Shirakawa; Koji

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shirakawa; Koji.The latest application filed is for "negative resist composition and pattern forming method using the same".

Company Profile

0.20.21

Shirakawa; Koji - Shizuoka N/A JP
Shirakawa; Koji - Haibara-gun N/A JP
Shirakawa; Koji - Shizuoka-ken JP
Shirakawa; Koji - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Chemical amplification resist composition, and mold preparation method and resist film using the same Grant 9,090,722 - Fujimori , et al. July 28, 2	2015-07-28
Negative resist composition and pattern forming method using the same Grant 9,034,560 - Shirakawa , et al. May 19, 2	2015-05-19
Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition Grant 8,900,791 - Tsuchimura , et al. December 2, 2	2014-12-02
Negative Resist Composition And Pattern Forming Method Using The Same App 20140227642 - SHIRAKAWA; Koji ; et al.	2014-08-14
Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern Grant 8,637,222 - Tsuchihashi , et al. January 28, 2	2014-01-28
Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays Grant 8,546,063 - Tsubaki , et al. October 1, 2	2013-10-01
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition App 20120094235 - Tsuchihashi; Toru ; et al.	2012-04-19
Chemical Amplification Resist Composition, And Mold Preparation Method And Resist Film Using The Same App 20120006788 - Fujimori; Toru ; et al.	2012-01-12
Actinic-ray- Or Radiation-sensitive Resin Composition And Method Of Forming Pattern Using The Composition App 20120003585 - Tsubaki; Hideaki ; et al.	2012-01-05
Positive resist composition Grant 8,080,362 - Shirakawa , et al. December 20, 2	2011-12-20
Organic Solvent Development Or Multiple Development Pattern-forming Method Using Electron Beams Or Euv Rays App 20110300485 - Tsubaki; Hideaki ; et al.	2011-12-08
Negative Resist Pattern Forming Method, Developer And Negative Chemical-amplification Resist Composition Used Therefor, And Resist Pattern App 20110287234 - Tsuchihashi; Toru ; et al.	2011-11-24
Actinic Ray-sensitive Or Radiation-sensitive Resin Composition And Method Of Forming Pattern With The Composition App 20110171577 - TSUCHIMURA; Tomotaka ; et al.	2011-07-14
Eyelash Curler App 20100224207 - Otsuka; Koji ; et al.	2010-09-09
Negative resist composition Grant 7,432,034 - Yasunami , et al. October 7, 2	2008-10-07
Negative Resist Composition And Pattern Forming Method Using The Same App 20080241745 - Shirakawa; Koji ; et al.	2008-10-02
Positive Resist Composition App 20080096130 - Shirakawa; Koji ; et al.	2008-04-24
Positive resist composition Grant 7,361,446 - Shirakawa , et al. April 22, 2	2008-04-22
Positive resist composition and process for forming pattern using the same Grant 7,332,258 - Yasunami , et al. February 19, 2	2008-02-19
Positive working resist composition Grant 7,326,513 - Yasunami , et al. February 5, 2	2008-02-05
Positive resist composition and pattern forming method using the same App 20050277060 - Shirakawa, Koji ; et al.	2005-12-15
Negative-working resist composition for electron beams or x-rays Grant 6,887,647 - Yasunami , et al. May 3, 2	2005-05-03
Positive resist composition and process for forming pattern using the same App 20050064327 - Yasunami, Shoichiro ; et al.	2005-03-24
Positive resist composition App 20040197702 - Shirakawa, Koji ; et al.	2004-10-07
Positive working resist composition App 20040175654 - Yasunami, Shoichiro ; et al.	2004-09-09
Negative resist composition Grant 6,773,862 - Shirakawa , et al. August 10, 2	2004-08-10
Negative resist composition Grant 6,746,813 - Yasunami , et al. June 8, 2	2004-06-08
Positive resist composition to be irradiated with one of an electron beam and X-ray Grant 6,727,040 - Sasaki , et al. April 27, 2	2004-04-27
Resist composition App 20040053160 - Takahashi, Hyou ; et al.	2004-03-18
Negative resist composition App 20040033441 - Yasunami, Shoichiro ; et al.	2004-02-19
Negative-working resist composition Grant 6,673,512 - Uenishi , et al. January 6, 2	2004-01-06
Negative resist composition App 20030203305 - Yasunami, Shoichiro ; et al.	2003-10-30
Negative resist composition App 20030124456 - Shirakawa, Koji ; et al.	2003-07-03
Negative-working resist composition for electron beams or X-rays App 20020192592 - Yasunami, Shoichiro ; et al.	2002-12-19
Positive resist composition to be irradiated with one of an electron beam and X-ray App 20020136980 - Sasaki, Tomoya ; et al.	2002-09-26
Positive Resist Composition App 20020015916 - UENISHI, KAZUYA ; et al.	2002-02-07
Positive photoresist composition Grant 5,629,128 - Shirakawa , et al. May 13, 1	1997-05-13

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