Shuto; Mitsutoshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shuto; Mitsutoshi.The latest application filed is for "impedance matching apparatus for plasma-enhanced reaction reactor".

Company Profile

0.3.6

Shuto; Mitsutoshi - Tama JP
Shuto; Mitsutoshi - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of plasma treatment using amplitude-modulated RF power Grant 8,021,723 - Fukasawa , et al. September 20, 2	2011-09-20
Impedance Matching Apparatus For Plasma-enhanced Reaction Reactor App 20100085129 - Shuto; Mitsutoshi ; et al.	2010-04-08
Method Of Plasma Treatment Using Amplitude-modulated Rf Power App 20090136683 - Fukasawa; Yasushi ; et al.	2009-05-28
DC bias voltage measurement circuit and plasma CVD apparatus comprising the same Grant 7,514,934 - Shuto , et al. April 7, 2	2009-04-07
Method And Apparatus For Monitoring Plasma-induced Damage Using Dc Floating Potential Of Substrate App 20090056627 - SHUTO; Mitsutoshi ; et al.	2009-03-05
Plasma Cvd Apparatus Equipped With Plasma Blocking Insulation Plate App 20070266945 - Shuto; Mitsutoshi ; et al.	2007-11-22
DC bias voltage measurement circuit and plasma CVD apparatus comprising the same App 20060063284 - Shuto; Mitsutoshi ; et al.	2006-03-23
Semiconductor substrate supporting apparatus App 20050037626 - Shuto, Mitsutoshi ; et al.	2005-02-17
Substrate supporting apparatus for a CVD apparatus Grant 5,192,371 - Shuto , et al. March 9, 1	1993-03-09

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