Sieg; Stuart A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Sieg; Stuart A..The latest application filed is for "alternating hardmasks for tight-pitch line formation".

Company Profile

35.58.52

Sieg; Stuart A. - Albany NY
Sieg; Stuart A. - Hopewell Junction NY US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Fin field effect transistor devices with self-aligned gates Grant 11,183,389 - Xu , et al. November 23, 2	2021-11-23
Alternating hardmasks for tight-pitch line formation Grant 11,171,002 - Arnold , et al. November 9, 2	2021-11-09
Alternating Hardmasks For Tight-pitch Line Formation App 20210335619 - Burns; Sean D. ; et al.	2021-10-28
Tunable hardmask for overlayer metrology contrast Grant 11,121,024 - De Silva , et al. September 14, 2	2021-09-14
Alternating hardmasks for tight-pitch line formation Grant 11,031,248 - Burns , et al. June 8, 2	2021-06-08
Fin cut profile using fin base liner Grant 10,985,025 - Miller , et al. April 20, 2	2021-04-20
Vertical transport devices with greater density through modified well shapes Grant 10,943,911 - Anderson , et al. March 9, 2	2021-03-09
Measuring and modeling material planarization performance Grant 10,832,919 - Lallement , et al. November 10, 2	2020-11-10
Vertical transistors having multiple gate thicknesses for optimizing performance and device density Grant 10,811,508 - Anderson , et al. October 20, 2	2020-10-20
Vertical transistors having multiple gate thicknesses for optimizing performance and device density Grant 10,811,507 - Anderson , et al. October 20, 2	2020-10-20
Fin Field Effect Transistor Devices With Self-aligned Gates App 20200294803 - Xu; Wenyu ; et al.	2020-09-17
Alternating Hardmasks For Tight-pitch Line Formation App 20200266066 - Arnold; John C. ; et al.	2020-08-20
Controlling fin hardmask cut profile using a sacrificial epitaxial structure Grant 10,741,452 - Miller , et al. A	2020-08-11
Vertical transport static random-access memory cells with transistors of active regions arranged in linear rows Grant 10,734,372 - Anderson , et al.	2020-08-04
Controlling gate length of vertical transistors Grant 10,665,715 - Joseph , et al.	2020-05-26
Semiconductor Fin Length Variability Control App 20200144069 - Joseph; Praveen ; et al.	2020-05-07
Verifying planarization performance using electrical measures Grant 10,642,950 - Lallement , et al.	2020-05-05
Fin Cut Profile Using Fin Base Liner App 20200135484 - Miller; Eric R. ; et al.	2020-04-30
Controlling Fin Hardmask Cut Profile Using A Sacrificial Epitaxial Structure App 20200135570 - Miller; Eric R. ; et al.	2020-04-30
Approach to prevent collapse of high aspect ratio Fin structures for vertical transport Fin field effect transistor devices Grant 10,629,489 - Seshadri , et al.	2020-04-21
Tunable hardmask for overlayer metrology contrast Grant 10,622,248 - De Silva , et al.	2020-04-14
Approach To Prevent Collapse Of High Aspect Ratio Fin Structures For Vertical Transport Fin Field Effect Transistor Devices App 20200098639 - Seshadri; Indira ; et al.	2020-03-26
Controlling Gate Length Of Vertical Transistors App 20200075761 - Joseph; Praveen ; et al.	2020-03-05
Alternating hardmasks for tight-pitch line formation Grant 10,580,652 - Arnold , et al.	2020-03-03
Alternating Hard Mask For Tight-pitch Fin Formation App 20200066520 - ARNOLD; JOHN C. ; et al.	2020-02-27
Semiconductor fin length variability control Grant 10,535,529 - Joseph , et al. Ja	2020-01-14
Tunable Hardmask For Overlayer Metrology Contrast App 20190371651 - De Silva; Ekmini A. ; et al.	2019-12-05
Semiconductor Fin Length Variability Control App 20190371613 - Joseph; Praveen ; et al.	2019-12-05
Inverse Tone Direct Print Euv Lithography Enabled By Selective Material Deposition App 20190355625 - JOSEPH; Praveen ; et al.	2019-11-21
Alternating Hardmasks For Tight-pitch Line Formation App 20190333774 - Burns; Sean D. ; et al.	2019-10-31
Vertical transistors having improved gate length control using uniformly deposited spacers Grant 10,461,172 - Waskiewicz , et al. Oc	2019-10-29
Measuring And Modeling Material Planarization Performance App 20190318935 - Lallement; Romain ; et al.	2019-10-17
Vertical Transport Devices With Greater Density Through Modified Well Shapes App 20190319032 - Anderson; Brent A. ; et al.	2019-10-17
