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name:-0.026752948760986
name:-0.0010337829589844
Shiozawa; Takahisa Patent Filings

Shiozawa; Takahisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shiozawa; Takahisa.The latest application filed is for "exposure apparatus".

Company Profile
0.19.8
  • Shiozawa; Takahisa - Tochigi-ken JP
  • Shiozawa; Takahisa - Kawachi-gun JP
  • Shiozawa; Takahisa - Tochigi JP
  • Shiozawa, Takahisa - Utsunomiya-shi JP
  • Shiozawa; Takahisa - Utsunomiya JP
  • Shiozawa; Takahisa - Kawasaki JP
  • Shiozawa; Takahisa - Yokohama JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Illumination optical system and exposure apparatus
Grant 7,760,330 - Shiozawa , et al. July 20, 2
2010-07-20
Exposure apparatus and exposure method
Grant 7,671,967 - Miyaharu , et al. March 2, 2
2010-03-02
Exposure apparatus
Grant 7,468,781 - Shiozawa December 23, 2
2008-12-23
Exposure Apparatus
App 20080218719 - SHIOZAWA; Takahisa
2008-09-11
Illumination Optical System And Exposure Apparatus
App 20080143993 - Shiozawa; Takahisa ;   et al.
2008-06-19
Illumination optical system and exposure apparatus
Grant 7,345,741 - Shiozawa , et al. March 18, 2
2008-03-18
Exposure apparatus
Grant 7,286,206 - Shiozawa October 23, 2
2007-10-23
Exposure Apparatus
App 20070053033 - SHIOZAWA; Takahisa
2007-03-08
Exposure apparatus
Grant 7,142,283 - Shiozawa November 28, 2
2006-11-28
Measuring apparatus and exposure apparatus having the same
App 20060238736 - Miyaharu; Takafumi ;   et al.
2006-10-26
Illumination optical system and exposure apparatus
App 20050270608 - Shiozawa, Takahisa ;   et al.
2005-12-08
Illumination optical system, exposure method and apparatus using the same
Grant 6,897,944 - Shiozawa May 24, 2
2005-05-24
Exposure apparatus
App 20040246456 - Shiozawa, Takahisa
2004-12-09
Exposure method and apparatus for detecting an exposure amount and for calculating a correction value based on the detected exposure amount
Grant 6,757,050 - Shiozawa June 29, 2
2004-06-29
Illumination optical system, exposure method and apparatus using the same
App 20040022068 - Shiozawa, Takahisa
2004-02-05
Exposure apparatus and device manufacturing method
Grant 6,636,295 - Shiozawa October 21, 2
2003-10-21
Exposure apparatus and device manufacturing method
App 20010052968 - Shiozawa, Takahisa
2001-12-20
Projection exposure apparatus having illumination device with ring-like or spot-like light source
Grant 5,726,740 - Shiozawa , et al. March 10, 1
1998-03-10
Exposure apparatus and device manufacturing method for projecting light from a secondary light source onto a mask or pattern
Grant 5,684,567 - Shiozawa November 4, 1
1997-11-04
Scanning exposure apparatus
Grant 5,621,499 - Shiozawa April 15, 1
1997-04-15
Exposure apparatus and microdevice manufacturing method using the same
Grant 5,491,534 - Shiozawa February 13, 1
1996-02-13
Exposure apparatus
Grant 5,475,491 - Shiozawa December 12, 1
1995-12-12
Illumination device
Grant 5,459,547 - Shiozawa October 17, 1
1995-10-17
Illumination device for projection exposure apparatus
Grant 5,345,292 - Shiozawa , et al. September 6, 1
1994-09-06
Exposure apparatus with a function for controlling alignment by use of latent images
Grant 5,140,366 - Shiozawa , et al. August 18, 1
1992-08-18
Exposure method and apparatus
Grant 5,121,160 - Sano , et al. June 9, 1
1992-06-09
Illuminating device
Grant 4,974,919 - Muraki , et al. December 4, 1
1990-12-04

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