loadpatents
name:-0.011876106262207
name:-0.0049982070922852
name:-0.00051498413085938
SICRYSTAL AG Patent Filings

SICRYSTAL AG

Patent Applications and Registrations

Patent applications and USPTO patent grants for SICRYSTAL AG.The latest application filed is for "method for producing a vanadium-doped silicon carbide volume monocrystal, and vanadium-doped silicon carbide substrate".

Company Profile
0.6.11
  • SICRYSTAL AG - Nuremberg N/A DE
  • SICRYSTAL AG - Nuernberg DE
  • SICRYSTAL AG - Nurnberg DE
  • SiCrystal AG - ERLANGEN DE
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method for producing a vanadium-doped silicon carbide volume monocrystal, and vanadium-doped silicon carbide substrate
Grant 9,732,438 - Mueller , et al. August 15, 2
2017-08-15
Physical vapor transport growth system for simultaneously growing more than one SiC single crystal and method of growing
Grant 9,376,764 - Straubinger , et al. June 28, 2
2016-06-28
Method For Producing A Vanadium-doped Silicon Carbide Volume Monocrystal, And Vanadium-doped Silicon Carbide Substrate
App 20160068994 - MUELLER; RALF ;   et al.
2016-03-10
Production method for a bulk SiC single crystal with a large facet and monocrystalline SiC substrate with homogeneous resistance distribution
Grant 8,865,324 - Straubinger , et al. October 21, 2
2014-10-21
Physical Vapor Transport Growth System For Simultaneously Growing More Than One SIC Single Crystal and Method of Growing
App 20130305983 - Straubinger; Thomas Ludwig ;   et al.
2013-11-21
Production Method For An Sic Volume Monocrystal With A Homogeneous Lattice Plane Course And A Monocrystalline Sic Substrate With A Homogeneous Lattice Plane Course
App 20130171402 - STRAUBINGER; THOMAS ;   et al.
2013-07-04
Production Method For An Sic Volume Monocrystal With A Non-homogeneous Lattice Plane Course And A Monocrystalline Sic Substrate With A Non-homogeneous Lattice Plane Course
App 20130171403 - STRAUBINGER; THOMAS ;   et al.
2013-07-04
Low-dislocation Monocrystalline Aln Substrate
App 20120308759 - BARZ; RALPH-UWE ;   et al.
2012-12-06
Production method for a low-dislocation bulk AlN single crystal and low-dislocation monocrystalline AlN substrate
Grant 8,303,924 - Barz , et al. November 6, 2
2012-11-06
Production Method For A Bulk Sic Single Crystal With A Large Facet And Monocrystalline Sic Substrate With Homogeneous Resistance Distribution
App 20110300323 - STRAUBINGER; THOMAS ;   et al.
2011-12-08
Method Of Producing A Silicon Carbide Bulk Single Crystal With Thermal Treatment, And Low-impedance Monocrystalline Silicon Carbide Substrate
App 20110086213 - STRAUBINGER; THOMAS ;   et al.
2011-04-14
Production Method For A Low-dislocation Bulk Aln Single Crystal And Low-dislocation Monocrystalline Aln Substrate
App 20100255305 - Barz; Ralph-Uwe ;   et al.
2010-10-07
Thermally Insulated Configuration And Method For Producing A Bulk Sic Crystal
App 20100175614 - Straubinger; Thomas
2010-07-15
Production Method for a Codoped Bulk SiC Crystal and High-Impedance SiC Substrate
App 20100159182 - Straubinger; Thomas ;   et al.
2010-06-24

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed