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Measurement Apparatus And A Method For Determining A Substrate Grid
App 20210341846 - BIJNEN; Franciscus Godefridus Casper ; et al. | 2021-11-04 |
Measurement apparatus and a method for determining a substrate grid
Grant 11,079,684 - Bijnen , et al. August 3, 2 | 2021-08-03 |
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
Grant 10,996,571 - Socha , et al. May 4, 2 | 2021-05-04 |
Adjustment Of A Metrology Apparatus Or A Measurement Thereby Based On A Characteristic Of A Target Measured
App 20200249584 - Kind Code | 2020-08-06 |
Coloring aware optimization
Grant 10,670,973 - Zou , et al. | 2020-06-02 |
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
Grant 10,670,975 - Socha , et al. | 2020-06-02 |
Metrology by reconstruction
Grant 10,437,158 - Socha O | 2019-10-08 |
Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement
Grant 10,417,359 - Socha , et al. Sept | 2019-09-17 |
Measurement Apparatus And A Method For Determining A Substrate Grid
App 20190235391 - BIJNEN; Franciscus Godefridus Casper ; et al. | 2019-08-01 |
Adjustment Of A Metrology Apparatus Or A Measurement Thereby Based On A Characteristic Of A Target Measured
App 20180364591 - SOCHA; Robert John ; et al. | 2018-12-20 |
Metrology By Reconstruction
App 20180364588 - SOCHA; Robert John | 2018-12-20 |
Inspection method and apparatus, lithographic system and device manufacturing method
Grant 10,132,763 - Cramer , et al. November 20, 2 | 2018-11-20 |
Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method
Grant 10,054,862 - Van Oosten , et al. August 21, 2 | 2018-08-21 |
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing Method
App 20180046091 - VAN OOSTEN; Anton Bernhard ; et al. | 2018-02-15 |
Optical Metrology Of Lithographic Processes Using Asymmetric Sub-resolution Features To Enhance Measurement
App 20170177760 - SOCHA; Robert John ; et al. | 2017-06-22 |
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing Method
App 20160363871 - VAN OOSTEN; Anton Bernhard ; et al. | 2016-12-15 |
Inspection Method and Apparatus, Lithographic System and Device Manufacturing Method
App 20150177166 - Cramer; Hugo Augustinus Joseph ; et al. | 2015-06-25 |
Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions
Grant 9,053,280 - Socha June 9, 2 | 2015-06-09 |
Design Rule Optimization In Lithographic Imaging Based On Correlation Of Functions Representing Mask And Predefined Optical Conditions
App 20140101625 - SOCHA; Robert John | 2014-04-10 |
Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
Grant 8,640,058 - Socha January 28, 2 | 2014-01-28 |
Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions
Grant 8,612,900 - Socha December 17, 2 | 2013-12-17 |
Method for performing pattern decomposition for a full chip design
Grant 8,572,521 - Chen , et al. October 29, 2 | 2013-10-29 |
Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO)
Grant 8,356,261 - Socha January 15, 2 | 2013-01-15 |
Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure process
Grant 8,340,394 - Socha December 25, 2 | 2012-12-25 |
Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process
Grant 8,224,061 - Socha July 17, 2 | 2012-07-17 |
Method, Program Product and Apparatus for Model Based Geometry Decomposition for Use in a Multiple Exposure Process
App 20120077114 - Socha; Robert John | 2012-03-29 |
Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
Grant 8,060,842 - Socha November 15, 2 | 2011-11-15 |
Design Rule Optimization in Lithographic Imaging Based on Correlation of Functions Representing Mask and Predefined Optical Conditions
App 20110219342 - Socha; Robert John | 2011-09-08 |
Method, Program Product, And Apparatus For Performing A Model Based Coloring Process For Pattern Decomposition For Use In A Multiple Exposure Process
App 20100086203 - SOCHA; Robert John | 2010-04-08 |
Method, Program Product And Apparatus For Performing A Model Based Coloring Process For Geometry Decomposition For Use In A Multiple Exposure Process
App 20100021055 - SOCHA; Robert John | 2010-01-28 |
Method of optical proximity correction design for contact hole mask
Grant 7,594,199 - Socha , et al. September 22, 2 | 2009-09-22 |
Lithographic apparatus and device manufacturing method
Grant 7,548,302 - Bleeker , et al. June 16, 2 | 2009-06-16 |
Method, Program Product And Apparatus For Model Based Geometry Decomposition For Use In A Multiple Exposure Process
App 20090148783 - SOCHA; Robert John | 2009-06-11 |
Feature optimization using interference mapping lithography
Grant 7,506,299 - Socha , et al. March 17, 2 | 2009-03-17 |
Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
Grant 7,493,589 - Socha February 17, 2 | 2009-02-17 |
Variable illumination source
Grant 7,317,506 - Flagello , et al. January 8, 2 | 2008-01-08 |
Lithographic apparatus and device manufacturing method
App 20070273853 - Bleeker; Arno Jan ; et al. | 2007-11-29 |
Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
App 20070157154 - Socha; Robert John | 2007-07-05 |
Variable illumination source
App 20070013888 - Flagello; Donis George ; et al. | 2007-01-18 |
Feature optimization using interference mapping lithography
App 20050142470 - Socha, Robert John ; et al. | 2005-06-30 |
Assist features for use in lithographic projection
Grant 6,887,625 - Baselmans , et al. May 3, 2 | 2005-05-03 |
Illumination optimization for specific mask patterns
Grant 6,871,337 - Socha March 22, 2 | 2005-03-22 |
Method of optical proximity correction design for contact hole mask
App 20040229133 - Socha, Robert John ; et al. | 2004-11-18 |
Illumination optimization for specific mask patterns
App 20020152452 - Socha, Robert John | 2002-10-17 |
Assist features for use in lithographic projection
App 20020045106 - Baselmans, Johannes Jacobus Matheus ; et al. | 2002-04-18 |
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