Shiozawa; Toshihiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shiozawa; Toshihiko.The latest application filed is for "semiconductor device manufacturing method".

Company Profile

0.7.11

Shiozawa; Toshihiko - Amagasaki N/A JP
Shiozawa; Toshihiko - Nirasaki-shi JP
Shiozawa; Toshihiko - Hyogo JP
Shiozawa; Toshihiko - Hyogo-ken JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma oxidation processing method, plasma processing apparatus and storage medium Grant 8,372,761 - Kabe , et al. February 12, 2	2013-02-12
Semiconductor Device Manufacturing Method App 20120184107 - Sato; Yoshihiro ; et al.	2012-07-19
Pattern forming method and semiconductor device manufacturing method Grant 8,119,530 - Hori , et al. February 21, 2	2012-02-21
Plasma oxidizing method, storage medium, and plasma processing apparatus Grant 8,043,979 - Kobayashi , et al. October 25, 2	2011-10-25
Method for forming silicon oxide film, plasma processing apparatus and storage medium Grant 8,003,484 - Kabe , et al. August 23, 2	2011-08-23
Plasma oxidation processing method Grant 7,989,364 - Hori , et al. August 2, 2	2011-08-02
Plasma oxidizing method, plasma processing apparatus, and storage medium Grant 7,910,495 - Shiozawa , et al. March 22, 2	2011-03-22
Microwave Plasma Processing Apparatus App 20100307685 - Ota; Kinya ; et al.	2010-12-09
Microwave Plasma Processing Apparatus, Microwave Plasma Processing Method, And Microwave-transmissive Plate App 20100240225 - Sato; Yoshihiro ; et al.	2010-09-23
Plasma Oxidation Processing Method, Plasma Processing Apparatus And Storage Medium App 20100136797 - Kabe; Yoshiro ; et al.	2010-06-03
Plasma Oxidizing Method, Storage Medium, And Plasma Processing Apparatus App 20100105216 - Kobayashi; Takashi ; et al.	2010-04-29
Pattern Forming Method And Semiconductor Device Manufacturing Method App 20100093179 - Hori; Masaru ; et al.	2010-04-15
Method For Forming Silicon Oxide Film, Plasma Processing Apparatus And Storage Medium App 20100093185 - Kabe; Yoshiro ; et al.	2010-04-15
Plasma Oxidizing Method, Plasma Processing Apparatus, And Storage Medium App 20100029093 - Shiozawa; Toshihiko ; et al.	2010-02-04
Plasma Oxidizing Method, Plasma Processing Apparatus, And Storage Medium App 20100015815 - Shiozawa; Toshihiko ; et al.	2010-01-21
Plasma Oxidation Processing Method App 20090263919 - Hori; Masaru ; et al.	2009-10-22
Method for Nitriding Tunnel Oxide Film, Method for Manufacturing Non-Volatile Memory Device, Non-Volatile Memory Device, Control Program and Computer-Readable Recording Medium App 20080093658 - Shiozawa; Toshihiko ; et al.	2008-04-24

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