Shu; Emily

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shu; Emily.The latest application filed is for "method for reducing contamination in extreme ultraviolet lithography light source".

Company Profile

0.6.7

Shu; Emily - Shanghai CN

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method for reducing contamination in extreme ultraviolet lithography light source Grant 9,665,017 - Shu May 30, 2	2017-05-30
Method For Reducing Contamination In Extreme Ultraviolet Lithography Light Source App 20160018739 - SHU; EMILY	2016-01-21
System and method for reducing contamination in extreme ultraviolet lithography light source Grant 9,176,400 - Shu November 3, 2	2015-11-03
Transistors and fabrication method Grant 9,054,021 - Xiao , et al. June 9, 2	2015-06-09
System And Method For Reducing Contamination In Extreme Ultraviolet Lithography Light Source App 20150034844 - SHU; EMILY	2015-02-05
Apparatus and method for holding a wafer Grant 8,929,051 - Shu January 6, 2	2015-01-06
Apparatus and method for holding a wafer Grant 8,917,489 - Shu December 23, 2	2014-12-23
Transistors And Fabrication Method App 20140145269 - XIAO; DEYUAN ; et al.	2014-05-29
Apparatus And Method For Holding A Wafer App 20130100572 - SHU; EMILY	2013-04-25
Apparatus And Method For Holding A Wafer App 20130100573 - SHU; EMILY	2013-04-25

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