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Patent applications and USPTO patent grants for SHIMOMOTO; Hiroshi.The latest application filed is for "substrate processing apparatus".
Patent | Date |
---|---|
Substrate Processing Apparatus App 20210394332 - YAMAGUCHI; Kuniaki ;   et al. | 2021-12-23 |
Substrate processing apparatus Grant 10,688,622 - Aono , et al. | 2020-06-23 |
Method Of Cleaning A Substrate App 20200176281 - MAEDA; Koji ;   et al. | 2020-06-04 |
Cleaning apparatus and substrate processing apparatus Grant 10,573,509 - Maeda , et al. Feb | 2020-02-25 |
Substrate cleaning apparatus and polishing apparatus Grant 10,096,492 - Maeda , et al. October 9, 2 | 2018-10-09 |
Substrate Processing Apparatus App 20180001440 - AONO; Hiroshi ;   et al. | 2018-01-04 |
Cleaning Apparatus And Substrate Processing Apparatus App 20170372893 - Maeda; Koji ;   et al. | 2017-12-28 |
Substrate cleaning apparatus and substrate cleaning method Grant 9,842,732 - Maeda , et al. December 12, 2 | 2017-12-12 |
Substrate Cleaning Apparatus And Substrate Cleaning Method App 20170271178 - MAEDA; Koji ;   et al. | 2017-09-21 |
Substrate cleaning apparatus and substrate cleaning method Grant 9,704,728 - Maeda , et al. July 11, 2 | 2017-07-11 |
Polishing Apparatus App 20150017889 - Umemoto; Masao ;   et al. | 2015-01-15 |
Substrate Cleaning Apparatus And Polishing Apparatus App 20140190530 - Maeda; Koji ;   et al. | 2014-07-10 |
Substrate Cleaning Apparatus And Polishing Apparatus App 20140190633 - Maeda; Koji ;   et al. | 2014-07-10 |
Substrate Cleaning Apparatus And Substrate Cleaning Method App 20140116466 - Maeda; Koji ;   et al. | 2014-05-01 |
Liquid supply method, liquid supply apparatus, substrate polishing apparatus, and method of measuring supply flow rate of liquid Grant 8,298,369 - Maeda , et al. October 30, 2 | 2012-10-30 |
Liquid supply method, liquid supply apparatus, substrate polishing apparatus, and method of measuring supply flow rate of liquid App 20070221615 - Maeda; Koji ;   et al. | 2007-09-27 |
Polishing liquid supply apparatus Grant 6,358,125 - Kawashima , et al. March 19, 2 | 2002-03-19 |
Pure water reusing system App 20010034190 - Tanikawa, Mutsumi ;   et al. | 2001-10-25 |
Polishing liquid supply apparatus App 20010002361 - Kawashima, Kiyotaka ;   et al. | 2001-05-31 |
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