Patent | Date |
---|
Semiconductor devices including raised source/drain stressors and methods of manufacturing the same Grant 9,502,413 - Lim , et al. November 22, 2 | 2016-11-22 |
Semiconductor devices having contacts with intervening spacers and method for fabricating the same Grant 9,425,148 - Kim , et al. August 23, 2 | 2016-08-23 |
Semiconductor Devices Including Source/drain Stressors And Methods Of Manufacturing The Same App 20150357329 - Lim; Se-Chan ;   et al. | 2015-12-10 |
Integrated circuit system employing alternating conductive layers Grant 9,147,654 - Sheng , et al. September 29, 2 | 2015-09-29 |
Semiconductor Devices Including Source/drain Stressors And Methods Of Manufacturing The Same App 20130320457 - Lim; Se-Chan ;   et al. | 2013-12-05 |
Semiconductor Devices And Method For Fabricating The Same App 20130248990 - KIM; Ho-Jun ;   et al. | 2013-09-26 |
Integrated Circuit System Including Nitride Layer Technology App 20130034954 - Nagarad; Sripad Sheshagiri ;   et al. | 2013-02-07 |
Integrated circuit system employing low-k dielectrics and method of manufacture thereof Grant 8,358,007 - Sohn , et al. January 22, 2 | 2013-01-22 |
Integrated circuit system including nitride layer technology Grant 8,283,263 - Nagarad , et al. October 9, 2 | 2012-10-09 |
Reliable memory cell Grant 8,034,670 - Phua , et al. October 11, 2 | 2011-10-11 |
Selective STI stress relaxation through ion implantation Grant 8,008,744 - Teo , et al. August 30, 2 | 2011-08-30 |
Selective stress relaxation of contact etch stop layer through layout design Grant 7,888,214 - Teo , et al. February 15, 2 | 2011-02-15 |
Integrated Circuit System Employing Low-k Dielectrics And Method Of Manufacture Thereof App 20100314763 - Sohn; Dong Kyun ;   et al. | 2010-12-16 |
Reliable Memory Cell App 20100230744 - Phua; Timothy ;   et al. | 2010-09-16 |
Selective Sti Stress Relaxation Through Ion Implantation App 20100230777 - TEO; Lee Wee ;   et al. | 2010-09-16 |
Selective STI stress relaxation through ion implantation Grant 7,727,856 - Teo , et al. June 1, 2 | 2010-06-01 |
Method to fabricate variable work function gates for FUSI devices Grant 7,645,687 - Chong , et al. January 12, 2 | 2010-01-12 |
Integrated Circuit System Employing Alternating Conductive Layers App 20100001370 - Sheng; Haifeng ;   et al. | 2010-01-07 |
Process integration scheme of SONOS technology Grant 7,585,746 - Jung , et al. September 8, 2 | 2009-09-08 |
Method For Forming High-k Charge Storage Device App 20090023280 - ANG; Chew-Hoe ;   et al. | 2009-01-22 |
Method for forming high-K charge storage device Grant 7,479,425 - Ang , et al. January 20, 2 | 2009-01-20 |
Selective STI Stress Relaxation Through Ion Implantation App 20080150037 - Teo; Lee Wee ;   et al. | 2008-06-26 |
Semiconductor Device With Doped Transistor App 20080087958 - Verma; Purakh Raj ;   et al. | 2008-04-17 |
Implantation-less approach to fabricating strained semiconductor on isolation wafers Grant 7,338,886 - Liu , et al. March 4, 2 | 2008-03-04 |
Integrated Circuit System Including Nitride Layer Technology App 20080032513 - Nagarad; Sripad Sheshagiri ;   et al. | 2008-02-07 |
Semiconductor device and fabrication method Grant 7,326,609 - Verma , et al. February 5, 2 | 2008-02-05 |
Process integration scheme of SONOS technology App 20080014707 - Jung; Sung Mun ;   et al. | 2008-01-17 |
