Skrovan; John

Patent Applications and Registrations

Patent applications and USPTO patent grants for Skrovan; John.The latest application filed is for "apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies".

Company Profile

0.10.2

Skrovan; John - Boise ID
Skrovan; John - County of Boise ID

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies Grant 6,739,955 - Skrovan May 25, 2	2004-05-25
Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic device substrate assemblies Grant 6,361,413 - Skrovan March 26, 2	2002-03-26
Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies App 20010019938 - Skrovan, John	2001-09-06
Planarization method using fluid composition including chelating agents App 20010014539 - Skrovan, John ; et al.	2001-08-16
Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies Grant 6,203,413 - Skrovan March 20, 2	2001-03-20
Methods of reducing corrosion of materials, methods of protecting aluminum within aluminum-comprising layers from electrochemical degradation during semiconductor processing methods of forming aluminum-comprising lines Grant 6,110,830 - Skrovan , et al. August 29, 2	2000-08-29
Megasonic cleaning methods and apparatus Grant 6,006,765 - Skrovan , et al. December 28, 1	1999-12-28
Planarization fluid composition chelating agents and planarization method using same Grant 5,916,819 - Skrovan , et al. June 29, 1	1999-06-29
Megasonic cleaning methods and apparatus Grant 5,849,091 - Skrovan , et al. December 15, 1	1998-12-15
Apparatus and method for conditioning a planarizing substrate used in mechanical and chemical-mechanical planarization of semiconductor wafers Grant 5,846,336 - Skrovan December 8, 1	1998-12-08
Planarization slurry including a dispersant and method of using same Grant 5,827,781 - Skrovan , et al. October 27, 1	1998-10-27
Apparatus and method for conditioning a planarizing substrate used in chemical-mechanical planarization of semiconductor wafers Grant 5,645,682 - Skrovan July 8, 1	1997-07-08

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