SK-Materials Co., Ltd.

Patent Applications and Registrations

Patent applications and USPTO patent grants for SK-Materials Co., Ltd..The latest application filed is for "composition for etching, method for etching insulator and method for manufacturing semiconductor device, and novel compounds".

Company Profile

18.18.16

SK-Materials Co., Ltd. - Yeongju-si KR
SK Materials CO., LTD. - Yeongju-si, Gyeongsangbuk-do KR
SK-MATERIALS CO., LTD. -
SK-MATERIALS CO., LTD. - Yeongju KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Silicon compound Grant 11,236,116 - Kim , et al. February 1, 2	2022-02-01
Etching composition, method for etching insulating film of semiconductor devices using the same and method for preparing semiconductor devices Grant 11,186,772 - Kim , et al. November 30, 2	2021-11-30
Composition For Etching, Method For Etching Insulator And Method For Manufacturing Semiconductor Device, And Novel Compounds App 20210309914 - KIM; Cheol Woo ; et al.	2021-10-07
Gas Container And Deposition System Including The Same App 20210301388 - HWANG; Sunhye ; et al.	2021-09-30
Composition for etching, method for etching insulator and method for manufacturing semiconductor device, and novel compounds Grant 11,066,601 - Kim , et al. July 20, 2	2021-07-20
Etching composition, method for etching insulating layer of semiconductor devices and method for preparing semiconductor devices Grant 11,028,321 - Kim , et al. June 8, 2	2021-06-08
Compound, Organic Electroluminescent Device, And Display Device App 20210143337 - KIM; Jeongmi ; et al.	2021-05-13
Etching composition additive, method for preparing the same and etching composition comprising the same Grant 10,941,341 - Kim , et al. March 9, 2	2021-03-09
Etching Composition, Method For Etching Insulating Film Of Semiconductor Devices Using The Same And Method For Preparing Semiconductor Devices App 20210062089 - KIM; Cheol Woo ; et al.	2021-03-04
Etching Composition, Method For Etching Insulating Film Of Semiconductor Devices Using The Same And Method For Preparing Semiconductor Devices App 20210062088 - KIM; Cheol Woo ; et al.	2021-03-04
Preparation method of trifluoroamine oxide Grant 10,934,167 - Kang , et al. March 2, 2	2021-03-02
Method And Apparatus For Effective Preparation Of Trifluoroamine Oxide App 20210047184 - Kang; Hong Suk ; et al.	2021-02-18
Compound, Organic Light Emitting Device, And Display Device App 20210043843 - KIM; Jeongmi ; et al.	2021-02-11
Preparation Method Of Trifluoroamine Oxide App 20200407223 - Kang; Hong Suk ; et al.	2020-12-31
Composition For Etching, Method For Etching Insulator And Method For Manufacturing Semiconductor Device, And Novel Compounds App 20200377793 - Kim; Cheol Woo ; et al.	2020-12-03
Silane Compound App 20200377794 - KIM; Cheol Woo ; et al.	2020-12-03
Etchant composition, method of etching insulating film, method of manufacturing semiconductor device, and silane compound Grant 10,836,962 - Kim , et al. November 17, 2	2020-11-17
Novel Silicon Compound App 20200331936 - KIM; Cheol Woo ; et al.	2020-10-22
Etchant composition and silane compound Grant 10,781,371 - Kim , et al. Sept	2020-09-22
Etching Composition Additive, Method For Preparing The Same And Etching Composition Comprising The Same App 20200131438A1 -	2020-04-30
Etching Composition, Method For Etching Insulating Layer Of Semiconductor Devices And Method For Preparing Semiconductor Devices App 20200131439A1 -	2020-04-30
Etchant Composition, Method Of Etching Insulating Film, Method Of Manufacturing Semiconductor Device, And Silane Compound App 20190359887 - KIM; Cheol Woo ; et al.	2019-11-28
Etchant Composition And Silane Compound App 20190359886 - Kim; Cheol Woo ; et al.	2019-11-28
Gas Storage Cylinder, Deposition System, And Method Of Manufacturing Semiconductor Device App 20190309415 - Han; Yeonock ; et al.	2019-10-10
Apparatus for preparing germane gas and method for preparing monogermane gas using same Grant 9,586,820 - Lee , et al. March 7, 2	2017-03-07

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