Shirota; Mami
Patent Applications and Registrations
Patent applications and USPTO patent grants for Shirota; Mami.The latest application filed is for "polishing liquid composition".
- Shirota; Mami - Wakayama JP
- SHIROTA; Mami - Wakayama-shi JP
| Patent | Date |
|---|---|
| Polishing liquid composition Grant 8,617,994 - Shirota , et al. December 31, 2 | 2013-12-31 |
| Polishing Liquid Composition App 20130109194 - SHIROTA; Mami ; et al. | 2013-05-02 |
| Polishing liquid composition Grant 8,357,311 - Shirota , et al. January 22, 2 | 2013-01-22 |
| Polishing process of a semiconductor substrate Grant 8,058,172 - Yoneda , et al. November 15, 2 | 2011-11-15 |
| Stripping agent composition for a resist Grant 7,879,784 - Shirota February 1, 2 | 2011-02-01 |
| Polishing Liquid Composition App 20100056026 - Shirota; Mami ; et al. | 2010-03-04 |
| Polishing Process Of A Semiconductor Substrate App 20090181541 - YONEDA; Yasuhiro ; et al. | 2009-07-16 |
| Polishing composition for glass substrate App 20070145014 - Nishimoto; Kazuhiko ; et al. | 2007-06-28 |
| Polishing composition for a semiconductor substrate App 20070084828 - Yoneda; Yasuhiro ; et al. | 2007-04-19 |
| Polishing composition for a semiconductor substrate App 20060113283 - Yoneda; Yasuhiro ; et al. | 2006-06-01 |
| Stripping agent composition for a resist App 20050032659 - Shirota, Mami | 2005-02-10 |
| Method of manufacturing semiconductor device with improved removal of resist residues Grant 6,713,232 - Muranaka , et al. March 30, 2 | 2004-03-30 |
| Method of manufacturing semiconductor device with improved removal of resist residues App 20020012882 - Muranaka, Seiji ; et al. | 2002-01-31 |
| Stripping composition for resist Grant 6,310,020 - Shirota , et al. October 30, 2 | 2001-10-30 |
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