loadpatents
name:-0.031903028488159
name:-0.01475715637207
name:-0.0093250274658203
Shiokawa; Yoichi Patent Filings

Shiokawa; Yoichi

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shiokawa; Yoichi.The latest application filed is for "polishing method, polishing monitoring method and polishing monitoring apparatus for workpiece".

Company Profile
8.15.24
  • Shiokawa; Yoichi - Tokyo JP
  • Shiokawa; Yoichi - Saku Nagano JA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate processing apparatus, substrate processing system, and substrate processing method
Grant 11,450,544 - Kobata , et al. September 20, 2
2022-09-20
Polishing Method, Polishing Monitoring Method And Polishing Monitoring Apparatus For Workpiece
App 20220176513 - Watanabe; Yuki ;   et al.
2022-06-09
Optical Film-thickness Measuring Apparatus And Polishing Apparatus
App 20220105601 - Kinoshita; Masaki ;   et al.
2022-04-07
Polishing Method, Polishing Apparatus, And Computer-readable Storage Medium Storing Program
App 20210402550 - Shiokawa; Yoichi ;   et al.
2021-12-30
Substrate Polishing Apparatus, Substrate Polishing Method, And Apparatus For Regulating Temperature Of Polishing Surface Of Polishing Pad Used In Polishing Apparatus
App 20210229235 - SONE; Tadakazu ;   et al.
2021-07-29
Polishing Method And Polishing Apparatus
App 20210170544 - Yagi; Keita ;   et al.
2021-06-10
Substrate Polishing Apparatus, Method Of Creating Thickness Map, And Method Of Polishing A Substrate
App 20210101250 - Watanabe; Katsuhide ;   et al.
2021-04-08
Substrate Processing Apparatus, Substrate Processing System, And Substrate Processing Method
App 20200243364 - Kobata; Itsuki ;   et al.
2020-07-30
Method Of Cleaning A Substrate
App 20200176281 - MAEDA; Koji ;   et al.
2020-06-04
Substrate processing apparatus, substrate processing system, and substrate processing method
Grant 10,665,487 - Kobata , et al.
2020-05-26
Head height adjustment device and substrate processing apparatus provided with head height adjustment device
Grant 10,556,314 - Sakugawa , et al. Feb
2020-02-11
Polishing method and polishing apparatus
Grant 10,399,203 - Kobayashi , et al. Sep
2019-09-03
Substrate Polishing Apparatus, Substrate Polishing Method, And Apparatus For Regulating Temperature Of Polishing Surface Of Poli
App 20190168354 - SONE; Tadakazu ;   et al.
2019-06-06
Polishing Apparatus And Polishing Method
App 20190022820 - KIMBA; Toshifumi ;   et al.
2019-01-24
Polishing method
Grant 10,056,277 - Kobayashi , et al. August 21, 2
2018-08-21
Substrate Processing Apparatus, Substrate Processing System And Substrate Processing Method
App 20180211849 - KOBATA; Itsuki ;   et al.
2018-07-26
Polishing apparatus and polished-state monitoring method
Grant 9,999,955 - Kobayashi , et al. June 19, 2
2018-06-19
Head Height Adjustment Device And Substrate Processing Apparatus Provided With Head Height Adjustment Device
App 20180001438 - SAKUGAWA; Suguru ;   et al.
2018-01-04
Substrate Processing Apparatus
App 20170352573 - WEN; Zhongxin ;   et al.
2017-12-07
Polishing Method And Polishing Apparatus
App 20170190020 - KOBAYASHI; Yoichi ;   et al.
2017-07-06
Polishing Method
App 20170148655 - KOBAYASHI; Yoichi ;   et al.
2017-05-25
Substrate Processing Apparatus, Substrate Processing System. And Substrate Processing Method
App 20170047237 - KOBATA; Itsuki ;   et al.
2017-02-16
Polishing device and polishing method
Grant 9,550,269 - Shiokawa , et al. January 24, 2
2017-01-24
Polishing Apparatus And Polishing Method
App 20150266159 - SHIOKAWA; Yoichi ;   et al.
2015-09-24
Dressing method, method of determining dressing conditions, program for determining dressing conditions, and polishing apparatus
Grant 8,965,555 - Fukuda , et al. February 24, 2
2015-02-24
Polishing Apparatus And Polished-state Monitoring Method
App 20150017887 - KOBAYASHI; Yoichi ;   et al.
2015-01-15
Substrate Polishing Apparatus, Substrate Polishing Method, And Apparatus For Regulating Temperature Of Polishing Surface Of Polishing Pad Used In Polishing Apparatus
App 20140364040 - SONE; Tadakazu ;   et al.
2014-12-11
Substrate polishing apparatus, substrate polishing method, and apparatus for regulating temperature of polishing surface of polishing pad used in polishing apparatus
Grant 8,845,391 - Sone , et al. September 30, 2
2014-09-30
Substrate Cleaning Apparatus And Polishing Apparatus
App 20140190633 - Maeda; Koji ;   et al.
2014-07-10
Dressing Method, Method Of Determining Dressing Conditions, Program For Determining Dressing Conditions, And Polishing Apparatus
App 20140120808 - FUKUDA; Akira ;   et al.
2014-05-01
Dressing method, method of determining dressing conditions, program for determining dressing conditions, and polishing apparatus
Grant 8,655,478 - Fukuda , et al. February 18, 2
2014-02-18
Polishing apparatus and polishing method
Grant 8,360,817 - Ishii , et al. January 29, 2
2013-01-29
Substrate Polishing Apparatus, Substrate Polishing Method, And Apparatus For Regulating Temperature Of Polishing Surface Of Polishing Pad Used In Polishing Apparatus
App 20110159782 - SONE; Tadakazu ;   et al.
2011-06-30
Polishing Apparatus And Polishing Method
App 20100255756 - ISHII; Yu ;   et al.
2010-10-07
Dressing Method, Method Of Determining Dressing Conditions, Program For Determining Dressing Conditions, And Polishing Apparatus
App 20100081361 - Fukuda; Akira ;   et al.
2010-04-01
Tray for preparing a dentiform model used for an operation on a dental technic
Grant 4,059,902 - Shiokawa November 29, 1
1977-11-29

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