Shin; Jaw-Jung
Patent Applications and Registrations
Patent applications and USPTO patent grants for Shin; Jaw-Jung.The latest application filed is for "methods of manufacturing semiconductor device using phase shift mask".
Company Profile
1.52.49
- Shin; Jaw-Jung - Hsinchu City TW
- Shin; Jaw-Jung - Hsinchu TW
- Shin; Jaw-Jung - Hsin-Chu TW
Patent Activity
| Patent | Date |
|---|---|
| Methods Of Manufacturing Semiconductor Device Using Phase Shift Mask App 20220084874 - Wang; Chun-Chieh ; et al. | 2022-03-17 |
| Methods of manufacturing redistribution circuit structures using phase shift mask Grant 11,189,521 - Wang , et al. November 30, 2 | 2021-11-30 |
| Methods Of Manufacturing Redistribution Circuit Structures App 20200135543 - Wang; Chun-Chieh ; et al. | 2020-04-30 |
| Apparatus for charged particle lithography system Grant 9,911,575 - Wang , et al. March 6, 2 | 2018-03-06 |
| Systems and methods for high-throughput and small-footprint scanning exposure for lithography Grant 9,810,994 - Lin , et al. November 7, 2 | 2017-11-07 |
| Grid refinement method Grant 9,678,434 - Wang , et al. June 13, 2 | 2017-06-13 |
| Grid Refinement Method App 20170102624 - Wang; Wen-Chuan ; et al. | 2017-04-13 |
| Systems And Methods For High-throughput And Small-footprint Scanning Exposure For Lithography App 20170082926 - Lin; Burn Jeng ; et al. | 2017-03-23 |
| Method for EUV power improvement with fuel droplet trajectory stabilization Grant 9,538,628 - Wu , et al. January 3, 2 | 2017-01-03 |
| Grid refinement method Grant 9,529,271 - Wang , et al. December 27, 2 | 2016-12-27 |
| Method For Euv Power Improvement With Fuel Droplet Trajectory Stabilization App 20160366756 - Wu; Tsiao-Chen ; et al. | 2016-12-15 |
| Systems and methods for high-throughput and small-footprint scanning exposure for lithography Grant 9,519,225 - Lin , et al. December 13, 2 | 2016-12-13 |
| Apparatus for Charged Particle Lithography System App 20160322199 - WANG; SHIH-CHI ; et al. | 2016-11-03 |
| Grid Refinement Method App 20160246912 - WANG; WEN-CHUAN ; et al. | 2016-08-25 |
| Apparatus for charged particle lithography system Grant 9,390,891 - Wang , et al. July 12, 2 | 2016-07-12 |
| Grid refinement method Grant 9,329,488 - Wang , et al. May 3, 2 | 2016-05-03 |
| Systems And Methods For High-throughput And Small-footprint Scanning Exposure For Lithography App 20160091795 - Lin; Burn Jeng ; et al. | 2016-03-31 |
| Pattern generator for a lithography system Grant 9,291,913 - Yu , et al. March 22, 2 | 2016-03-22 |
| Grid Refinement Method App 20160055291 - Wang; Wen-Chuan ; et al. | 2016-02-25 |
| Apparatus for Charged Particle Lithography System App 20160049278 - Wang; Shih-Chi ; et al. | 2016-02-18 |
| Systems and methods for high-throughput and small-footprint scanning exposure for lithography Grant 9,229,332 - Lin , et al. January 5, 2 | 2016-01-05 |
| Methods for electron beam patterning Grant 9,182,660 - Wang , et al. November 10, 2 | 2015-11-10 |
| Grid refinement method Grant 9,176,389 - Wang , et al. November 3, 2 | 2015-11-03 |
| Method for image dithering for lithographic processes Grant 9,147,377 - Chen , et al. September 29, 2 | 2015-09-29 |
| Multiple-patterning overlay decoupling method Grant 9,134,627 - Wang , et al. September 15, 2 | 2015-09-15 |
