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Patent applications and USPTO patent grants for Sjostrom; Fredrik.The latest application filed is for "methods and apparatuses for increasing available power in optical systems".
Patent | Date |
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Method and apparatus for overlay compensation between subsequently patterned layers on workpiece Grant 8,137,875 - Sjostrom , et al. March 20, 2 | 2012-03-20 |
Method for a multiple exposure beams lithography tool Grant 7,919,218 - Sjostrom April 5, 2 | 2011-04-05 |
Methods and apparatuses for increasing available power in optical systems App 20100142022 - Sjostrom; Fredrik | 2010-06-10 |
Method and apparatus for overlay compensation between subsequently patterned layers on workpiece App 20090325088 - Sjostrom; Fredrik ;   et al. | 2009-12-31 |
Methods and apparatuses for reducing mura effects in generated patterns App 20090199152 - Sjostrom; Fredrik | 2009-08-06 |
Method for a multiple exposure beams lithography tool App 20090197188 - Sjostrom; Fredrik | 2009-08-06 |
Methods and apparatuses for detecting pattern errors App 20090175530 - Sjostrom; Fredrik ;   et al. | 2009-07-09 |
Registration method and apparatus therefor App 20070236695 - Sjostrom; Fredrik | 2007-10-11 |
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