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Patent applications and USPTO patent grants for Singh; SherJang.The latest application filed is for "photolithography system and method incorporating a photomask-pellicle apparatus with an angled pellicle".
Patent | Date |
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Method for treating substrates with an aqueous liquid medium exposed to UV-radiation Grant 11,358,172 - Dattilo , et al. June 14, 2 | 2022-06-14 |
Lithographic patterning to form fine pitch features Grant 10,504,774 - Singh , et al. Dec | 2019-12-10 |
Pellicle replacement in EUV mask flow Grant 10,401,724 - Sobieraj , et al. Sep | 2019-09-03 |
Photolithography System And Method Incorporating A Photomask-pellicle Apparatus With An Angled Pellicle App 20190258157 - Chen; Yulu ;   et al. | 2019-08-22 |
Pellicle Replacement In Euv Mask Flow App 20190137863 - Sobieraj; Oktawian ;   et al. | 2019-05-09 |
Method and apparatus for treating substrates Grant 10,265,739 - Dietze , et al. | 2019-04-23 |
Dual Developing Methods For Lithography Patterning App 20190079408 - Mehta; Sohan Singh ;   et al. | 2019-03-14 |
Extreme Ultraviolet Lithography (euvl) Reflective Mask App 20180299765 - Singh; SherJang ;   et al. | 2018-10-18 |
Lithographic Patterning To Form Fine Pitch Features App 20180025936 - Singh; Sunil K. ;   et al. | 2018-01-25 |
Method And An Apparatus For Cleaning Substrates App 20170271145 - Dietze; Uwe ;   et al. | 2017-09-21 |
Method and apparatus for treating substrates Grant 9,662,684 - Dietze , et al. May 30, 2 | 2017-05-30 |
Method For Treating Substrates With An Aqueous Liquid Medium Exposed To Uv-radiation App 20170087585 - Dattilo; Davide ;   et al. | 2017-03-30 |
Mask structures and methods of manufacturing Grant 9,195,132 - Patil , et al. November 24, 2 | 2015-11-24 |
Mask Structures And Methods Of Manufacturing App 20150212402 - PATIL; Suraj K. ;   et al. | 2015-07-30 |
Method And Apparatus For Treating Substrates App 20120211024 - Dietze; Uwe ;   et al. | 2012-08-23 |
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