Sinta; Roger
Patent Applications and Registrations
Patent applications and USPTO patent grants for Sinta; Roger.The latest application filed is for "photosensitive material for lift-off applications".
- Sinta; Roger - Woburn MA
- Sinta; Roger - Beijing CN
| Patent | Date |
|---|---|
| Photosensitive Material For Lift-Off Applications App 20190339613 - Golden; Jeremy ; et al. | 2019-11-07 |
| Negative chemically-amplified photoresist and imaging method thereof Grant 9,766,542 - Sun , et al. September 19, 2 | 2017-09-19 |
| Novel Photoresist Stripper And Application Process Thereof App 20160238945 - LI; Bing ; et al. | 2016-08-18 |
| Negative Chemically-amplified Photoresist And Imaging Method Thereof App 20160223907 - Sun; Jia ; et al. | 2016-08-04 |
| ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALS App 20150145106 - Zafiropoulos; Nicholas Anthony ; et al. | 2015-05-28 |
| Electronic device manufacture using low-k dielectric materials Grant 8,945,677 - Zafiropoulos , et al. February 3, 2 | 2015-02-03 |
| ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALS App 20120189782 - Zafiropoulos; Nicholas A ; et al. | 2012-07-26 |
| Solder Alloys App 20090014746 - Ramirez; Ainissa Gweneth ; et al. | 2009-01-15 |
| Solder Alloys App 20070292072 - Ramirez; Ainissa Gweneth ; et al. | 2007-12-20 |
| Low abosorbing resists for 157 nm lithography Grant 6,794,109 - Fedynyshyn , et al. September 21, 2 | 2004-09-21 |
| Protecting groups for lithographic resist compositions App 20040009424 - Fedynyshyn, Theodore H. ; et al. | 2004-01-15 |
| Low abosorbing resists for 157 nm lithography App 20020160297 - Fedynyshyn, Theodore H. ; et al. | 2002-10-31 |
| Antireflective Coating Compositions App 20020102483 - ADAMS, TIMOTHY ; et al. | 2002-08-01 |
| Polymer having inert blocking groups Grant 5,541,263 - Thackeray , et al. July 30, 1 | 1996-07-30 |
| Radiation sensitive compositions comprising polymer having acid labile groups Grant 5,258,257 - Sinta , et al. November 2, 1 | 1993-11-02 |
| Near UV photoresist Grant 5,212,046 - Lamola , et al. May 18, 1 | 1993-05-18 |
| Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units Grant 5,128,232 - Thackeray , et al. July 7, 1 | 1992-07-07 |
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