| Patent | Date |
|---|
Fluid Collection Assemblies Including At Least One Securement Body
App 20220211536 - Johannes; Ashley Marie ; et al. | 2022-07-07 |
Carrying and Storage Case for External Catheter System
App 20220152343 - Daw; Kyle ; et al. | 2022-05-19 |
Gate Oxide For Nanosheet Transistor Devices
App 20220069104 - Siddiqui; Shahab ; et al. | 2022-03-03 |
Vertical Transistor Having An Oxygen-blocking Top Spacer
App 20210408261 - Zhang; Chen ; et al. | 2021-12-30 |
Gate oxide for nanosheet transistor devices
Grant 11,211,474 - Siddiqui , et al. December 28, 2 | 2021-12-28 |
Precise Bottom Junction Formation For Vertical Transport Field Effect Transistor With Highly Doped Epitaxial Source/drain, Sharp Junction Gradient, And/or Reduced Parasitic Capacitance
App 20210391473 - Zhao; Kai ; et al. | 2021-12-16 |
Gate Oxide For Nanosheet Transistor Devices
App 20210217873 - Siddiqui; Shahab ; et al. | 2021-07-15 |
DEFECT FREE SILICON GERMANIUM (SiGe) EPITAXY GROWTH IN A LOW-K SPACER CAVITY AND METHOD FOR PRODUCING THE SAME
App 20190326112 - SIDDIQUI; Shahab ; et al. | 2019-10-24 |
High K Metal Gate Stack With Single Work-function Metal
App 20190318966 - Ando; Takashi ; et al. | 2019-10-17 |
Methods, apparatus and system for forming a FinFET device comprising a first portion capable of operating at a first voltage and a second portion capable of operating at a second voltage
Grant 10,438,853 - Siddiqui , et al. O | 2019-10-08 |
Gate Skirt Oxidation For Improved Finfet Performance And Method For Producing The Same
App 20190305105 - GAO; Qun ; et al. | 2019-10-03 |
Methods and structure to form high K metal gate stack with single work-function metal
Grant 10,395,993 - Ando , et al. A | 2019-08-27 |
Gate oxide formation through hybrid methods of thermal and deposition processes and method for producing the same
Grant 10,361,289 - Zhao , et al. | 2019-07-23 |
Methods, Apparatus And System For Forming A Finfet Device Comprising A First Portion Capable Of Operating At A First Voltage And
App 20190157157 - Siddiqui; Shahab ; et al. | 2019-05-23 |
Thermal oxide equivalent low temperature ALD oxide for dual purpose gate oxide and method for producing the same
Grant 10,106,892 - Siddiqui , et al. October 23, 2 | 2018-10-23 |
Integrated circuit structure having thin gate dielectric device and thick gate dielectric device
Grant 9,806,161 - Khan , et al. October 31, 2 | 2017-10-31 |
Integrated Circuit Structure Having Thin Gate Dielectric Device And Thick Gate Dielectric Device
App 20170294519 - Khan; Shahrukh A. ; et al. | 2017-10-12 |
Higher `K` gate dielectric cap for replacement metal gate (RMG) FINFET devices
Grant 9,741,720 - Siddiqui , et al. August 22, 2 | 2017-08-22 |
TSV deep trench capacitor and anti-fuse structure
Grant 9,741,657 - Filippi , et al. August 22, 2 | 2017-08-22 |
Fabrication Of Higher-k Dielectrics
App 20170170077 - Chudzik; Michael P. ; et al. | 2017-06-15 |
Fabrication of higher-K dielectrics
Grant 9,673,108 - Chudzik , et al. June 6, 2 | 2017-06-06 |
Methods And Structure To Form High K Metal Gate Stack With Single Work-function Metal
App 20170025315 - Ando; Takashi ; et al. | 2017-01-26 |
Methods and structure to form high K metal gate stack with single work-function metal
Grant 9,515,164 - Ando , et al. December 6, 2 | 2016-12-06 |
Fabrication of higher-k dielectrics
