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Ferroelectric and high dielectric constant integrated circuit capacitors with three-dimensional orientation for high-density memories, and method of making the same Grant 7,075,134 - Paz de Araujo , et al. July 11, 2 | 2006-07-11 |
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Ferroelectric composite material, method of making same and memory utilizing same Grant 6,831,313 - Uchiyama , et al. December 14, 2 | 2004-12-14 |
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Chemical vapor deposition method of making layered superlattice materials using trimethylbismuth Grant 6,787,181 - Uchiyama , et al. September 7, 2 | 2004-09-07 |
Barrier layers for protecting metal oxides from hydrogen degradation Grant 6,781,184 - Solayappan , et al. August 24, 2 | 2004-08-24 |
Ferroelectric and high dielectric constant integrated circuit capacitors with three-dimensional orientation for high-density memories, and method of making the same App 20040129961 - Paz de Araujo, Carlos A. ;   et al. | 2004-07-08 |
Ferroelectric composite material, method of making same and memory utilizing same App 20040129987 - Uchiyama, Kiyoshi ;   et al. | 2004-07-08 |
Stacked memory cell having diffusion barriers Grant 6,743,643 - Joshi , et al. June 1, 2 | 2004-06-01 |
Low thermal budget fabrication of ferroelectric memory using RTP App 20040101977 - Celinska, Jolanta ;   et al. | 2004-05-27 |
Stacked memory cell and process of fabricating same App 20040089920 - Joshi, Vikram ;   et al. | 2004-05-13 |
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Stacked memory cell having diffusion barriers App 20040046198 - Joshi, Vikram ;   et al. | 2004-03-11 |
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Lanthanide series layered superlattice materials for integrated circuit appalications App 20030152813 - Paz de Araujo, Carlos A. ;   et al. | 2003-08-14 |
Stacked memory cell having diffusion barriers App 20030132470 - Joshi, Vikram ;   et al. | 2003-07-17 |
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Stacked memory cell and process of fabricating same App 20030102531 - Joshi, Vikram ;   et al. | 2003-06-05 |
Barrier layers for protecting metal oxides from hydrogen degradation App 20030098497 - Solayappan, Narayan ;   et al. | 2003-05-29 |
Ferroelectric and high dielectric constant transistors Grant 6,559,469 - Paz de Araujo , et al. May 6, 2 | 2003-05-06 |
Chemical vapor deposition method of making layered superlattice materials using trimethylbismuth App 20030080325 - Uchiyama, Kiyoshi ;   et al. | 2003-05-01 |
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Interlayer oxide containing thin films for high dielectric constant application App 20030052357 - Hayashi, Shinichiro ;   et al. | 2003-03-20 |
Method and apparatus for fabrication of thin films by chemical vapor deposition Grant 6,511,718 - Paz de Araujo , et al. January 28, 2 | 2003-01-28 |
Interlayer oxide containing thin films for high dielectric constant application Grant 6,495,878 - Hayashi , et al. December 17, 2 | 2002-12-17 |
Ferroelectric composite material, method of making same, and memory utilizing same App 20020168785 - Paz de Araujo, Carlos A. ;   et al. | 2002-11-14 |
Low temperature rapid ramping anneal method for fabricating layered superlattice materials and making electronic devices including same Grant 6,326,315 - Uchiyama , et al. December 4, 2 | 2001-12-04 |
Metal oxide thin films for high dielectric constant application App 20010012698 - Hayashi, Shinichiro ;   et al. | 2001-08-09 |
Recovery Of Electronic Properties In Hydrogen-damaged Ferroelectrics By Low-temperature Annealing In An Inert Gas App 20010002273 - JOSHI, VIKRAM ;   et al. | 2001-05-31 |
Method and apparatus for misted liquid source deposition of thin film with reduced mist particle size Grant 6,116,184 - Solayappan , et al. September 12, 2 | 2000-09-12 |
Method and apparatus for preparing integrated circuit thin films by chemical vapor deposition Grant 6,110,531 - Paz de Araujo , et al. August 29, 2 | 2000-08-29 |
Ferroelectric memory with ferroelectric thin film having thickness of 90 nanometers or less, and method of making same Grant 6,104,049 - Solayappan , et al. August 15, 2 | 2000-08-15 |
Method and apparatus for misted deposition of integrated circuit quality thin films Grant 5,997,642 - Solayappan , et al. December 7, 1 | 1999-12-07 |
Process for fabricating layered superlattice materials and AB0.sub.3 type metal oxides without exposure to oxygen at high temperatures Grant 5,962,069 - Schindler , et al. October 5, 1 | 1999-10-05 |
Low imprint ferroelectric material for long retention memory and method of making the same Grant 5,883,828 - Cuchiaro , et al. March 16, 1 | 1999-03-16 |
Liquid source formation of thin films using hexamethyl-disilazane Grant 5,849,071 - Derbenwick , et al. December 15, 1 | 1998-12-15 |
Liquid source formation of thin films using hexamethyl-disilazane Grant 5,843,516 - Derbenwick , et al. December 1, 1 | 1998-12-01 |
Low imprint ferroelectric material for long retention memory and method of making the same Grant 5,784,310 - Cuchiaro , et al. July 21, 1 | 1998-07-21 |