Shin-Estu Chemical Co., Ltd.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shin-Estu Chemical Co., Ltd..The latest application filed is for "diamond producing method and dc plasma enhanced cvd apparatus".

Company Profile

1.20.3

Shin-Estu Chemical Co., Ltd. - Tokyo JP
Shin-Estu Chemical Co., Ltd. -
Shin-Estu Chemical Co., Ltd. - JP JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Heat-curable resin composition Grant 10,829,589 - Kushihara , et al. November 10, 2	2020-11-10
Resist composition and pattern forming process Grant 10,012,903 - Hatakeyama , et al. July 3, 2	2018-07-03
Diamond producing method and DC plasma enhanced CVD apparatus Grant 9,534,315 - Noguchi January 3, 2	2017-01-03
Pattern forming process Grant 9,122,147 - Hatakeyama , et al. September 1, 2	2015-09-01
Patterning process Grant 9,005,883 - Ogihara , et al. April 14, 2	2015-04-14
Diamond Producing Method And Dc Plasma Enhanced Cvd Apparatus App 20140041574 - NOGUCHI; Hitoshi	2014-02-13
Rework process for photoresist film Grant 7,638,268 - Ogihara , et al. December 29, 2	2009-12-29
Method of producing high molecular weight organopolysiloxane, composition comprising the high molecular weight organopolysiloxane, and optical semiconductor device sealed with cured product thereof Grant 7,563,854 - Shimizu , et al. July 21, 2	2009-07-21
Silicone rubber composition, light-emitting semiconductor embedding/protecting material and light-emitting semiconductor device Grant 7,521,813 - Kashiwagi , et al. April 21, 2	2009-04-21
Preparation of photomask blank and photomask Grant 7,514,185 - Fukushima , et al. April 7, 2	2009-04-07
Silicon-containing resist composition and patterning process Grant 7,510,816 - Takemura , et al. March 31, 2	2009-03-31
Resist lower layer film material and method for forming a pattern Grant 7,476,485 - Hatakeyama , et al. January 13, 2	2009-01-13
Photomask blank, photomask, and method of manufacture Grant 7,329,474 - Yoshikawa , et al. February 12, 2	2008-02-12
Method of selecting photomask blank substrates Grant 7,329,475 - Nakatsu , et al. February 12, 2	2008-02-12
Air bag coating composition Grant 7,307,122 - Ikeno , et al. December 11, 2	2007-12-11
Preparation of organohalosilanes Grant 7,279,590 - Inukai , et al. October 9, 2	2007-10-09
Cyclic carbonate-modified organosilicon compound, non-aqueous electrolytic solution comprising same, secondary battery, and capacitor App 20070059607 - Nakanishi; Tetsuo ; et al.	2007-03-15
Liquid epoxy resin composition and semiconductor device Grant 7,169,833 - Sumita , et al. January 30, 2	2007-01-30
Electrostatic holding apparatus and method of producing the same Grant 6,272,002 - Mogi , et al. August 7, 2	2001-08-07
Platinum catalyst, its preparation, and curable organopolysiloxane composition comprising the same Grant 5,792,723 - Ikeno , et al. August 11, 1	1998-08-11
Method for preparing chitosan Grant 5,232,842 - Park , et al. August 3, 1	1993-08-03
Resin compositions for peel-off coatings comprising a film-forming polymeric resin, an organo polysiloxane and a solvent Grant 4,146,511 - Moriya , et al. March 27, 1	1979-03-27

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