| Patent | Date |
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Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods
Grant 8,142,675 - Small , et al. March 27, 2 | 2012-03-27 |
Compositions and methods for rapidly removing overfilled substrates
Grant 8,057,696 - Chelle , et al. November 15, 2 | 2011-11-15 |
Semiconductor Cleaning Using Superacids
App 20110187010 - Small; Robert J. | 2011-08-04 |
Periodic acid compositions for polishing ruthenium/low K substrates
Grant 7,968,465 - Small , et al. June 28, 2 | 2011-06-28 |
Semiconductor cleaning using superacids
Grant 7,923,424 - Small April 12, 2 | 2011-04-12 |
Compositions For Chemical-mechanical Planarization Of Noble-metal-featured Substrates, Associated Methods, And Substrates Produced By Such Methods
App 20090255903 - SMALL; Robert J. ; et al. | 2009-10-15 |
Free Radical-Forming Activator Attached to Solid and Used to Enhance CMP Formulations
App 20090250656 - Siddiqui; Junaid Ahmed ; et al. | 2009-10-08 |
Compositions of chemical mechanical planarization slurries contacting noble-metal-featured substrates
Grant 7,524,346 - Small , et al. April 28, 2 | 2009-04-28 |
Free radical-forming activator attached to solid and used to enhance CMP formulations
Grant 7,513,920 - Siddiqui , et al. April 7, 2 | 2009-04-07 |
Free radical-forming activator attached to solid and used to enhance CMP formulations
App 20090029553 - Scott; Brandon Shane ; et al. | 2009-01-29 |
Compositions And Methods For Rapidly Removing Overfilled Substrates
App 20090014415 - Chelle; Philippe H. ; et al. | 2009-01-15 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
App 20090011967 - Lee; Wai Mun ; et al. | 2009-01-08 |
Compositions for cleaning organic and plasma etched residues for semiconductor devices
Grant 7,456,140 - Small , et al. November 25, 2 | 2008-11-25 |
Particulate or particle-bound chelating agents
Grant 7,427,361 - Small , et al. September 23, 2 | 2008-09-23 |
Free radical-forming activator attached to solid and used to enhance CMP formulations
Grant 7,427,305 - Scott , et al. September 23, 2 | 2008-09-23 |
Compositions and methods for rapidly removing overfilled substrates
Grant 7,419,911 - Chelle , et al. September 2, 2 | 2008-09-02 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
Grant 7,387,130 - Lee , et al. June 17, 2 | 2008-06-17 |
Cerium oxide abrasives for chemical mechanical polishing
Grant 7,368,388 - Small , et al. May 6, 2 | 2008-05-06 |
Periodic Acid Compositions For Polishing Ruthenium/Low K Substrates
App 20080038995 - Small; Robert J. ; et al. | 2008-02-14 |
Chemical mechanical polishing composition and process
Grant 7,314,823 - Small , et al. January 1, 2 | 2008-01-01 |
Chemical mechanical polishing composition and process
Grant 7,276,180 - Small , et al. October 2, 2 | 2007-10-02 |
Methods for chemically treating a substrate using foam technology
Grant 7,273,060 - Patel , et al. September 25, 2 | 2007-09-25 |
CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers
Grant 7,247,566 - Carter , et al. July 24, 2 | 2007-07-24 |
Methods for chemically treating a substrate using foam technology
App 20070135321 - Patel; Bakul P. ; et al. | 2007-06-14 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
App 20070078074 - Lee; Wai Mun ; et al. | 2007-04-05 |
Compositions containing free radical quenchers
App 20060289034 - Small; Robert J. ; et al. | 2006-12-28 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
Grant 7,144,849 - Lee , et al. December 5, 2 | 2006-12-05 |
Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials
Grant 7,135,445 - Charm , et al. November 14, 2 | 2006-11-14 |
Cerium oxide abrasives for chemical mechanical polishing
App 20060234509 - Small; Robert J. ; et al. | 2006-10-19 |
Semiconductor cleaning using superacids
App 20060183248 - Small; Robert J. | 2006-08-17 |
Free radical-forming activator attached to solid and used to enhance CMP formulations
App 20060180788 - Scott; Brandon Shane ; et al. | 2006-08-17 |
Semiconductor cleaning using ionic liquids
App 20060183654 - Small; Robert J. | 2006-08-17 |
Free radical-forming activator attached to solid and used to enhance CMP formulations
App 20060117667 - Siddiqui; Junaid Ahmed ; et al. | 2006-06-08 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
Grant 7,051,742 - Lee , et al. May 30, 2 | 2006-05-30 |
Composition for chemical-mechanical polishing and method of using same
Grant 7,037,350 - Small , et al. May 2, 2 | 2006-05-02 |
Compositions for chemical mechanical planarization of tantalum and tantalum nitride
Grant 7,033,409 - Small , et al. April 25, 2 | 2006-04-25 |
Chemical mechanical polishing composition and process
Grant 7,033,942 - Small , et al. April 25, 2 | 2006-04-25 |
Catalyst attached to solid and used to promote free radical formation in CMP formulations
Grant 7,029,508 - Scott , et al. April 18, 2 | 2006-04-18 |
Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same
Grant 7,014,669 - Small , et al. March 21, 2 | 2006-03-21 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
App 20060003909 - Lee; Wai Mun ; et al. | 2006-01-05 |
Chemical mechanical polishing composition and process
App 20050266689 - Small, Robert J. ; et al. | 2005-12-01 |
Compositions for chemical mechanical planarization of tantalum and tantalum nitride
App 20050250329 - Small, Robert J. ; et al. | 2005-11-10 |
Compositions for cleaning organic and plasma etched residues for semiconductor devices
App 20050202987 - Small, Robert J. ; et al. | 2005-09-15 |