Vertical Transport Static Random-access Memory Cells With Transistors Of Active Regions Arranged In Linear Rows App 20190287957 - Anderson; Brent A. ; et al.	2019-09-19
Alternating hardmasks for tight-pitch line formation Grant 10,410,875 - Burns , et al. Sept	2019-09-10
Verifying Planarization Performance Using Electrical Measures App 20190243927 - Lallement; Romain ; et al.	2019-08-08
Self-aligned double patterning formed fincut Grant 10,361,129 - Sieg , et al.	2019-07-23
Tunable Hardmask For Overlayer Metrology Contrast App 20190206722 - De Silva; Ekmini A. ; et al.	2019-07-04
Vertical Transistors Having Improved Gate Length Control Using Uniformly Deposited Spacers App 20190198642 - Waskiewicz; Christopher J. ; et al.	2019-06-27
Alternating hardmasks for tight-pitch line formation Grant 10,312,103 - Burns , et al.	2019-06-04
Vertical transistor with variable gate length Grant 10,312,346 - Anderson , et al.	2019-06-04
Inverse tone direct print EUV lithography enabled by selective material deposition Grant 10,304,744 - Joseph , et al.	2019-05-28
Margin for fin cut using self-aligned triple patterning Grant 10,304,689 - Karve , et al.	2019-05-28
Gate cut on a vertical field effect transistor with a defined-width inorganic mask Grant 10,249,753 - Anderson , et al.	2019-04-02
Registration mark formation during sidewall image transfer process Grant 10,242,952 - Conklin , et al.	2019-03-26
Vertical Transistors Having Multiple Gate Thicknesses App 20190088755 - Anderson; Brent A. ; et al.	2019-03-21
Vertical Transistors Having Multiple Gate Thicknesses App 20190088754 - Anderson; Brent A. ; et al.	2019-03-21
Stress retention in fins of fin field-effect transistors Grant 10,211,321 - Kanakasabapathy , et al. Feb	2019-02-19
Stress retention in fins of fin field-effect transistors Grant 10,211,319 - Kanakasabapathy , et al. Feb	2019-02-19
Direct gate patterning for vertical transport field effect transistor Grant 10,176,997 - De Silva , et al. J	2019-01-08
Alternating Hardmasks For Tight-pitch Line Formation App 20180350600 - Arnold; John C. ; et al.	2018-12-06
Registration Mark Formation During Sidewall Image Transfer Process App 20180331047 - Conklin; David J. ; et al.	2018-11-15
Structure and process to tuck fin tips self-aligned to gates Grant 10,121,852 - Doris , et al. November 6, 2	2018-11-06
Pitch scalable active area patterning structure and process for multi-channel fin FET technologies Grant 10,121,785 - Kanakasabapathy , et al. November 6, 2	2018-11-06
Structure and process to tuck fin tips self-aligned to gates Grant 10,121,853 - Doris , et al. November 6, 2	2018-11-06
Alternating hardmasks for tight-pitch line formation Grant 10,103,022 - Arnold , et al. October 16, 2	2018-10-16
Alternating Hardmasks For Tight-pitch Line Formation App 20180269060 - Arnold; John C. ; et al.	2018-09-20
Alternating Hardmasks For Tight-pitch Line Formation App 20180247824 - Burns; Sean D. ; et al.	2018-08-30
Alternating Hardmasks For Tight-pitch Line Formation App 20180247825 - Burns; Sean D. ; et al.	2018-08-30
Margin For Fin Cut Using Self-aligned Triple Patterning App 20180226262 - KARVE; Gauri ; et al.	2018-08-09
Registration mark formation during sidewall image transfer process Grant 10,043,760 - Conklin , et al. August 7, 2	2018-08-07
Strained finFET device fabrication Grant 10,032,680 - Doris , et al. July 24, 2	2018-07-24
Margin for fin cut using self-aligned triple patterning Grant 9,997,369 - Karve , et al. June 12, 2	2018-06-12
Vertical Transistor With Variable Gate Length App 20180108754 - Anderson; Brent A. ; et al.	2018-04-19
Stress Retention In Fins Of Fin Field-effect Transistors App 20180108752 - Kanakasabapathy; Sivananda K. ; et al.	2018-04-19
Gate Cut On A Vertical Field Effect Transistor With A Defined-width Inorganic Mask App 20180097107 - Anderson; Brent A. ; et al.	2018-04-05
Margin For Fin Cut Using Self-aligned Triple Patterning App 20180090335 - KARVE; Gauri ; et al.	2018-03-29
Strained FinFET device fabrication Grant 9,917,019 - Doris , et al. March 13, 2	2018-03-13
Registration Mark Formation During Sidewall Image Transfer Process App 20180061773 - Conklin; David J. ; et al.	2018-03-01
Structure And Process To Tuck Fin Tips Self-aligned To Gates App 20180061941 - Doris; Bruce B. ; et al.	2018-03-01
