loadpatents
name:-0.0098319053649902
name:-0.010419845581055
name:-0.00043201446533203
Shindo; Toshihiko Patent Filings

Shindo; Toshihiko

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shindo; Toshihiko.The latest application filed is for "method of processing target object".

Company Profile
0.8.8
  • Shindo; Toshihiko - Miyagi JP
  • Shindo; Toshihiko - Kurokawa-gun JP
  • Shindo; Toshihiko - Nirasaki JP
  • Shindo; Toshihiko - Gunma JP
  • SHINDO; Toshihiko - Nirasaki-shi JP
  • Shindo; Toshihiko - Annaka JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method of processing target object
Grant 9,780,037 - Kato , et al. October 3, 2
2017-10-03
Method Of Processing Target Object
App 20170084542 - Kato; Kazuya ;   et al.
2017-03-23
Plasma processing method and plasma processing apparatus
Grant 8,287,750 - Shindo , et al. October 16, 2
2012-10-16
Semiconductor device fabricating method, plasma processing system and storage medium
Grant 8,263,498 - Shimizu , et al. September 11, 2
2012-09-11
Pellicle and method for producing pellicle
Grant 7,951,513 - Kubota , et al. May 31, 2
2011-05-31
Pellicle and method for producing pellicle
Grant 7,919,217 - Kubota , et al. April 5, 2
2011-04-05
Plasma processing method and plasma processing apparatus
Grant 7,799,238 - Shindo , et al. September 21, 2
2010-09-21
Plasma Processing Method And Plasma Processing Apparatus
App 20100112819 - SHINDO; Toshihiko ;   et al.
2010-05-06
Pellicle And Method For Producing Pellicle
App 20090291372 - KUBOTA; Yoshihiro ;   et al.
2009-11-26
Pellicle And Method For Producing Pellicle
App 20090274962 - Kubota; Yoshihiro ;   et al.
2009-11-05
Plasma Processing Method And Plasma Processing Apparatus
App 20090212017 - SHINDO; Toshihiko ;   et al.
2009-08-27
Plasma processing method and plasma processing apparatus
Grant 7,541,283 - Shindo , et al. June 2, 2
2009-06-02
Semiconductor device fabricating method, plasma processing system and storage medium
App 20080020585 - Shimizu; Ryukichi ;   et al.
2008-01-24
Plasma processing method and plasma processing apparatus
App 20050142873 - Shindo, Toshihiko ;   et al.
2005-06-30
Plasma ashing method
App 20050106875 - Kubota, Kazuhiro ;   et al.
2005-05-19
Ceramic electrostatic chuck with built-in heater
Grant 5,663,865 - Kawada , et al. September 2, 1
1997-09-02

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