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Patent applications and USPTO patent grants for Sim; Guee Hwang.The latest application filed is for "method of forming patterns of semiconductor device".
Patent | Date |
---|---|
Method of forming patterns of semiconductor device Grant 8,318,408 - Jung , et al. November 27, 2 | 2012-11-27 |
Method of manufacturing semiconductor devices Grant 8,221,961 - Sim July 17, 2 | 2012-07-17 |
Method of forming an etching mask pattern from developed negative and positive photoresist layers Grant 7,851,135 - Jung , et al. December 14, 2 | 2010-12-14 |
Method of manufacturing flash memory device Grant 7,687,403 - Sim , et al. March 30, 2 | 2010-03-30 |
Method of Forming Patterns of Semiconductor Device App 20100021849 - Jung; Woo Yung ;   et al. | 2010-01-28 |
Method of fabricating semiconductor device Grant 7,651,933 - Sim January 26, 2 | 2010-01-26 |
Overlay accuracy measurement vernier and method of forming the same Grant 7,638,263 - Sim December 29, 2 | 2009-12-29 |
Method of forming pattern of semiconductor device Grant 7,595,145 - Sim , et al. September 29, 2 | 2009-09-29 |
Method Of Manufacturing Semiconductor Devices App 20090181327 - SIM; Guee Hwang | 2009-07-16 |
Method Of Forming Pattern Of Semiconductor Device App 20090170033 - Jung; Woo Yung ;   et al. | 2009-07-02 |
Method Of Forming Mask Pattern App 20090142711 - Jung; Woo Yung ;   et al. | 2009-06-04 |
Method Of Fabricating Semiconductor Device App 20090053879 - SIM; Guee-Hwang | 2009-02-26 |
Method of Fabricating Semiconductor Device App 20080268607 - Sim; Guee Hwang | 2008-10-30 |
Method Of Forming Pattern Of Semiconductor Device App 20080081297 - Sim; Guee Hwang ;   et al. | 2008-04-03 |
Method Of Manufacturing Flash Memory Device App 20080064216 - Sim; Guee Hwang ;   et al. | 2008-03-13 |
Overlay accuracy measurement vernier and method of forming the same App 20070212650 - Sim; Guee Hwang | 2007-09-13 |
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