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Shiono; Daiju Patent Filings

Shiono; Daiju

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shiono; Daiju.The latest application filed is for "method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure".

Company Profile
1.87.70
  • Shiono; Daiju - Kawasaki JP
  • SHIONO; Daiju - Kawasaki-shi JP
  • Shiono; Daiju - Kanagawa-ken JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of producing structure containing phase-separated structure and resin composition for forming phase-separated structure
Grant 10,066,096 - Kurosawa , et al. September 4, 2
2018-09-04
Undercoat agent and method of forming pattern of layer containing block copolymer
Grant 9,834,696 - Senzaki , et al. December 5, 2
2017-12-05
Method of producing structure containing phase-separated structure
Grant 9,816,003 - Kurosawa , et al. November 14, 2
2017-11-14
Negative resist composition, method of forming resist pattern and complex
Grant 9,499,646 - Yamashita , et al. November 22, 2
2016-11-22
Method of producing structure containing phase-separated structure, phase separated structure, and block copolymer composition
Grant 9,475,088 - Kurosawa , et al. October 25, 2
2016-10-25
Method Of Producing Structure Containing Phase-separated Structure And Resin Composition For Forming Phase-separated Structure
App 20160280906 - KUROSAWA; Tsuyoshi ;   et al.
2016-09-29
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
Grant 9,442,371 - Seshimo , et al. September 13, 2
2016-09-13
Undercoat Agent And Method Of Forming Pattern Of Layer Containing Block Copolymer
App 20160257838 - SENZAKI; Takahiro ;   et al.
2016-09-08
Negative Resist Composition, Method Of Forming Resist Pattern And Complex
App 20160259244 - YAMASHITA; Naoki ;   et al.
2016-09-08
Negative resist composition, method of forming resist pattern, and complex
Grant 9,366,960 - Yamashita , et al. June 14, 2
2016-06-14
Method of forming resist pattern and negative tone-development resist composition
Grant 9,250,531 - Hirano , et al. February 2, 2
2016-02-02
Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material
Grant 9,169,421 - Matsumiya , et al. October 27, 2
2015-10-27
Resist composition, method of forming resist pattern and polymeric compound
Grant 9,133,102 - Takaki , et al. September 15, 2
2015-09-15
Method Of Producing Structure Containing Phase-separated Structure, Method Of Forming Pattern And Method Of Forming Fine Pattern
App 20150205207 - Seshimo; Takehiro ;   et al.
2015-07-23
Negative Resist Composition, Method Of Forming Resist Pattern, And Complex
App 20150192851 - Yamashita; Naoki ;   et al.
2015-07-09
Method of forming polymeric compound, resist composition and method of forming resist pattern
Grant 9,023,580 - Shiono , et al. May 5, 2
2015-05-05
Resist composition, method of forming resist pattern, polymeric compound, and compound
Grant 9,023,581 - Kawaue , et al. May 5, 2
2015-05-05
Method Of Producing Structure Containing Phase-separated Structure
App 20150118397 - Kurosawa; Tsuyoshi ;   et al.
2015-04-30
Resist composition and method of forming resist pattern
Grant 9,012,125 - Kumada , et al. April 21, 2
2015-04-21
Method Of Producing Structure Containing Phase-separated Structure, And Block Copolymer Composition
App 20150093507 - Kurosawa; Tsuyoshi ;   et al.
2015-04-02
Resist composition, method of forming resist pattern and polymeric compound
Grant 8,986,919 - Takaki , et al. March 24, 2
2015-03-24
Positive resist composition and method of forming resist pattern
Grant 8,980,524 - Hirano , et al. March 17, 2
2015-03-17
Method Of Producing Structure Containing Phase-separated Structure, Phase Separated Structure, And Block Copolymer Composition
App 20150044371 - Kurosawa; Tsuyoshi ;   et al.
2015-02-12
Resist composition, method of forming resist pattern and polymeric compound
Grant 8,927,191 - Tsuchiya , et al. January 6, 2
2015-01-06
Resist composition, method of forming resist pattern, polymeric compound and method of producing the same
Grant 8,911,928 - Hirano , et al. December 16, 2
2014-12-16
Fluorine-containing block copolymeric compound
Grant 8,846,838 - Matsumiya , et al. September 30, 2
2014-09-30
Method Of Producing Structure Containing Phase-separated Structure, Method Of Forming Pattern, And Top Coat Material
App 20140238954 - Matsumiya; Tasuku ;   et al.
2014-08-28
Resist Composition, Method Of Forming Resist Pattern And Polymeric Compound
App 20140221673 - Takaki; Daichi ;   et al.
