| Patent | Date |
|---|
Method of correcting mask pattern and method of manufacturing reticle
Grant 10,012,900 - Kim , et al. July 3, 2 | 2018-07-03 |
Exposure methods using e-beams and methods of manufacturing masks and semiconductor devices therefrom
Grant 9,671,686 - Choi , et al. June 6, 2 | 2017-06-06 |
Method Of Correcting Mask Pattern And Method Of Manufacturing Reticle
App 20170082921 - KIM; Jong-su ; et al. | 2017-03-23 |
Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same
Grant 9,583,305 - Jung , et al. February 28, 2 | 2017-02-28 |
Exposure Methods Using E-beams And Methods Of Manufacturing Masks And Semiconductor Devices Therefrom
App 20150362834 - Choi; Jin ; et al. | 2015-12-17 |
Exposure Method Using Control Of Settling Times And Methods Of Manufacturing Integrated Circuit Devices By Using The Same
App 20150311032 - JUNG; Yong-Seok ; et al. | 2015-10-29 |
Pellicle having buffer zone and photomask structure having pellicle
Grant 8,795,929 - Kim , et al. August 5, 2 | 2014-08-05 |
Methods Of Aligning Objects And Apparatuses For Performing The Same
App 20130251238 - HAN; Hak-Seung ; et al. | 2013-09-26 |
Apparatus For Measuring Patterns On A Reflective Photomask
App 20130250286 - HAN; Hak-Seung ; et al. | 2013-09-26 |
Pellicle Having Buffer Zone And Photomask Structure Having Pellicle
App 20130089814 - KIM; Sung-Hyuck ; et al. | 2013-04-11 |
Monitoring Module Including E-field-induced Esd-sensitive Pattern And Photomask Including The Module
App 20110169495 - Lee; Su-Young ; et al. | 2011-07-14 |
Apparatus for processing photomask, methods of using the same, and methods of processing photomask
App 20100209826 - Kim; Sung-Hyuck ; et al. | 2010-08-19 |
Method of fabricating chrome-less phase shift mask
Grant 7,595,136 - Yoon , et al. September 29, 2 | 2009-09-29 |
Phase shift mask
Grant 7,541,118 - Kang , et al. June 2, 2 | 2009-06-02 |
Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the same
Grant 7,432,022 - Kim , et al. October 7, 2 | 2008-10-07 |
Methods, systems and computer program products for correcting photomask using aerial images and boundary regions
Grant 7,389,491 - Park , et al. June 17, 2 | 2008-06-17 |
Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same
Grant 7,387,965 - Cho , et al. June 17, 2 | 2008-06-17 |
Phase Shift Mask And Method Of Fabricating The Same
App 20080102383 - KANG; Myung-Ah ; et al. | 2008-05-01 |
Method of fabricating a phase shift mask
Grant 7,338,736 - Kang , et al. March 4, 2 | 2008-03-04 |
Masks each having a central main pattern region and a peripheral phantom pattern region with light-transmitting features in both pattern regions having the shame shape and pitch and methods of manufacturing the same
Grant 7,335,449 - Kim , et al. February 26, 2 | 2008-02-26 |
Method of manufacturing chromeless phase shift mask
Grant 7,112,390 - Kang , et al. September 26, 2 | 2006-09-26 |
Methods, systems and computer program products for correcting photomask using aerial images and boundary regions
App 20060204862 - Park; Ji-Soong ; et al. | 2006-09-14 |
Method of manufacturing an alternating phase shift mask
Grant 7,100,322 - Kang , et al. September 5, 2 | 2006-09-05 |
Method of fabricating chrome-less phase shift mask
App 20060147819 - Yoon; Gi-Sung ; et al. | 2006-07-06 |
Chromeless phase shift mask and method of fabricating the same
App 20060019176 - Kim; Sung-hyuck ; et al. | 2006-01-26 |
Wave guided alternating phase shift mask and fabrication method thereof
Grant 6,919,149 - Kim , et al. July 19, 2 | 2005-07-19 |
Photo mask capable of improving resolution by utilizing polarization of light and method of manufacturing the same
App 20050123839 - Kim, Sung-hyuck ; et al. | 2005-06-09 |
Method of adjusting deviation of critical dimension of patterns
App 20050123845 - Huh, Sung-min ; et al. | 2005-06-09 |
Mask and method for manufacturing the same
App 20050064300 - Kim, Sung-Hyuck ; et al. | 2005-03-24 |
Photomask for off-axis illumination and method of fabricating the same
Grant 6,866,968 - Shin , et al. March 15, 2 | 2005-03-15 |
Reference pattern for creating a defect recognition level, method of fabricating the same and method of inspecting defects using the same
App 20050009355 - Cho, Won-Il ; et al. | 2005-01-13 |
Phase shift mask and method of fabricating the same
App 20040248018 - Kang, Myung-Ah ; et al. | 2004-12-09 |
Phase edge phase shift mask and method for fabricating the same
App 20040091792 - Kang, Myung-Ah ; et al. | 2004-05-13 |
Method of manufacturing chromeless phase shift mask
App 20040009412 - Kang, Myung-Ah ; et al. | 2004-01-15 |
Method of manufacturing an alternating phase shift mask
App 20030232254 - Kang, Myung-Ah ; et al. | 2003-12-18 |
Wave guided alternating phase shift mask and fabrication method thereof
App 20030198875 - Kim, Seong-Hyuck ; et al. | 2003-10-23 |
Photomask for off-axis illumination and method of fabricating the same
App 20030148193 - Shin, In-Kyun ; et al. | 2003-08-07 |
Methods of fabricating phase shift masks by controlling exposure doses
Grant 5,853,921 - Moon , et al. December 29, 1 | 1998-12-29 |
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