Laser activation of implanted contact plug for memory bitline fabrication Grant 7,256,112 - Chong , et al. August 14, 2 | 2007-08-14 |
Selective stress relaxation of contact etch stop layer through layout design App 20070132032 - Teo; Lee Wee ;   et al. | 2007-06-14 |
Method of forming ultra thin silicon oxynitride for gate dielectric applications Grant 7,202,164 - Liu , et al. April 10, 2 | 2007-04-10 |
Method to fabricate Ge and Si devices together for performance enhancement Grant 7,202,140 - Ang , et al. April 10, 2 | 2007-04-10 |
Method of forming a relaxed semiconductor buffer layer on a substrate with a large lattice mismatch Grant 7,166,522 - Liu , et al. January 23, 2 | 2007-01-23 |
Semiconductor Device And Fabrication Method App 20060252188 - Verma; Purakh Raj ;   et al. | 2006-11-09 |
Implantation-less approach to fabricating strained semiconductor on isolation wafers App 20060234479 - Liu; Jinping ;   et al. | 2006-10-19 |
Synthesis of GE nanocrystal memory cell and using a block layer to control oxidation kinetics App 20060166435 - Teo; Lee Wee ;   et al. | 2006-07-27 |
Laser activation of implanted contact plug for memory bitline fabrication App 20060160343 - Chong; Yung Fu ;   et al. | 2006-07-20 |
Method to fabricate variable work function gates for FUSI devices App 20060160290 - Chong; Yung Fu ;   et al. | 2006-07-20 |
Method for forming high-K charge storage device App 20060160303 - Ang; Chew-Hoe ;   et al. | 2006-07-20 |
Method of forming ultra thin silicon oxynitride for gate dielectric applications App 20060110865 - Liu; Jinping ;   et al. | 2006-05-25 |
Method for SONOS EFLASH integrated circuit Grant 7,029,976 - Nagarad , et al. April 18, 2 | 2006-04-18 |
Method of forming a relaxed semiconductor buffer layer on a substrate with a large lattice mismatch Grant 6,995,078 - Liu , et al. February 7, 2 | 2006-02-07 |
Method for integrating a SONOS gate oxide transistor into a logic/analog integrated circuit having several gate oxide thicknesses Grant 6,946,349 - Lee , et al. September 20, 2 | 2005-09-20 |
Method of forming a relaxed semiconductor buffer layer on a substrate with a large lattice mismatch App 20050164473 - Liu, Jin Ping ;   et al. | 2005-07-28 |
Method of forming a relaxed semiconductor buffer layer on a substrate with a large lattice mismatch App 20050164436 - Liu, Jin Ping ;   et al. | 2005-07-28 |
Semiconductor device including ternary phase diffusion barrier Grant 6,885,103 - Sohn , et al. April 26, 2 | 2005-04-26 |
Method of forming film for reduced ohmic contact resistance and ternary phase layer amorphous diffusion barrier App 20040017010 - Sohn, Dong Kyun ;   et al. | 2004-01-29 |
Method of forming film for reduced ohmic contact resistance and ternary phase layer amorphous diffusion barrier Grant 6,649,520 - Sohn , et al. November 18, 2 | 2003-11-18 |
Semiconductor device having a gate and fabrication method therefor App 20020034868 - Park, Ji Soo ;   et al. | 2002-03-21 |
Method for fabricating polycide dual gate in semiconductor device App 20010006832 - Bae, Jong Uk ;   et al. | 2001-07-05 |
Method for fabricating thin film at high temperature Grant 6,251,780 - Sohn , et al. June 26, 2 | 2001-06-26 |
Method of forming polycide Grant 6,177,335 - Park , et al. January 23, 2 | 2001-01-23 |
Method for forming epitaxial Co self-align silicide for semiconductor device Grant 6,077,750 - Sohn , et al. June 20, 2 | 2000-06-20 |