in Defectivity Prevention App 20100104975 - SOMERVELL; Mark H. ; et al.	2010-04-29
Method Of Creating A Graded Anti-reflective Coating App 20090246718 - Somervell; Mark H.	2009-10-01
Substrate Cleaning Method And Apparatus App 20090241995 - Somervell; Mark H.	2009-10-01
Method of creating a graded anti-reflective coating Grant 7,595,146 - Somervell September 29, 2	2009-09-29
Post high voltage gate oxide pattern high-vacuum outgas surface treatment Grant 7,402,524 - Kirkpatrick , et al. July 22, 2	2008-07-22
Dual-gate integrated circuit semiconductor device Grant 7,339,240 - Kirkpatrick , et al. March 4, 2	2008-03-04
Semiconductive Device Having Resist Poison Aluminum Oxide Barrier And Method Of Manufacture App 20070290347 - Dostalik; William W. ; et al.	2007-12-20
Use of blended solvents in defectivity prevention App 20060241004 - Somervell; Mark H. ; et al.	2006-10-26
Post high voltage gate dielectric pattern plasma surface treatment App 20060183337 - Kirkpatrick; Brian K. ; et al.	2006-08-17
Post high voltage gate dielectric pattern plasma surface treatment Grant 7,049,242 - Kirkpatrick , et al. May 23, 2	2006-05-23
Post high voltage gate oxide pattern high-vacuum outgas surface treatment App 20060084229 - Kirkpatrick; Brian K. ; et al.	2006-04-20
Post high voltage gate oxide pattern high-vacuum outgas surface treatment Grant 7,018,925 - Kirkpatrick , et al. March 28, 2	2006-03-28
Post high voltage gate oxide pattern high-vacuum outgas surface treatment App 20040266113 - Kirkpatrick, Brian K. ; et al.	2004-12-30
Post high voltage gate dielectric pattern plasma surface treatment App 20040142570 - Kirkpatrick, Brian K. ; et al.	2004-07-22

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