Solanki; Rajendra

Patent Applications and Registrations

Patent applications and USPTO patent grants for Solanki; Rajendra.The latest application filed is for "impedimetric sensors using dielectric nanoparticles".

Company Profile

0.7.11

Solanki; Rajendra - Portland OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Impedimetric Sensors Using Dielectric Nanoparticles App 20120037515 - Solanki; Rajendra	2012-02-16
Method for direct electrical detection of molecules and molecule-molecule interactions Grant 7,732,140 - Vandenbark , et al. June 8, 2	2010-06-08
Impedance Spectroscopy Of Biomolecules Using Functionalized Nanoparticles App 20090117571 - Solanki; Rajendra ; et al.	2009-05-07
Method For Direct Electrical Detection Of Molecules And Molecule-molecule Interactions App 20080036471 - Vandenbark; Arthur A. ; et al.	2008-02-14
Device for direct electrical detection of molecules and molecule-molecule interactions Grant 7,214,528 - Vandenbark , et al. May 8, 2	2007-05-08
Method of etching a metallic film on a substrate Grant 7,204,935 - Solanki , et al. April 17, 2	2007-04-17
Nanolaminate film atomic layer deposition method Grant 7,053,009 - Conley, Jr. , et al. May 30, 2	2006-05-30
Electrochemical planarization system and method of electrochemical planarization App 20050218009 - Huo, Jinshan ; et al.	2005-10-06
Method for depositing a nanolaminate film by atomic layer deposition Grant 6,930,059 - Conley, Jr. , et al. August 16, 2	2005-08-16
Nanolaminate film atomic layer deposition method App 20050170667 - Conley, John F. JR. ; et al.	2005-08-04
Methods of electopolishing patterned substrates App 20040262168 - Huo, Jinshan ; et al.	2004-12-30
Method of depositing a metallic film on a substrate App 20040200414 - Solanki, Rajendra ; et al.	2004-10-14
Atomic layer deposition of oxide film App 20040168627 - Conley, John F. JR. ; et al.	2004-09-02
Atomic layer deposition of nanolaminate film App 20040171280 - Conley, John F. JR. ; et al.	2004-09-02
Method to deposit a stacked high-.kappa. gate dielectric for CMOS applications Grant 6,686,212 - Conley, Jr. , et al. February 3, 2	2004-02-03
Method of depositing a metallic film on a substrate App 20030064153 - Solanki, Rajendra ; et al.	2003-04-03
Methods of using atomic layer deposition to deposit a high dielectric constant material on a substrate Grant 6,420,279 - Ono , et al. July 16, 2	2002-07-16
Method of depositing a metallic film on a substrate App 20020039622 - Solanki, Rajendra ; et al.	2002-04-04

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