2014-08-07
Resist composition, method of forming resist pattern, and polymeric compound
Grant 8,778,595 - Takaki , et al. July 15, 2
2014-07-15
Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
Grant 8,742,038 - Shiono , et al. June 3, 2
2014-06-03
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,735,045 - Hirano , et al. May 27, 2
2014-05-27
Resist composition, method of forming resist pattern and polymeric compound
Grant 8,685,620 - Takaki , et al. April 1, 2
2014-04-01
Resist composition, and method of forming resist pattern
Grant 8,658,343 - Arai , et al. February 25, 2
2014-02-25
Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
Grant 8,642,244 - Shiono , et al. February 4, 2
2014-02-04
Method of forming resist pattern and negative tone-development resist composition
Grant 8,632,960 - Hirano , et al. January 21, 2
2014-01-21
Method Of Forming Resist Pattern And Negative Tone-development Resist Composition
App 20140004467 - Hirano; Tomoyuki ;   et al.
2014-01-02
Method of forming resist pattern
Grant 8,586,288 - Hirano , et al. November 19, 2
2013-11-19
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,541,529 - Dazai , et al. September 24, 2
2013-09-24
Undercoat Agent And Method Of Forming Pattern Of Layer Containing Block Copolymer
App 20130243958 - Senzaki; Takahiro ;   et al.
2013-09-19
Positive resist composition and method of forming resist pattern
Grant 8,487,056 - Matsumiya , et al. July 16, 2
2013-07-16
Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
Grant 8,475,997 - Shiono , et al. July 2, 2
2013-07-02
Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20130157201 - Takaki; Daichi ;   et al.
2013-06-20
Method Of Forming Polymeric Compound, Resist Composition And Method Of Forming Resist Pattern
App 20130137049 - Shiono; Daiju ;   et al.
2013-05-30
Positive resist composition and method of forming resist pattern
Grant 8,450,044 - Hirano , et al. May 28, 2
2013-05-28
Positive resist composition, method of forming resist pattern and polymeric compound
Grant 8,440,385 - Hirano , et al. May 14, 2
2013-05-14
Resist Composition, Method Of Forming Resist Pattern And Polymeric Compound
App 20130115554 - Takaki; Daichi ;   et al.
2013-05-09
Resist Composition, Method Of Forming Resist Pattern, Polymeric Compound, And Compound
App 20130089819 - Kawaue; Akiya ;   et al.
2013-04-11
Positive resist composition, method of forming resist pattern using the same, and fluorine-containing polymeric compound
Grant 8,404,428 - Matsumiya , et al. March 26, 2
2013-03-26
Negative resist composition, method of forming resist pattern and polymeric compound
Grant 8,404,426 - Abe , et al. March 26, 2
2013-03-26
Method of forming resist pattern and negative tone-development resist composition
Grant 8,394,578 - Hirano , et al. March 12, 2
2013-03-12
Compound, positive resist composition and resist pattern forming method
Grant 8,389,197 - Hirosaki , et al. March 5, 2
2013-03-05
Positive Resist Composition, Method Of Forming Resist Pattern Using The Same, And Fluorine-containing Polymeric Compound
App 20130053518 - Matsumiya; Tasuku ;   et al.
2013-02-28
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,367,296 - Hirano , et al. February 5, 2
2013-02-05
Positive Resist Composition And Method Of Forming Resist Pattern
App 20120329969 - MATSUMIYA; Tasuku ;   et al.
2012-12-27
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,329,378 - Hirano , et al. December 11, 2
2012-12-11
Resist Composition, Method Of Forming Resist Pattern, Polymeric Compound And Method Of Producing The Same
App 20120308928 - Hirano; Tomoyuki ;   et al.
2012-12-06
Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern
Grant 8,304,163 - Shiono , et al. November 6, 2
2012-11-06
Positive resist composition, method of forming resist pattern using the same, and polymeric compound
Grant 8,268,529 - Dazai , et al. September 18, 2
2012-09-18
Compound, positive resist composition and method for formation of resist pattern
Grant 8,257,903 - Shiono , et al. September 4, 2
2012-09-04
Resist Composition, Method Of Forming Resist Pattern And Polymeric Compound
App 20120208128 - Takaki; Daichi ;   et al.
2012-08-16
Method Of Forming Resist Pattern
App 20120208131 - Hirano; Tomoyuki ;   et al.
2012-08-16
Positive Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20120202151 - Dazai; Takahiro ;   et al.
2012-08-09
Positive resist composition and method of forming resist pattern
Grant 8,236,477 - Matsumiya , et al. August 7, 2
2012-08-07
Resist Composition And Method Of Forming Resist Pattern
App 20120196226 - Kumada; Shinji ;   et al.