Structure And Process To Tuck Fin Tips Self-aligned To Gates App 20180061942 - Doris; Bruce B. ; et al.	2018-03-01
Gate cut on a vertical field effect transistor with a defined-width inorganic mask Grant 9,882,048 - Anderson , et al. January 30, 2	2018-01-30
Structure and process to tuck fin tips self-aligned to gates Grant 9,876,074 - Doris , et al. January 23, 2	2018-01-23
Gate Cut On A Vertical Field Effect Transistor With A Defined-width Inorganic Mask App 20180006150 - Anderson; Brent A. ; et al.	2018-01-04
Registration mark formation during sidewall image transfer process Grant 9,859,224 - Conklin , et al. January 2, 2	2018-01-02
Self-aligned quadruple patterning process Grant 9,842,737 - Colburn , et al. December 12, 2	2017-12-12
Methods to control fin tip placement Grant 9,812,324 - Zhuang , et al. November 7, 2	2017-11-07
Strained finFET device fabrication Grant 9,805,991 - Doris , et al. October 31, 2	2017-10-31
Strained finFET device fabrication Grant 9,805,992 - Doris , et al. October 31, 2	2017-10-31
Stress Retention In Fins Of Fin Field-effect Transistors App 20170301770 - Kanakasabapathy; Sivananda K. ; et al.	2017-10-19
Stress retention in fins of fin field-effect transistors Grant 9,741,856 - Kanakasabapathy , et al. August 22, 2	2017-08-22
Cutting fins and gates in CMOS devices Grant 9,721,848 - Bu , et al. August 1, 2	2017-08-01
Pitch Scalable Active Area Patterning Structure & Process For Multi-channel Fin Fet Technologies App 20170213825 - KANAKASABAPATHY; SIVANANDA K. ; et al.	2017-07-27
Stress Retention In Fins Of Fin Field-effect Transistors App 20170162685 - Kanakasabapathy; Sivananda K. ; et al.	2017-06-08
Gate cutting for a vertical transistor device Grant 9,673,199 - Anderson , et al. June 6, 2	2017-06-06
Pitch scalable active area patterning structure and process for multi-channel finFET technologies Grant 9,589,958 - Kanakasabapathy , et al. March 7, 2	2017-03-07
Strained Finfet Device Fabrication App 20170054002 - Doris; Bruce B. ; et al.	2017-02-23
Strained Finfet Device Fabrication App 20170053942 - Doris; Bruce B. ; et al.	2017-02-23
Strained Finfet Device Fabrication App 20170054024 - Doris; Bruce B. ; et al.	2017-02-23
Strained Finfet Device Fabrication App 20170053838 - Doris; Bruce B. ; et al.	2017-02-23
Registration Mark Formation During Sidewall Image Transfer Process App 20160358861 - Conklin; David J. ; et al.	2016-12-08
Structure And Process To Tuck Fin Tips Self-aligned To Gates App 20160343861 - Doris; Bruce B. ; et al.	2016-11-24
Strained finFET device fabrication Grant 9,502,411 - Doris , et al. November 22, 2	2016-11-22
Registration mark formation during sidewall image transfer process Grant 9,472,506 - Conklin , et al. October 18, 2	2016-10-18
Registration Mark Formation During Sidewall Image Transfer Process App 20160247766 - Conklin; David J. ; et al.	2016-08-25
Self-aligned Quadruple Patterning Process App 20160163600 - COLBURN; Matthew E. ; et al.	2016-06-09
Self-aligned quadruple patterning process Grant 9,305,845 - Colburn , et al. April 5, 2	2016-04-05
Selectively grown self-aligned fins for deep isolation integration Grant 9,293,375 - Petrarca , et al. March 22, 2	2016-03-22
Self-aligned Quadruple Patterning Process App 20160071771 - COLBURN; Matthew E. ; et al.	2016-03-10
Patterning assist feature to mitigate reactive ion etch microloading effect Grant 9,252,022 - Dechene , et al. February 2, 2	2016-02-02
finFET isolation by selective cyclic etch Grant 9,209,178 - Kanakasabapathy , et al. December 8, 2	2015-12-08
Selectively Grown Self-aligned Fins For Deep Isolation Integration App 20150311121 - Petrarca; Kevin S. ; et al.	2015-10-29
finFET Isolation by Selective Cyclic Etch App 20150145065 - Kanakasabapathy; Sivananda K. ; et al.	2015-05-28
Front Side Wafer Id Processing App 20140256130 - Farooq; Mukta G. ; et al.	2014-09-11
Front side wafer ID processing Grant 8,822,141 - Farooq , et al. September 2, 2	2014-09-02
SEM repair for sub-optimal features Grant 8,450,120 - Sieg , et al. May 28, 2	2013-05-28
Sem Repair For Sub-optimal Features App 20120187294 - Sieg; Stuart A. ; et al.	2012-07-26
Sem Repair For Sub-optimal Features App 20120190134 - Sieg; Stuart A. ; et al.	2012-07-26
SEM repair for sub-optimal features Grant 8,211,717 - Sieg , et al. July 3, 2	2012-07-03