| Pattern Generator For A Lithography System App 20150212423 - Yu; Chen-Hua ; et al. | 2015-07-30 |
| Pattern generator for a lithography system Grant 9,001,308 - Yu , et al. April 7, 2 | 2015-04-07 |
| Systems And Methods For High-throughput And Small-footprint Scanning Exposure For Lithography App 20150077731 - Lin; Burn Jeng ; et al. | 2015-03-19 |
| Long-range lithographic dose correction Grant 8,984,452 - Chen , et al. March 17, 2 | 2015-03-17 |
| Method for electron beam proximity correction with improved critical dimension accuracy Grant 8,972,908 - Chen , et al. March 3, 2 | 2015-03-03 |
| Long-range Lithographic Dose Correction App 20150052489 - Chen; Cheng-Hung ; et al. | 2015-02-19 |
| Method for Image Dithering App 20150035851 - Chen; Cheng-Hung ; et al. | 2015-02-05 |
| Method for Electron Beam Proximity Correction with Improved Critical Dimension Accuracy App 20150040079 - Chen; Cheng-Hung ; et al. | 2015-02-05 |
| Systems and methods providing electron beam writing to a medium Grant 8,927,947 - Wang , et al. January 6, 2 | 2015-01-06 |
| Grid Refinement Method App 20140368806 - Wang; Wen-Chuan ; et al. | 2014-12-18 |
| Electron beam lithography system and method for improving throughput Grant 8,852,849 - Shin , et al. October 7, 2 | 2014-10-07 |
| Electron beam lithography system and method for improving throughput Grant 8,846,278 - Shin , et al. September 30, 2 | 2014-09-30 |
| Multiple-grid exposure method Grant 8,828,632 - Wang , et al. September 9, 2 | 2014-09-09 |
| Grid refinement method Grant 8,822,107 - Wang , et al. September 2, 2 | 2014-09-02 |
| Grid refinement method Grant 8,822,106 - Wang , et al. September 2, 2 | 2014-09-02 |
| Systems And Methods Providing Electron Beam Writing To A Medium App 20140217305 - Wang; Wen-Chuan ; et al. | 2014-08-07 |
| Method for proximity correction Grant 8,762,900 - Shin , et al. June 24, 2 | 2014-06-24 |
| Devices and methods for improved reflective electron beam lithography Grant 8,722,286 - Yu , et al. May 13, 2 | 2014-05-13 |
| Method For Proximity Correction App 20140007023 - Shin; Jaw-Jung ; et al. | 2014-01-02 |
| Systems and methods providing electron beam writing to a medium Grant 8,610,083 - Wang , et al. December 17, 2 | 2013-12-17 |
| Electron Beam Lithography System and Method for Improving Throughput App 20130330670 - Shin; Jaw-Jung ; et al. | 2013-12-12 |
| Electron Beam Lithography System and Method For Improving Throughput App 20130327962 - Shin; Jaw-Jung ; et al. | 2013-12-12 |
| Methods For Electron Beam Patterning App 20130323918 - Wang; Wen-Chuan ; et al. | 2013-12-05 |
| Devices And Methods For Improved Reflective Electron Beam Lithography App 20130320225 - Yu; Chen-Hua ; et al. | 2013-12-05 |
| Non-directional dithering methods Grant 8,584,057 - Liu , et al. November 12, 2 | 2013-11-12 |
| Grid Refinement Method App 20130273474 - Wang; Wen-Chuan ; et al. | 2013-10-17 |
| Grid Refinement Method App 20130273475 - Wang; Wen-Chuan ; et al. | 2013-10-17 |
| Multiple-grid exposure method Grant 8,530,121 - Wang , et al. September 10, 2 | 2013-09-10 |
| Non-directional Dithering Methods App 20130232453 - Liu; Pei-Yi ; et al. | 2013-09-05 |
| Error Diffusion And Grid Shift In Lithography App 20130232455 - Liu; Pei-Yi ; et al. | 2013-09-05 |
