loadpatents
Patent applications and USPTO patent grants for Singh; Anup Kumar.The latest application filed is for "carbon cvd deposition methods to mitigate stress induced defects".
Patent | Date |
---|---|
Method and device for tracking and manipulation of droplets Grant 11,369,962 - Sustarich , et al. June 28, 2 | 2022-06-28 |
Cfx Layer To Protect Aluminum Surface From Over-oxidation App 20220178017 - SINGH; Anup Kumar ;   et al. | 2022-06-09 |
Carbon Cvd Deposition Methods To Mitigate Stress Induced Defects App 20220178026 - HASSAN; Vinayak Vishwanath ;   et al. | 2022-06-09 |
Methods Of Seasoning Process Chambers App 20220122821 - HASSAN; Vinayak Vishwanath ;   et al. | 2022-04-21 |
Method Of Using Dual Frequency Rf Power In A Process Chamber App 20220102141 - SINGH; Anup Kumar ;   et al. | 2022-03-31 |
Showerhead Design To Control Stray Deposition App 20220064797 - DHANAKSHIRUR; Akshay ;   et al. | 2022-03-03 |
Apparatus and methods for removing contaminant particles in a plasma process Grant 11,120,976 - Kumar , et al. September 14, 2 | 2021-09-14 |
Contactless Liquid Loading To Microfluidic Devices App 20210205813 - Iwai; Kosuke ;   et al. | 2021-07-08 |
Techniques To Improve Adhesion And Defects For Tungsten Carbide Film App 20210108309 - SHAH; Vivek Bharat ;   et al. | 2021-04-15 |
Technique to prevent aluminum fluoride build up on the heater Grant 10,892,143 - Shah , et al. January 12, 2 | 2021-01-12 |
Plasma Density Control On Substrate Edge App 20200381222 - KUMAR; Bhaskar ;   et al. | 2020-12-03 |
Plasma Parameters And Skew Characterization By High Speed Imaging App 20200357668 - BHATIA; Sidharth ;   et al. | 2020-11-12 |
Apparatus And Methods For Removing Contaminant Particles In A Plasma Process App 20200350146 - KUMAR; Bhaskar ;   et al. | 2020-11-05 |
Plasma density control on substrate edge Grant 10,790,121 - Kumar , et al. September 29, 2 | 2020-09-29 |
Plasma parameters and skew characterization by high speed imaging Grant 10,748,797 - Bhatia , et al. A | 2020-08-18 |
Apparatus and methods for removing contaminant particles in a plasma process Grant 10,714,319 - Kumar , et al. | 2020-07-14 |
Aluminum fluoride mitigation by plasma treatment Grant 10,688,538 - Shah , et al. | 2020-06-23 |
Apparatus And Methods For Removing Contaminant Particles In A Plasma Process App 20190259585 - KUMAR; Bhaskar ;   et al. | 2019-08-22 |
Plasma Density Control On Substrate Edge App 20180294146 - KUMAR; Bhaskar ;   et al. | 2018-10-11 |
Gas Phase Particle Reduction In Pecvd Chamber App 20180294139 - KUMAR; Bhaskar ;   et al. | 2018-10-11 |
Plasma Parameters And Skew Characterization By High Speed Imaging App 20180204750 - BHATIA; Sidharth ;   et al. | 2018-07-19 |
Aluminum Fluoride Mitigation By Plasma Treatment App 20180036775 - SHAH; Vivek Bharat ;   et al. | 2018-02-08 |
Method And Device For Tracking And Manipulation Of Droplets App 20170354973 - Sustarich; Jess M. ;   et al. | 2017-12-14 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.