2012-08-02
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,232,041 - Dazai , et al. July 31, 2
2012-07-31
Resist composition, method of forming resist pattern, polymeric compound, and compound
Grant 8,227,170 - Dazai , et al. July 24, 2
2012-07-24
Resist Composition, Method Of Forming Resist Pattern And Polymeric Compound
App 20120183900 - Tsuchiya; Junichi ;   et al.
2012-07-19
Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound
Grant 8,221,956 - Shiono , et al. July 17, 2
2012-07-17
Positive resist composition and resist pattern forming method
Grant 8,206,887 - Hirosaki , et al. June 26, 2
2012-06-26
Resist composition, and method of forming resist pattern
App 20120148953 - Arai; Masatoshi ;   et al.
2012-06-14
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,192,915 - Dazai , et al. June 5, 2
2012-06-05
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,182,976 - Dazai , et al. May 22, 2
2012-05-22
Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20120100487 - Hirano; Tomoyuki ;   et al.
2012-04-26
Resist Composition For Immersion Exposure, Method Of Forming Resist Pattern, And Fluorine-containing Polymeric Compound
App 20120094236 - SHIONO; Daiju ;   et al.
2012-04-19
Resist Composition For Immersion Exposure, Method Of Forming Resist Pattern Using The Same, And Fluorine-containing Compound
App 20120077125 - Shiono; Daiju ;   et al.
2012-03-29
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,088,553 - Shimizu , et al. January 3, 2
2012-01-03
Positive Resist Composition And Method Of Forming Resist Pattern
App 20110311913 - SUZUKI; Kenta ;   et al.
2011-12-22
Method of forming resist pattern and negative tone-development resist composition
App 20110262864 - HIRANO; Tomoyuki ;   et al.
2011-10-27
Method Of Forming Resist Pattern And Negative Tone-development Resist Composition
App 20110244399 - HIRANO; Tomoyuki ;   et al.
2011-10-06
Positive Resist Composition, Method Of Forming Resist Pattern And Polymeric Compound
App 20110244392 - HIRANO; Tomoyuki ;   et al.
2011-10-06
Positive Resist Composition And Method Of Forming Resist Pattern
App 20110236824 - HIRANO; Tomoyuki ;   et al.
2011-09-29
Positive resist composition, method of forming resist pattern, and polymeric compound
Grant 8,021,823 - Shimizu , et al. September 20, 2
2011-09-20
Compound, positive resist composition and method for forming resist pattern
Grant 8,017,300 - Shiono , et al. September 13, 2
2011-09-13
Negative resist composition and method of forming resist pattern
Grant 7,981,588 - Hirosaki , et al. July 19, 2
2011-07-19
Compound, method for producing same, positive resist composition and method for forming resist pattern
Grant 7,960,089 - Shiono , et al. June 14, 2
2011-06-14
Positive Resist Composition, Method Of Forming Resist Pattern Using The Same, And Fluorine-containing Polymeric Compound
App 20110117499 - MATSUMIYA; Tasuku ;   et al.
2011-05-19
Compound, dissolution inhibitor, positive type resist composition, and method of forming resist pattern
Grant 7,943,284 - Shiono , et al. May 17, 2
2011-05-17
Positive Resist Composition And Method Of Forming Resist Pattern
App 20110111343 - HIRANO; Tomoyuki ;   et al.
2011-05-12
Positive Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20110097667 - Hirano; Tomoyuki ;   et al.
2011-04-28
Compound, Dissolution Inhibitor, Positive Type Resist Composition, And Method Of Forming Resist Pattern
App 20110091810 - SHIONO; Daiju ;   et al.
2011-04-21
Base material for pattern-forming material, positive resist composition and method of resist pattern formation
Grant 7,923,192 - Hirayama , et al. April 12, 2
2011-04-12
Positive resist composition, method of forming resist pattern, polymeric compound, and compound
Grant 7,919,651 - Shiono , et al. April 5, 2
2011-04-05
Materials for photoresist, photoresist composition and method of forming resist pattern
Grant 7,910,284 - Kojima , et al. March 22, 2
2011-03-22
Resist composition and process for formation of resist patterns
Grant 7,901,865 - Hirayama , et al. March 8, 2
2011-03-08
Positive resist composition and method of forming resist pattern
Grant 7,897,319 - Shiono , et al. March 1, 2
2011-03-01
Compound, positive resist composition and method of forming resist pattern
Grant 7,862,981 - Shiono , et al. January 4, 2
2011-01-04
Resist composition, resist pattern forming method and compound
Grant 7,851,129 - Shiono , et al. December 14, 2
2010-12-14
Positive Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20100233625 - Hirano; Tomoyuki ;   et al.
2010-09-16
Positive Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20100209848 - Dazai; Takahiro ;   et al.
2010-08-19
Positive Resist Composition, Method Of Forming Resist Pattern Using The Same, And Polymeric Compound
App 20100196821 - Dazai; Takahiro ;   et al.
