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name:-0.010724067687988
name:-0.0060009956359863
name:-0.00040006637573242
SHIN; INKYUN Patent Filings

SHIN; INKYUN

Patent Applications and Registrations

Patent applications and USPTO patent grants for SHIN; INKYUN.The latest application filed is for "blank mask and photomask using the same".

Company Profile
0.6.11
  • SHIN; INKYUN - Suwon-si KR
  • Shin; Inkyun - Yongin-si KR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Blank Mask And Photomask Using The Same
App 20220214609 - LEE; Hyung-joo ;   et al.
2022-07-07
Blank Mask And Photomask Using The Same
App 20220206380 - LEE; Hyung-joo ;   et al.
2022-06-30
Charged-particle beam exposure method and charged-particle beam correction method
Grant 10,056,229 - Bae , et al. August 21, 2
2018-08-21
Electron beam lithography method and apparatus
Grant 10,007,185 - Lee , et al. June 26, 2
2018-06-26
Charged-particle Beam Exposure Method And Charged-particle Beam Correction Method
App 20180012730 - BAE; SUKJONG ;   et al.
2018-01-11
Method of forming photomask
Grant 9,766,540 - Oh , et al. September 19, 2
2017-09-19
Exposure method using electron beam and substrate manufacturing method using the same
Grant 9,709,893 - Lee , et al. July 18, 2
2017-07-18
Electron Beam Lithography Method And Apparatus
App 20170192358 - LEE; Sook Hyun ;   et al.
2017-07-06
Exposure Method Using Electron Beam And Substrate Manufacturing Method Using The Same
App 20160223903 - LEE; SOOK HYUN ;   et al.
2016-08-04
Method Of Forming Photomask
App 20160124301 - Oh; Jong Keun ;   et al.
2016-05-05
Methods of reducing registration errors of photomasks and photomasks formed using the methods
Grant 9,323,142 - Choi , et al. April 26, 2
2016-04-26
Photomask and method of forming the same
Grant 9,223,199 - Oh , et al. December 29, 2
2015-12-29
Methods of Reducing Registration Errors of Photomasks and Photomasks Formed Using the Methods
App 20150050584 - Choi; Jin ;   et al.
2015-02-19
Photomask And Method Of Forming The Same
App 20140113221 - OH; Jong Keun ;   et al.
2014-04-24
Nozzle, Substrate Processing Apparatus Including The Nozzle, And Processing Solution Supply Method Using The Apparatus
App 20110253043 - KIM; Seongyoon ;   et al.
2011-10-20

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