Sobieraj; Oktawian
Patent Applications and Registrations
Patent applications and USPTO patent grants for Sobieraj; Oktawian.The latest application filed is for "photolithography system and method incorporating a photomask-pellicle apparatus with an angled pellicle".
- Sobieraj; Oktawian - Ballston Lake NY
| Patent | Date |
|---|---|
| Pellicle replacement in EUV mask flow Grant 10,401,724 - Sobieraj , et al. Sep | 2019-09-03 |
| Photolithography System And Method Incorporating A Photomask-pellicle Apparatus With An Angled Pellicle App 20190258157 - Chen; Yulu ; et al. | 2019-08-22 |
| Pellicle Replacement In Euv Mask Flow App 20190137863 - Sobieraj; Oktawian ; et al. | 2019-05-09 |
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