loadpatents
name:-0.014654159545898
name:-0.0075249671936035
name:-0.005122184753418
SHIMOMOTO; Hiroshi Patent Filings

SHIMOMOTO; Hiroshi

Patent Applications and Registrations

Patent applications and USPTO patent grants for SHIMOMOTO; Hiroshi.The latest application filed is for "substrate processing apparatus".

Company Profile
4.7.12
  • SHIMOMOTO; Hiroshi - Tokyo JP
  • Shimomoto; Hiroshi - Yokohama JP
  • Shimomoto, Hiroshi - Yokohama-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Substrate Processing Apparatus
App 20210394332 - YAMAGUCHI; Kuniaki ;   et al.
2021-12-23
Substrate processing apparatus
Grant 10,688,622 - Aono , et al.
2020-06-23
Method Of Cleaning A Substrate
App 20200176281 - MAEDA; Koji ;   et al.
2020-06-04
Cleaning apparatus and substrate processing apparatus
Grant 10,573,509 - Maeda , et al. Feb
2020-02-25
Substrate cleaning apparatus and polishing apparatus
Grant 10,096,492 - Maeda , et al. October 9, 2
2018-10-09
Substrate Processing Apparatus
App 20180001440 - AONO; Hiroshi ;   et al.
2018-01-04
Cleaning Apparatus And Substrate Processing Apparatus
App 20170372893 - Maeda; Koji ;   et al.
2017-12-28
Substrate cleaning apparatus and substrate cleaning method
Grant 9,842,732 - Maeda , et al. December 12, 2
2017-12-12
Substrate Cleaning Apparatus And Substrate Cleaning Method
App 20170271178 - MAEDA; Koji ;   et al.
2017-09-21
Substrate cleaning apparatus and substrate cleaning method
Grant 9,704,728 - Maeda , et al. July 11, 2
2017-07-11
Polishing Apparatus
App 20150017889 - Umemoto; Masao ;   et al.
2015-01-15
Substrate Cleaning Apparatus And Polishing Apparatus
App 20140190530 - Maeda; Koji ;   et al.
2014-07-10
Substrate Cleaning Apparatus And Polishing Apparatus
App 20140190633 - Maeda; Koji ;   et al.
2014-07-10
Substrate Cleaning Apparatus And Substrate Cleaning Method
App 20140116466 - Maeda; Koji ;   et al.
2014-05-01
Liquid supply method, liquid supply apparatus, substrate polishing apparatus, and method of measuring supply flow rate of liquid
Grant 8,298,369 - Maeda , et al. October 30, 2
2012-10-30
Liquid supply method, liquid supply apparatus, substrate polishing apparatus, and method of measuring supply flow rate of liquid
App 20070221615 - Maeda; Koji ;   et al.
2007-09-27
Polishing liquid supply apparatus
Grant 6,358,125 - Kawashima , et al. March 19, 2
2002-03-19
Pure water reusing system
App 20010034190 - Tanikawa, Mutsumi ;   et al.
2001-10-25
Polishing liquid supply apparatus
App 20010002361 - Kawashima, Kiyotaka ;   et al.
2001-05-31

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