loadpatents
name:-1.4383938312531
name:-0.061849117279053
name:-0.0061190128326416
SHIMOMURA; Tetsuo Patent Filings

SHIMOMURA; Tetsuo

Patent Applications and Registrations

Patent applications and USPTO patent grants for SHIMOMURA; Tetsuo.The latest application filed is for "tire maintenance management device and tire maintenance system".

Company Profile
0.31.23
  • SHIMOMURA; Tetsuo - Itami-shi JP
  • Shimomura; Tetsuo - Osaka JP
  • SHIMOMURA; Tetsuo - Osaka-shi JP
  • Shimomura; Tetsuo - Ohtsu N/A JP
  • Shimomura; Tetsuo - Otsu JP
  • Shimomura; Tetsuo - Shiga JP
  • Shimomura; Tetsuo - Ohtsu-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Tire Maintenance Management Device And Tire Maintenance System
App 20210166503 - SHIMOMURA; Tetsuo ;   et al.
2021-06-03
Polishing pad
Grant 9,358,661 - Nakai , et al. June 7, 2
2016-06-07
Polishing pad
Grant 9,018,099 - Ogawa , et al. April 28, 2
2015-04-28
Polishing pad
Grant 8,993,648 - Nakai , et al. March 31, 2
2015-03-31
Polishing Pad
App 20150059253 - NAKAI; Yoshiyuki ;   et al.
2015-03-05
Polishing pad and method of producing semiconductor device
Grant 8,845,852 - Nakamori , et al. September 30, 2
2014-09-30
Polishing pad
Grant 8,779,020 - Kazuno , et al. July 15, 2
2014-07-15
Polishing pad
Grant 8,530,535 - Kazuno , et al. September 10, 2
2013-09-10
Polishing Pad
App 20130005228 - Kazuno; Atsushi ;   et al.
2013-01-03
Polishing pad and method of producing the same
Grant 8,318,825 - Shimomura , et al. November 27, 2
2012-11-27
Polishing pad
Grant 8,309,466 - Ogawa , et al. November 13, 2
2012-11-13
Polishing pad
Grant 8,303,372 - Kazuno , et al. November 6, 2
2012-11-06
Polishing pad
Grant 8,304,467 - Kazuno , et al. November 6, 2
2012-11-06
Polishing pad and manufacturing method thereof
Grant 8,148,441 - Doura , et al. April 3, 2
2012-04-03
Polishing Pad
App 20110218263 - KAZUNO; Atsushi ;   et al.
2011-09-08
Polishing Pad
App 20110053377 - Ogawa; Kazuyuki ;   et al.
2011-03-03
Polishing pad
Grant 7,871,309 - Ogawa , et al. January 18, 2
2011-01-18
Polishing pad and cushion layer for polishing pad
Grant 7,762,870 - Ono , et al. July 27, 2
2010-07-27
Polishing pad and semiconductor device manufacturing method
Grant 7,731,568 - Shimomura , et al. June 8, 2
2010-06-08
Polishing Pad
App 20100048102 - Nakai; Yoshiyuki ;   et al.
2010-02-25
Grinding pad and method of producing the same
Grant 7,651,761 - Shimomura , et al. January 26, 2
2010-01-26
Polishing Pad
App 20100015893 - Kazuno; Atsushi ;   et al.
2010-01-21
Polishing Pad
App 20100003896 - Nakai; Yoshiyuki ;   et al.
2010-01-07
Polishing pad and cushion layer for polishing pad
Grant 7,641,540 - Ono , et al. January 5, 2
2010-01-05
Polishing Pad
App 20090253353 - Ogawa; Kazuyuki ;   et al.
2009-10-08
Polishing Pad
App 20090104850 - Ogawa; Kazuyuki ;   et al.
2009-04-23
Polishing Pad
App 20090093201 - Kazuno; Atsushi ;   et al.
2009-04-09
Polishing pad and method of producing the same
Grant 7,488,236 - Shimomura , et al. February 10, 2
2009-02-10
Polishing pad and method for manufacture of semiconductor device using the same
Grant 7,470,170 - Shimomura , et al. December 30, 2
2008-12-30
Polishing Pad and Manufacturing Method Thereof
App 20080085943 - Doura; Masato ;   et al.
2008-04-10
Method of producing polishing pad
Grant 7,329,170 - Ono , et al. February 12, 2
2008-02-12
Infrared absorption filter
Grant RE39,857 - Shimomura , et al. September 25, 2
2007-09-25
Infrared absorption filter
Grant RE39,858 - Shimomura , et al. September 25, 2
2007-09-25
Polishing pad and semiconductor device manufacturing method
App 20070190905 - Shimomura; Tetsuo ;   et al.
2007-08-16
Polishing pad and method for manufacture of semiconductor device using the same
App 20070178812 - Shimomura; Tetsuo ;   et al.
2007-08-02
Polishing pad, method of producing the same, and cushion layer for polishing pad
Grant 7,192,340 - Ono , et al. March 20, 2
2007-03-20
Polishing Pad And Method Of Producing The Same
App 20060280929 - SHIMOMURA; Tetsuo ;   et al.
2006-12-14
Polishing Pad And Method Of Producing The Same
App 20060280930 - SHIMOMURA; Tetsuo ;   et al.
2006-12-14
Polishing pad and cushion layer for polishing pad
App 20060148391 - Ono; Koichi ;   et al.
2006-07-06
Method of producing polishing pad
App 20060148392 - Ono; Koichi ;   et al.
2006-07-06
Polishing pad and cushion layer for polishing pad
App 20060148393 - Ono; Koichi ;   et al.
2006-07-06
Polishing pad and method for manufacturing semiconductor device
App 20060037699 - Nakamori; Masahiko ;   et al.
2006-02-23
Grinding pad and method of producing the same
App 20050064709 - Shimomura, Tetsuo ;   et al.
2005-03-24
Polishing pad, method of manufacturing the polishing pad, and cushion layer for polishing pad
App 20040055223 - Ono, Koichi ;   et al.
2004-03-25
Transparent conductive film and touch panel
Grant 6,629,833 - Ohya , et al. October 7, 2
2003-10-07
Infrared absorption filter
Grant 6,542,292 - Onomichi , et al. April 1, 2
2003-04-01
Infrared absorption filter
Grant 6,522,463 - Shimomura , et al. February 18, 2
2003-02-18
Infrared absorption filter
App 20010005278 - Onomichi, Shinya ;   et al.
2001-06-28
Ink for ink jet printer
Grant 5,837,754 - Shimomura , et al. November 17, 1
1998-11-17

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