SHIOYA; Takeo

Patent Applications and Registrations

Patent applications and USPTO patent grants for SHIOYA; Takeo.The latest application filed is for "fluorine-containing polymer, purification method, and radiation-sensitive resin composition".

Company Profile

0.9.11

SHIOYA; Takeo - Tokyo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20220137508 - NAKAGAWA; Hiroki ; et al.	2022-05-05
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20210278764 - NAKAGAWA; Hiroki ; et al.	2021-09-09
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 11,036,133 - Nakagawa , et al. June 15, 2	2021-06-15
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20200124961 - NAKAGAWA; Hiroki ; et al.	2020-04-23
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 10,620,534 - Nakagawa , et al.	2020-04-14
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20190278175 - NAKAGAWA; Hiroki ; et al.	2019-09-12
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20190025695 - NAKAGAWA; Hiroki ; et al.	2019-01-24
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 10,082,733 - Nakagawa , et al. September 25, 2	2018-09-25
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20170199453 - NAKAGAWA; Hiroki ; et al.	2017-07-13
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 9,500,950 - Nakagawa , et al. November 22, 2	2016-11-22
Composition for resist pattern-refinement, and fine pattern-forming method Grant 9,354,523 - Kiridoshi , et al. May 31, 2	2016-05-31
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20160062237 - NAKAGAWA; Hiroki ; et al.	2016-03-03
Composition For Forming Fine Resist Pattern, And Fine Pattern-forming Method App 20160011513 - Kiridoshi; Yuuko ; et al.	2016-01-14
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 9,213,236 - Nakagawa , et al. December 15, 2	2015-12-15
Double patterning method Grant 8,927,200 - Meya , et al. January 6, 2	2015-01-06
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20140162190 - NAKAGAWA; Hiroki ; et al.	2014-06-12
Fluorine-containing polymer, purification method, and radiation-sensitive resin composition Grant 8,697,343 - Nakagawa , et al. April 15, 2	2014-04-15
Double Patterning Method App 20140080066 - MEYA; Kanako ; et al.	2014-03-20
Fluorine-containing Polymer, Purification Method, And Radiation-sensitive Resin Composition App 20090202945 - Nakagawa; Hiroki ; et al.	2009-08-13

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