Grant 9,478,425 - Chudzik , et al. October 25, 2 | 2016-10-25 |
Multiple thickness gate dielectrics for replacement gate field effect transistors
Grant 9,368,593 - Kwon , et al. June 14, 2 | 2016-06-14 |
Multi-plasma nitridation process for a gate dielectric
Grant 9,252,232 - Chudzik , et al. February 2, 2 | 2016-02-02 |
Multiple Thickness Gate Dielectrics For Replacement Gate Field Effect Transistors
App 20160027893 - Kwon; Unoh ; et al. | 2016-01-28 |
Multiple thickness gate dielectrics for replacement gate field effect transistors
Grant 9,224,826 - Kwon , et al. December 29, 2 | 2015-12-29 |
High-K dielectric structure for deep trench isolation
Grant 9,224,740 - Polvino , et al. December 29, 2 | 2015-12-29 |
Multi-plasma nitridation process for a gate dielectric
Grant 9,196,700 - Chudzik , et al. November 24, 2 | 2015-11-24 |
Annealing oxide gate dielectric layers for replacement metal gate field effect transistors
Grant 9,177,868 - Kwon , et al. November 3, 2 | 2015-11-03 |
Annealing Oxide Gate Dielectric Layers For Replacement Metal Gate Field Effect Transistors
App 20150279744 - Kwon; Unoh ; et al. | 2015-10-01 |
Methods And Structure To Form High K Metal Gate Stack With Single Work-function Metal
App 20150255463 - Ando; Takashi ; et al. | 2015-09-10 |
Tsv Deep Trench Capacitor And Anti-fuse Structure
App 20150235944 - Filippi; Ronald G. ; et al. | 2015-08-20 |
Multiple Thickness Gate Dielectrics For Replacement Gate Field Effect Transistors
App 20150228747 - Kwon; Unoh ; et al. | 2015-08-13 |
Method of manufacturing scaled equivalent oxide thickness gate stacks in semiconductor devices and related design structure
Grant 9,099,461 - Chudzik , et al. August 4, 2 | 2015-08-04 |
Semiconductor devices having different gate oxide thicknesses
Grant 9,087,722 - Adams , et al. July 21, 2 | 2015-07-21 |
Structure and method of T.sub.inv scaling for high k metal gate technology
Grant 9,087,784 - Chudzik , et al. July 21, 2 | 2015-07-21 |
Multi-plasma Nitridation Process For A Gate Dielectric
App 20150187901 - Chudzik; Michael P. ; et al. | 2015-07-02 |
Multi-plasma Nitridation Process For A Gate Dielectric
App 20150179459 - Chudzik; Michael P. ; et al. | 2015-06-25 |
Structure and method for replacement gate MOSFET with self-aligned contact using sacrificial mandrel dielectric
Grant 9,040,369 - Siddiqui , et al. May 26, 2 | 2015-05-26 |
Composite high-k gate dielectric stack for reducing gate leakage
Grant 9,029,959 - Brodsky , et al. May 12, 2 | 2015-05-12 |
Multi-plasma nitridation process for a gate dielectric
Grant 9,006,064 - Chudzik , et al. April 14, 2 | 2015-04-14 |
Structure and method of T.sub.inv scaling for high k metal gate technology
Grant 9,006,837 - Chudzik , et al. April 14, 2 | 2015-04-14 |
Semiconductor Devices Having Different Gate Oxide Thicknesses
App 20150069525 - Adams; Charlotte D. ; et al. | 2015-03-12 |
Germanium oxide free atomic layer deposition of silicon oxide and high-k gate dielectric on germanium containing channel for CMOS devices
Grant 8,952,460 - Brodsky , et al. February 10, 2 | 2015-02-10 |
Semiconductor devices having different gate oxide thicknesses
Grant 8,941,177 - Adams , et al. January 27, 2 | 2015-01-27 |
Structure and method to form input/output devices
Grant 8,836,037 - Ando , et al. September 16, 2 | 2014-09-16 |
Multi-plasma Nitridation Process For A Gate Dielectric
App 20140252503 - Chudzik; Michael P. ; et al. | 2014-09-11 |