| Electron beam lithography system and method for improving throughput Grant 8,524,427 - Shin , et al. September 3, 2 | 2013-09-03 |
| Error diffusion and grid shift in lithography Grant 8,510,687 - Liu , et al. August 13, 2 | 2013-08-13 |
| Multiple-Grid Exposure Method App 20130203001 - Wang; Wen-Chuan ; et al. | 2013-08-08 |
| Multiple-Patterning Overlay Decoupling Method App 20130157389 - Wang; Wen-Chuan ; et al. | 2013-06-20 |
| Systems And Methods Providing Electron Beam Writing To A Medium App 20130146780 - Wang; Wen-Chuan ; et al. | 2013-06-13 |
| Systems and methods providing electron beam writing to a medium Grant 8,368,037 - Wang , et al. February 5, 2 | 2013-02-05 |
| Electron Beam Lithography System And Method For Improving Throughput App 20120264062 - Shin; Jaw-Jung ; et al. | 2012-10-18 |
| Systems and Methods Providing Electron Beam Writing to a Medium App 20120235063 - Wang; Wen-Chuan ; et al. | 2012-09-20 |
| Method and system for a pattern layout split Grant 7,934,177 - Shin , et al. April 26, 2 | 2011-04-26 |
| Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip Grant 7,643,976 - Shin , et al. January 5, 2 | 2010-01-05 |
| Method and System For a Pattern Layout Split App 20080189672 - Shin; Jaw-Jung ; et al. | 2008-08-07 |
| Layout generation and optimization to improve photolithographic performance Grant 7,266,803 - Chou , et al. September 4, 2 | 2007-09-04 |
| Method and System for Identifying Lens Aberration Sensitive Patterns in an Integrated Circuit Chip App 20070203680 - Shin; Jaw-Jung ; et al. | 2007-08-30 |
| Method to reduce CD non-uniformity in IC manufacturing Grant 7,252,909 - Shin , et al. August 7, 2 | 2007-08-07 |
| Method for improving the critical dimension uniformity of patterned features on wafers Grant 7,234,128 - Gau , et al. June 19, 2 | 2007-06-19 |
| Lithography process to reduce interference App 20070087291 - Gau; Tsai-Sheng ; et al. | 2007-04-19 |
| Phase shift assignments for alternate PSM Grant 7,175,941 - Shin , et al. February 13, 2 | 2007-02-13 |
| Layout generation and optimization to improve photolithographic performance App 20070028206 - Chou; Shou-Yen ; et al. | 2007-02-01 |
| Alignment mark configuration Grant 7,057,299 - Yao , et al. June 6, 2 | 2006-06-06 |
| Method of defining forbidden pitches for a lithography exposure tool Grant 6,973,636 - Shin , et al. December 6, 2 | 2005-12-06 |
| Method of defining forbidden pitches for a lithography exposure tool App 20050086629 - Shin, Jaw-Jung ; et al. | 2005-04-21 |
| Method for improving the critical dimension uniformity of patterned features on wafers App 20050076323 - Gau, Tsai-Sheng ; et al. | 2005-04-07 |
| Phase shift assignments for alternate PSM App 20050053846 - Shin, Jaw-Jung ; et al. | 2005-03-10 |
| Charge effect and electrostatic damage prevention method on photo-mask Grant 6,861,179 - Hsieh , et al. March 1, 2 | 2005-03-01 |
| Reducing photoresist shrinkage via plasma treatment Grant 6,774,044 - Ke , et al. August 10, 2 | 2004-08-10 |
| New method to reduce CD non-uniformity in IC manufacturing App 20040063038 - Shin, Jaw-Jung ; et al. | 2004-04-01 |
| Reducing photoresist shrinkage via plasma treatment App 20030132197 - Ke, Chih-Ming ; et al. | 2003-07-17 |
| Alignment mark configuration App 20010033033 - Yao, Liang-Gi ; et al. | 2001-10-25 |
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