2010-08-05
Compound, Method For Producing Same, Positive Resist Composition And Method For Forming Resist Pattern
App 20100183974 - Shiono; Daiju ;   et al.
2010-07-22
Positive resist composition and method of forming resist pattern
App 20100183981 - Matsumiya; Tasuku ;   et al.
2010-07-22
Resist Composition, Method Of Forming Resist Pattern, Polymeric Compound, And Compound
App 20100178609 - Dazai; Takahiro ;   et al.
2010-07-15
Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern
Grant 7,736,842 - Hada , et al. June 15, 2
2010-06-15
Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method
Grant 7,723,007 - Ogata , et al. May 25, 2
2010-05-25
Positive Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20100081086 - HIRANO; Tomoyuki ;   et al.
2010-04-01
Negative resist composition, method of forming resist pattern and polymeric compound
App 20100035178 - Abe; Sho ;   et al.
2010-02-11
Positive resist composition, method for forming resist pattern and compound
Grant 7,648,816 - Shiono , et al. January 19, 2
2010-01-19
Compound, Positive Resist Composition And Method Of Forming Resist Pattern
App 20100009284 - Shiono; Daiju ;   et al.
2010-01-14
Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound
App 20090317743 - Shiono; Daiju ;   et al.
2009-12-24
Positive Resist Composition, Method Of Forming Resist Pattern, Polymeric Compound, And Compound
App 20090312573 - Shiono; Daiju ;   et al.
2009-12-17
Compound, Positive Resist Composition And Method For Formation Of Resist Pattern
App 20090269698 - Shiono; Daiju ;   et al.
2009-10-29
Negative Resist Composition And Method Of Forming Resist Pattern
App 20090269693 - Hirosaki; Takako ;   et al.
2009-10-29
Positive Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20090269694 - Shimizu; Hiroaki ;   et al.
2009-10-29
Positive resist composition, method of forming resist pattern, polymeric compound, and compound
Grant 7,604,920 - Shiono , et al. October 20, 2
2009-10-20
Positive Resist Composition, Method Of Forming Resist Pattern, And Polymeric Compound
App 20090214982 - Shimizu; Hiroaki ;   et al.
2009-08-27
Compound, Positive Resist Composition And Method For Forming Resist Pattern
App 20090202939 - Shiono; Daiju ;   et al.
2009-08-13
Resist Composition For Immersion Exposure, Method Of Forming Resist Pattern Using The Same, And Fluorine-containing Compound
App 20090197204 - Shiono; Daiju ;   et al.
2009-08-06
Resist Composition For Liquid Immersion Lithography, Method Of Forming Resist Pattern, And Fluorine-containing Copolymer
App 20090186300 - Furuya; Sanae ;   et al.
2009-07-23
Resist Composition, Resist Pattern Forming Method And Compound
App 20090162781 - Shiono; Daiju ;   et al.
2009-06-25
Compound, Positive Resist Composition And Resist Pattern Forming Method
App 20090117488 - Hirosaki; Takako ;   et al.
2009-05-07
Positive Resist Composition And Resist Pattern Forming Method
App 20090092921 - Hirosaki; Takako ;   et al.
2009-04-09
Compound, Dissolution Inhibitor, Positive Type Resist Composition, And Method Of Forming Resist Pattern
App 20090081580 - Shiono; Daiju ;   et al.
2009-03-26
Positive Resist Composition, Method Of Forming Resist Pattern, Polymeric Compound, And Compound
App 20090042131 - SHIONO; DAIJU ;   et al.
2009-02-12
Positive Resist Composition, Method For Forming Resist Pattern And Compound
App 20090035691 - Shiono; Daiju ;   et al.
2009-02-05
Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method
App 20080166655 - Ogata; Toshiyuki ;   et al.
2008-07-10
Positive Resist Composition, Method For Resist Pattern Formation and Compound
App 20080145784 - Shiono; Daiju ;   et al.
2008-06-19
Materials For Photoresist, Photoresist Composition And Method Of Forming Resist Pattern
App 20080081281 - KOJIMA; Kyoko ;   et al.
2008-04-03
Resist Composition and Process for Formation of Resist Patterns
App 20080020288 - Hirayama; Taku ;   et al.
2008-01-24
Decomposable composition and method for using the same
App 20070275328 - Shiono; Daiju ;   et al.
2007-11-29
Resist Composition for Electron Beam or Euv (Extreme Ultraviolet) and Method for Forming Resist Pattern
App 20070269744 - Hada; Hideo ;   et al.
2007-11-22
Positive Resist Composition and Method of Forming Resist Pattern
App 20070259273 - Shiono; Daiju ;   et al.
2007-11-08

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