Germanium oxide free atomic layer deposition of silicon oxide and high-k gate dielectric on germanium containing channel for CMOS devices
Grant 8,809,152 - Brodsky , et al. August 19, 2 | 2014-08-19 |
STRUCTURE AND METHOD OF Tinv SCALING FOR HIGH k METAL GATE TECHNOLOGY
App 20140170844 - Chudzik; Michael P. ; et al. | 2014-06-19 |
Germanium Oxide Free Atomic Layer Deposition Of Silicon Oxide And High-k Gate Dielectric On Germanium Containing Channel For Cmos Devices
App 20140061819 - Brodsky; MaryJane ; et al. | 2014-03-06 |
Structure And Method To Form Input/output Devices
App 20140042546 - Ando; Takashi ; et al. | 2014-02-13 |
Structure and method of T.sub.inv scaling for high .kappa. metal gate technology
Grant 8,643,115 - Chudzik , et al. February 4, 2 | 2014-02-04 |
Semiconductor Devices Having Different Gate Oxide Thicknesses
App 20140001575 - Adams; Charlotte DeWan ; et al. | 2014-01-02 |
Composite High-k Gate Dielectric Stack For Reducing Gate Leakage
App 20140001570 - Brodsky; MaryJane ; et al. | 2014-01-02 |
Method Of Manufacturing Scaled Equivalent Oxide Thickness Gate Stacks In Semiconductor Devices And Related Design Structure
App 20130330843 - Chudzik; Michael P. ; et al. | 2013-12-12 |
STRUCTURE AND METHOD OF Tinv SCALING FOR HIGH k METAL GATE TECHNOLOGY
App 20130187239 - Chudzik; Michael P. ; et al. | 2013-07-25 |
Fabrication of silicon oxide and oxynitride having sub-nanometer thickness
Grant 8,492,290 - Chudzik , et al. July 23, 2 | 2013-07-23 |
Structure And Method For Replacement Gate Mosfet With Self-aligned Contact Using Sacrificial Mandrel Dielectric
App 20130143377 - Siddiqui; Shahab ; et al. | 2013-06-06 |
Germanium Oxide Free Atomic Layer Deposition Of Silicon Oxide And High-k Gate Dielectric On Germanium Containing Channel For Cmos Devices
App 20130126986 - Brodsky; MaryJane ; et al. | 2013-05-23 |
Method to prevent surface decomposition of III-V compound semiconductors
Grant 8,431,476 - de Souza , et al. April 30, 2 | 2013-04-30 |
Replacement gate MOSFET with self-aligned diffusion contact
Grant 8,421,077 - Jain , et al. April 16, 2 | 2013-04-16 |
Method to prevent surface decomposition of III-V compound semiconductors
Grant 8,415,772 - de Souza , et al. April 9, 2 | 2013-04-09 |
Structure and method for replacement gate MOSFET with self-aligned contact using sacrificial mandrel dielectric
Grant 8,373,239 - Siddiqui , et al. February 12, 2 | 2013-02-12 |
Hybrid bonding interface for 3-dimensional chip integration
Grant 8,349,729 - Barth , et al. January 8, 2 | 2013-01-08 |
Fabrication Of Silicon Oxide And Oxynitride Having Sub-nanometer Thickness
App 20120329230 - Chudzik; Michael P. ; et al. | 2012-12-27 |
Method To Prevent Surface Decomposition Of Iii-v Compound Semiconductors
App 20120309153 - de Souza; Joel P. ; et al. | 2012-12-06 |
Method To Prevent Surface Decomposition Of Iii-v Compound Semiconductors
App 20120305989 - de Souza; Joel P. ; et al. | 2012-12-06 |
Method to prevent surface decomposition of III-V compound semiconductors
Grant 8,273,649 - de Souza , et al. September 25, 2 | 2012-09-25 |
STRUCTURE AND METHOD OF Tinv SCALING FOR HIGH k METAL GATE TECHNOLOGY
App 20120181616 - Chudzik; Michael P. ; et al. | 2012-07-19 |
Hybrid Bonding Interface For 3-dimensional Chip Integration
App 20120171818 - Barth; Karl W. ; et al. | 2012-07-05 |
