Solarz; Richard W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Solarz; Richard W..The latest application filed is for "system and method for x-ray imaging and classification of volume defects".

Company Profile

1.14.10

Solarz; Richard W. - Danville CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
System and method for x-ray imaging and classification of volume defects Grant 11,035,804 - Solarz , et al. June 15, 2	2021-06-15
System and Method for X-Ray Imaging and Classification of Volume Defects App 20190003988 - Solarz; Richard W. ; et al.	2019-01-03
Sub 200nm laser pumped homonuclear excimer lasers Grant 9,735,534 - Solarz , et al. August 15, 2	2017-08-15
High throughput hot testing method and system for high-brightness light-emitting diodes Grant 9,519,033 - Solarz December 13, 2	2016-12-13
EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers Grant 9,377,414 - Chuang , et al. June 28, 2	2016-06-28
Solid State Light Production Using Flexible Grouping Of LEDs App 20150194565 - Solarz; Richard W. ; et al.	2015-07-09
Sub 200nm Laser Pumped Homonuclear Excimer Lasers App 20150168847 - Solarz; Richard W. ; et al.	2015-06-18
High Throughput Hot Testing Method And System For High-Brightness Light-Emitting Diodes App 20150123667 - Solarz; Richard W.	2015-05-07
High throughput hot testing method and system for high-brightness light-emitting diodes Grant 8,927,944 - Solarz January 6, 2	2015-01-06
EUV High Throughput Inspection System For Defect Detection On Patterned EUV Masks, Mask Blanks, And Wafers App 20140217299 - Chuang; Yung-Ho ; et al.	2014-08-07
Multi-wavelength pumping to sustain hot plasma Grant 8,698,399 - Bezel , et al. April 15, 2	2014-04-15
EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers Grant 8,692,986 - Chuang , et al. April 8, 2	2014-04-08
EUV High Throughput Inspection System For Defect Detection On Patterned EUV Masks, Mask Blanks, And Wafers App 20140001370 - Chuang; Yung-Ho ; et al.	2014-01-02
Optical imaging system with laser droplet plasma illuminator Grant 8,575,576 - Solarz , et al. November 5, 2	2013-11-05
EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers Grant 8,553,217 - Chuang , et al. October 8, 2	2013-10-08
High Throughput Hot Testing Method And System For High-Brightness Light-Emitting Diodes App 20130119275 - Solarz; Richard W.	2013-05-16
Optical Imaging System With Laser Droplet Plasma Illuminator App 20120205546 - Solarz; Richard W. ; et al.	2012-08-16
Indium rich InGaN LED line monitor Grant 8,218,221 - Solarz July 10, 2	2012-07-10
Multi-Wavelength Pumping to Sustain Hot Plasma App 20110291566 - Bezel; Ilya V. ; et al.	2011-12-01
EUV High Throughput Inspection System For Defect Detection On Patterned EUV Masks, Mask Blanks, And Wafers App 20110116077 - Chuang; Yung-Ho ; et al.	2011-05-19
Microchannel cooled edge cladding to establish an adiabatic boundary condition in a slab laser Grant 6,738,399 - Albrecht , et al. May 18, 2	2004-05-18

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.