Compositions and methods for rapidly removing overfilled substrates
App 20050178742 - Chelle, Philippe H. ; et al. | 2005-08-18 |
Sulfoxide pyrolid(in)one alkanolamine cleaner composition
Grant 6,916,772 - Zhou , et al. July 12, 2 | 2005-07-12 |
Use of welds for thermal and mechanical connections in cryogenic vacuum vessels
App 20050091990 - Carter, Charles F. III ; et al. | 2005-05-05 |
CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers
App 20050090109 - Carter, Melvin K. ; et al. | 2005-04-28 |
Particulate or particle-bound chelating agents
App 20050076581 - Small, Robert J. ; et al. | 2005-04-14 |
Compositions for chemical mechanical planarization of copper
Grant 6,866,792 - Small , et al. March 15, 2 | 2005-03-15 |
Composition for cleaning chemical mechanical planarization apparatus
Grant 6,852,682 - Small , et al. February 8, 2 | 2005-02-08 |
Composition for chemical-mechanical polishing and method of using same
App 20050014890 - Small, Robert J. ; et al. | 2005-01-20 |
Residue removers for electrohydrodynamic cleaning of semiconductors
App 20040217006 - Small, Robert J. | 2004-11-04 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
App 20040198621 - Lee, Wai Mun ; et al. | 2004-10-07 |
Chemical-mechanical planarization using ozone
App 20040161938 - Small, Robert J. ; et al. | 2004-08-19 |
Compositions for cleaning organic and plasma etched residues for semiconductor devices
Grant 6,777,380 - Small , et al. August 17, 2 | 2004-08-17 |
Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials
App 20040147421 - Charm, Richard William ; et al. | 2004-07-29 |
Wet etch of titanium-tungsten film
App 20040140288 - Patel, Bakul ; et al. | 2004-07-22 |
Abrasive-free chemical mechanical polishing composition and polishing process containing same
App 20040134873 - Yao, Li ; et al. | 2004-07-15 |
Chemical-mechanical planarization using ozone
Grant 6,756,308 - Small , et al. June 29, 2 | 2004-06-29 |
Chemical mechanical polishing composition and process
App 20040072439 - Small, Robert J, ; et al. | 2004-04-15 |
Oxalic acid as a semiaqueous cleaning product for copper and dielectrics
App 20040038840 - Lee, Shihying ; et al. | 2004-02-26 |
Fenton's reagent composition for chemical-mechanical polishing, method of using same, and substrate treated with same
App 20040025444 - Small, Robert J. ; et al. | 2004-02-12 |
Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same
App 20040029495 - Small, Robert J. ; et al. | 2004-02-12 |
Free radical-forming activator attached to solid and used to enhance CMP formulations
App 20040006924 - Scott, Brandon Shane ; et al. | 2004-01-15 |
Clean room wipes for neutralizing caustic chemicals
Grant 6,645,930 - Wallis , et al. November 11, 2 | 2003-11-11 |
Compositions for chemical mechanical planarization of tantalum and tantalum nitride
Grant 6,638,326 - Small , et al. October 28, 2 | 2003-10-28 |
Chemical mechanical polishing composition and process
Grant 6,635,186 - Small , et al. October 21, 2 | 2003-10-21 |
Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods
App 20030194879 - Small, Robert J. ; et al. | 2003-10-16 |
Chemical mechanical polishing composition and process
App 20030176068 - Small, Robert J. ; et al. | 2003-09-18 |
Methods and compositions for chemically treating a substrate using foam technology
App 20030171239 - Patel, Bakul P. ; et al. | 2003-09-11 |
Compositions for chemical mechanical planarization of copper
App 20030164471 - Small, Robert J. ; et al. | 2003-09-04 |
Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same
App 20030162398 - Small, Robert J. ; et al. | 2003-08-28 |
Compositions for chemical mechanical planarization of tantalum and tantalum nitride
App 20030131535 - Small, Robert J. ; et al. | 2003-07-17 |
Sulfoxide pyrolid(in)one alkanolamine cleaner composition
App 20030130149 - Zhou, De-Ling ; et al. | 2003-07-10 |
Composition for cleaning chemical mechanical planarization apparatus
App 20030073601 - Small, Robert J. ; et al. | 2003-04-17 |
Post clean treatment
Grant 6,546,939 - Small April 15, 2 | 2003-04-15 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
App 20030032567 - Lee, Wai Mun ; et al. | 2003-02-13 |
Chemical mechanical polishing compositions
App 20020111024 - Small, Robert J. ; et al. | 2002-08-15 |
Chemical-mechanical planarization using ozone
App 20020111026 - Small, Robert J. ; et al. | 2002-08-15 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
App 20020052301 - Lee, Wai Mun ; et al. | 2002-05-02 |
Compositions for cleaning organic and plasma etched residues for semiconductor devices
App 20020037820 - Small, Robert J. ; et al. | 2002-03-28 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
Grant 6,319,885 - Lee , et al. November 20, 2 | 2001-11-20 |
Compositions for cleaning organic and plasma etched residues for semiconductors devices
Grant 6,248,704 - Small , et al. June 19, 2 | 2001-06-19 |
Lactam compositions for cleaning organic and plasma etched residues for semiconductor devices
Grant 6,235,693 - Cheng , et al. May 22, 2 | 2001-05-22 |
Post clean treatment
Grant 6,156,661 - Small December 5, 2 | 2000-12-05 |
Chemical mechanical polishing composition and process
Grant 6,117,783 - Small , et al. September 12, 2 | 2000-09-12 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
Grant 6,110,881 - Lee , et al. August 29, 2 | 2000-08-29 |
Method of removing etching residue
Grant 5,911,835 - Lee , et al. June 15, 1 | 1999-06-15 |
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