SIMS; James S.

Patent Applications and Registrations

Patent applications and USPTO patent grants for SIMS; James S..The latest application filed is for "method of depositing silicon nitride films".

Company Profile

0.21.8

SIMS; James S. - Tigard OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method Of Depositing Silicon Nitride Films App 20210384028 - SIMS; James S. ; et al.	2021-12-09
Method for depositing ALD films using halide-based precursors Grant 10,020,188 - Sims , et al. July 10, 2	2018-07-10
Method For Depositing Ald Films Using Halide-based Precursors App 20180102245 - Sims; James S. ; et al.	2018-04-12
Method for depositing metals free ald silicon nitride films using halide-based precursors Grant 9,824,884 - Sims , et al. November 21, 2	2017-11-21
Tensile dielectric films using UV curing Grant 9,659,769 - Varadarajan , et al. May 23, 2	2017-05-23
Contoured showerhead for improved plasma shaping and control Grant 9,598,770 - Leeser , et al. March 21, 2	2017-03-21
Method of depositing ammonia free and chlorine free conformal silicon nitride film Grant 9,589,790 - Henri , et al. March 7, 2	2017-03-07
Contoured Showerhead For Improved Plasma Shaping And Control App 20160203953 - Leeser; Karl F. ; et al.	2016-07-14
Method Of Depositing Ammonia Free And Chlorine Free Conformal Silicon Nitride Film App 20160148806 - Henri; Jon ; et al.	2016-05-26
Contoured showerhead for improved plasma shaping and control Grant 9,315,899 - Leeser , et al. April 19, 2	2016-04-19
Methods and apparatuses for uniform reduction of the in-feature wet etch rate of a silicon nitride film formed by ALD Grant 9,214,333 - Sims , et al. December 15, 2	2015-12-15
Plasma enhanced atomic layer deposition with pulsed plasma exposure Grant 9,076,646 - Sims , et al. July 7, 2	2015-07-07
Plasma Enhanced Atomic Layer Deposition With Pulsed Plasma Exposure App 20140113457 - Sims; James S. ; et al.	2014-04-24
Contoured Showerhead For Improved Plasma Shaping And Control App 20130334344 - Leeser; Karl F. ; et al.	2013-12-19
Cascaded cure approach to fabricate highly tensile silicon nitride films Grant 8,512,818 - Varadarajan , et al. August 20, 2	2013-08-20
High compressive stress carbon liners for MOS devices Grant 8,362,571 - Wu , et al. January 29, 2	2013-01-29
Cascaded cure approach to fabricate highly tensile silicon nitride films Grant 8,211,510 - Varadarajan , et al. July 3, 2	2012-07-03
Method for making high stress boron-doped carbon films Grant 7,998,881 - Wu , et al. August 16, 2	2011-08-16
High compressive stress carbon liners for MOS devices Grant 7,906,817 - Wu , et al. March 15, 2	2011-03-15
Method for improving process control and film conformality of PECVD film Grant 7,745,346 - Hausmann , et al. June 29, 2	2010-06-29
Method For Improving Process Control And Film Conformality Of Pecvd Film App 20100099271 - Hausmann; Dennis ; et al.	2010-04-22
PMOS transistor with compressive dielectric capping layer Grant 7,327,001 - Singhal , et al. February 5, 2	2008-02-05
PMOS transistor with compressive dielectric capping layer Grant 7,214,630 - Varadarajan , et al. May 8, 2	2007-05-08
Strained transistor architecture and method Grant 7,041,543 - Varadarajan , et al. May 9, 2	2006-05-09

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