Shiu; Lin-Hung
Patent Applications and Registrations
Patent applications and USPTO patent grants for Shiu; Lin-Hung.The latest application filed is for "lithography method with surface modification layer".
- Shiu; Lin-Hung - Hsinchu TW
- Shiu; Lin-Hung - Hsinchu City TW
- Shiu, Lin-Hung - Ilan TW
| Patent | Date |
|---|---|
| Lithography method with surface modification layer Grant 10,101,659 - Chen , et al. October 16, 2 | 2018-10-16 |
| Lithography Method with Surface Modification Layer App 20180047561 - Chen; Shu-Fang ; et al. | 2018-02-15 |
| Hood for immersion lithography Grant 7,675,604 - Chen , et al. March 9, 2 | 2010-03-09 |
| Exposure scan and step direction optimization Grant 7,666,576 - Liang , et al. February 23, 2 | 2010-02-23 |
| Immersion Lithography Defect Reduction With Top Coater Removal App 20080020324 - SHIU; Lin-Hung ; et al. | 2008-01-24 |
| Exposure Scan And Step Direction Optimization App 20070285639 - LIANG; Fu-Jye ; et al. | 2007-12-13 |
| Hood For Immersion Lithography App 20070258060 - CHEN; Li-Jui ; et al. | 2007-11-08 |
| Vertical nanotube transistor and process for fabricating the same App 20040004235 - Lee, Chun-Tao ; et al. | 2004-01-08 |
uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.
While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.
All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.
| 