Patent | Date |
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Wet gas compressor systems Grant 8,690,519 - Aalburg , et al. April 8, 2 | 2014-04-08 |
Method and apparatus for measuring air flow condition at a wind turbine blade Grant 8,408,871 - Herr , et al. April 2, 2 | 2013-04-02 |
Wet Gas Compressor Systems App 20120201660 - Aalburg; Christian ;   et al. | 2012-08-09 |
System And Method For Waste Heat Recovery In Exhaust Gas Recirculation App 20110209473 - Fritz; Jassin ;   et al. | 2011-09-01 |
Wind turbine aerodynamic separation control Grant 8,002,524 - Eggleston , et al. August 23, 2 | 2011-08-23 |
Compressed Air Energy Storage System With Reversible Compressor-expander Unit App 20110094212 - Ast; Gabor ;   et al. | 2011-04-28 |
Emission System, Apparatus, And Method App 20100146967 - Simpson; Alexander ;   et al. | 2010-06-17 |
Emission System, Apparatus, And Method App 20100146968 - Simpson; Alexander ;   et al. | 2010-06-17 |
Wind Turbine Aerodynamic Separation Control App 20100143118 - Eggleston; Eric ;   et al. | 2010-06-10 |
Method Of Producing Substoichiometric Oxides Of Titanium By Reduction With Hydrogen App 20100040533 - Simpson; Alexander ;   et al. | 2010-02-18 |
Method And Apparatus For Measuring Air Flow Condition At A Wind Turbine Blade App 20090311096 - Herr; Stefan ;   et al. | 2009-12-17 |
Polishing composition for a tungsten-containing substrate Grant 7,582,127 - Vacassy , et al. September 1, 2 | 2009-09-01 |
Method of polishing a tungsten-containing substrate App 20070266641 - Vacassy; Robert ;   et al. | 2007-11-22 |
Method Of Polishing A Tungsten-containing Substrate App 20070214728 - Vacassy; Robert ;   et al. | 2007-09-20 |
Method of polishing a tungsten-containing substrate Grant 7,247,567 - Vacassy , et al. July 24, 2 | 2007-07-24 |
Method of polishing a tungsten-containing substrate App 20050282391 - Vacassy, Robert ;   et al. | 2005-12-22 |
Method of determining the endpoint of a planarization process Grant 6,932,674 - Lahnor , et al. August 23, 2 | 2005-08-23 |
Chemical mechanical polishing (CMP) process using fixed abrasive pads Grant 6,899,597 - Wrschka , et al. May 31, 2 | 2005-05-31 |
Defect-minimizing, topology-independent planarization of process surfaces in semiconductor devices Grant 6,893,968 - Lahnor , et al. May 17, 2 | 2005-05-17 |
Chemical mechanical polishing (CMP) process using fixed abrasive pads App 20050014454 - Wrschka, Peter ;   et al. | 2005-01-20 |
Method of planarizing substrates Grant 6,827,635 - Lahnor , et al. December 7, 2 | 2004-12-07 |
Method Of Planarizing Substrates App 20040185756 - Lahnor, Peter ;   et al. | 2004-09-23 |
Method Of Determining The Endpoint Of A Planarization Process App 20040176015 - Lahnor, Peter ;   et al. | 2004-09-09 |
Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates Grant 6,740,539 - Conti , et al. May 25, 2 | 2004-05-25 |
Defect-minimizing, topology-independent planarization of process surfaces in semiconductor devices App 20030190809 - Lahnor, Peter ;   et al. | 2003-10-09 |
Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates App 20030153198 - Conti, Richard A. ;   et al. | 2003-08-14 |
Slurry-less chemical-mechanical polishing Grant 6,569,769 - Economikos , et al. May 27, 2 | 2003-05-27 |
Carbon-graded layer for improved adhesion of low-k dielectrics to silicon substrates App 20030017642 - Conti, Richard A. ;   et al. | 2003-01-23 |
Method To Increase Removal Rate Of Oxide Using Fixed-abrasive App 20020197937 - Economikos, Laertis ;   et al. | 2002-12-26 |
Method to increase removal rate of oxide using fixed-abrasive Grant 6,485,355 - Economikos , et al. November 26, 2 | 2002-11-26 |
Increased polish removal rate of dielectric layers using fixed abrasive pads Grant 6,350,692 - Economikos , et al. February 26, 2 | 2002-02-26 |
Boring apparatus Grant 5,120,167 - Simpson June 9, 1 | 1992-06-09 |