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name:-0.012476921081543
name:-0.0094509124755859
SHINAGAWA; Jun Patent Filings

SHINAGAWA; Jun

Patent Applications and Registrations

Patent applications and USPTO patent grants for SHINAGAWA; Jun.The latest application filed is for "virtual metrology for wafer result prediction".

Company Profile
2.11.11
  • SHINAGAWA; Jun - Fremont CA
  • Shinagawa; Jun - San Jose CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Virtual Metrology For Wafer Result Prediction
App 20220092242 - SHINAGAWA; Jun ;   et al.
2022-03-24
Methods And Systems For Plasma Processing Tool Matching After Preventative Maintenance
App 20210050191 - Usami; Kenichi ;   et al.
2021-02-18
Sensor-to-sensor matching methods for chamber matching
Grant 10,916,411 - Shinagawa February 9, 2
2021-02-09
Methods and systems for chamber matching and monitoring
Grant 10,622,219 - Shinagawa
2020-04-14
Sensor-to-sensor Matching Methods For Chamber Matching
App 20200051787 - Shinagawa; Jun
2020-02-13
Methods and systems for chamber matching and monitoring
Grant 10,438,805 - Shinagawa O
2019-10-08
Methods And Systems For Chamber Matching And Monitoring
App 20180158657 - Shinagawa; Jun
2018-06-07
Methods And Systems For Chamber Matching And Monitoring
App 20180158652 - SHINAGAWA; Jun
2018-06-07
E-beam enhanced decoupled source for semiconductor processing
Grant 9,177,756 - Holland , et al. November 3, 2
2015-11-03
E-beam enhanced decoupled source for semiconductor processing
Grant 9,111,728 - Holland , et al. August 18, 2
2015-08-18
Semiconductor processing system with source for decoupled ion and radical control
Grant 8,980,046 - Koshiishi , et al. March 17, 2
2015-03-17
Pitch reduction using oxide spacer
Grant 8,592,318 - Kim , et al. November 26, 2
2013-11-26
Semiconductor Processing System with Source for Decoupled Ion and Radical Control
App 20130157469 - Koshiishi; Akira ;   et al.
2013-06-20
E-Beam Enhanced Decoupled Source for Semiconductor Processing
App 20120258606 - Holland; John Patrick ;   et al.
2012-10-11
E-Beam Enhanced Decoupled Source for Semiconductor Processing
App 20120258607 - Holland; John Patrick ;   et al.
2012-10-11
E-Beam Enhanced Decoupled Source for Semiconductor Processing
App 20120258601 - Holland; John Patrick ;   et al.
2012-10-11
Pitch Reduction Using Oxide Spacer
App 20120052683 - Kim; Jisoo ;   et al.
2012-03-01

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