Hybrid bonding interface for 3-dimensional chip integration
Grant 8,159,060 - Barth , et al. April 17, 2 | 2012-04-17 |
Replacement Gate Mosfet With Self-aligned Diffusion Contact
App 20110298017 - Jain; Sameer H. ; et al. | 2011-12-08 |
Structure And Method For Replacement Gate Mosfet With Self-aligned Contact Using Sacrificial Mandrel Dielectric
App 20110298061 - Siddiqui; Shahab ; et al. | 2011-12-08 |
Method to create region specific exposure in a layer
Grant 7,977,032 - Dimitrakopoulos , et al. July 12, 2 | 2011-07-12 |
Hybrid Bonding Interface For 3-dimensional Chip Integration
App 20110101537 - Barth; Karl W. ; et al. | 2011-05-05 |
Metal interconnect and IC chip including metal interconnect
Grant 7,851,919 - Barth , et al. December 14, 2 | 2010-12-14 |
Metal Interconnect And Ic Chip Including Metal Interconnect
App 20100133694 - Barth; Karl W. ; et al. | 2010-06-03 |
Method To Prevent Surface Decomposition Of Iii-v Compound Semiconductors
App 20100123205 - de Souza; Joel P. ; et al. | 2010-05-20 |
Metal interconnect forming methods and IC chip including metal interconnect
Grant 7,718,525 - Barth , et al. May 18, 2 | 2010-05-18 |
Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent
Grant 7,645,694 - Colburn , et al. January 12, 2 | 2010-01-12 |
Method to create air gaps using non-plasma processes to damage ILD materials
Grant 7,531,444 - Dimitrakopoulos , et al. May 12, 2 | 2009-05-12 |
Self-assembled Material Pattern Transfer Contrast Enhancement
App 20090117360 - Clevenger; Lawrence A. ; et al. | 2009-05-07 |
Metal Interconnect Forming Methods And Ic Chip Including Metal Interconnect
App 20090001592 - Barth; Karl W. ; et al. | 2009-01-01 |
DEVELOPMENT OR REMOVAL OF BLOCK COPOLYMER OR PMMA-b-S-BASED RESIST USING POLAR SUPERCRITICAL SOLVENT
App 20080248655 - Colburn; Matthew E. ; et al. | 2008-10-09 |
Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent
Grant 7,407,554 - Colburn , et al. August 5, 2 | 2008-08-05 |
DEVELOPMENT OR REMOVAL OF BLOCK COPOLYMER OR PMMA-b-S-BASED RESIST USING POLAR SUPERCRITICAL SOLVENT
App 20060228653 - Colburn; Matthew E. ; et al. | 2006-10-12 |
Method To Create Air Gaps Using Non-plasma Processes To Damage Ild Materials
App 20060183315 - Dimitrakopoulos; Christos D. ; et al. | 2006-08-17 |
Method To Create Region Specific Exposure In A Layer
App 20060183062 - Dimitrakopoulos; Christos D. ; et al. | 2006-08-17 |
Process for removing impurities from low dielectric constant films disposed on semiconductor devices
App 20050087490 - Chace, Mark S. ; et al. | 2005-04-28 |
Method for reworking low-k polymers used in semiconductor structures
Grant 6,864,180 - Restaino , et al. March 8, 2 | 2005-03-08 |
Method for eliminating via resistance shift in organic ILD
Grant 6,806,182 - Restaino , et al. October 19, 2 | 2004-10-19 |
Method for eliminating VIA resistance shift in organic ILD
App 20030207559 - Restaino, Darryl ; et al. | 2003-11-06 |
Film planarization for low-k polymers used in semiconductor structures
Grant 6,638,878 - Restaino , et al. October 28, 2 | 2003-10-28 |
Method for reworking low-K polymers used in semiconductor structures
App 20030062336 - Restaino, Darryl D. ; et al. | 2003-04-03 |
Film planarization for low-k polymers used in semiconductor structures
App 20030064605 - Restaino, Darryl D. ; et al. | 2003-04-03 |
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