Shimokawa; Tsutomu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shimokawa; Tsutomu.The latest application filed is for "polymer, antimicrobial agent, disinfectant, antimicrobial material, disinfectant material, antimicrobial method, and disinfecting method".

Company Profile

1.38.38

Shimokawa; Tsutomu - Minato-ku JP
Shimokawa; Tsutomu - Tokyo JP
Shimokawa; Tsutomu - Mie JP
Shimokawa; Tsutomu - Suzuka JP
Shimokawa, Tsutomu - Suzuka-shi JP
Shimokawa; Tsutomu - Yokkaichi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Polymer, antimicrobial agent, disinfectant, antimicrobial material, disinfectant material, antimicrobial method, and disinfecting method Grant 11,384,172 - Naruse , et al. July 12, 2	2022-07-12
Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition Grant 10,415,011 - Hieda , et al. Sept	2019-09-17
Polymer, Antimicrobial Agent, Disinfectant, Antimicrobial Material, Disinfectant Material, Antimicrobial Method, And Disinfecting Method App 20180360033 - NARUSE; Hidenori ; et al.	2018-12-20
Adherend Recovery Method, Adherend Recovery Apparatus, Gas-generating Film And Resin Composition App 20160168532 - HIEDA; Katsuhiko ; et al.	2016-06-16
Radiation-sensitive resin composition Grant 9,348,226 - Nishimura , et al. May 24, 2	2016-05-24
Pattern-forming Method App 20140363773 - Nakamura; Atsushi ; et al.	2014-12-11
Pattern forming method Grant 8,450,045 - Sugita , et al. May 28, 2	2013-05-28
Radiation-sensitive resin composition Grant 8,431,324 - Shimokawa , et al. April 30, 2	2013-04-30
Compound and radiation-sensitive composition Grant 8,377,627 - Shimizu , et al. February 19, 2	2013-02-19
Method for pattern formation and resin composition for use in the method Grant 8,211,624 - Nakamura , et al. July 3, 2	2012-07-03
Radiation-sensitive Resin Composition App 20120156621 - NAKAMURA; Atsushi ; et al.	2012-06-21
Pattern Forming Method App 20120122036 - SUGITA; Hikaru ; et al.	2012-05-17
Compound and radiation-sensitive composition Grant 8,173,351 - Shimizu , et al. May 8, 2	2012-05-08
Method of forming pattern and composition for forming of organic thin-film for use therein Grant 8,173,348 - Shimizu , et al. May 8, 2	2012-05-08
Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film Grant 8,119,324 - Sugita , et al. February 21, 2	2012-02-21
Radiation-sensitive Resin Composition App 20110143279 - SHIMOKAWA; Tsutomu ; et al.	2011-06-16
Compound And Radiation-sensitive Composition App 20110117489 - Shimizu; Daisuke ; et al.	2011-05-19
Sulfonium compound Grant 7,897,821 - Nagai , et al. March 1, 2	2011-03-01
Compound App 20100324329 - Nagai; Tomoki ; et al.	2010-12-23
Radiation-sensitive Resin Composition App 20100285405 - SHIMOKAWA; Tsutomu ; et al.	2010-11-11
Compound, polymer, and radiation-sensitive composition Grant 7,812,105 - Nagai , et al. October 12, 2	2010-10-12
Method Of Forming Pattern And Composition For Forming Of Organic Thin-film For Use Therein App 20100233635 - Shimizu; Daisuke ; et al.	2010-09-16
Method For Pattern Formation And Resin Composition For Use In The Method App 20100190104 - Nakamura; Atsushi ; et al.	2010-07-29
Method Of Forming Pattern, Composition For Forming Upper-layer Film, And Composition For Forming Under-layer Film App 20090311622 - Sugita; Hikaru ; et al.	2009-12-17
Compound And Radiation-sensitive Composition App 20090274977 - Shimizu; Daisuke ; et al.	2009-11-05
Novel Compound, Polymer, and Radiation-Sensitive Composition App 20090069521 - Nagai; Tomoki ; et al.	2009-03-12
Radiation-Sensitive Resin Composition App 20080187859 - Nishimura; Isao ; et al.	2008-08-07
Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition App 20080026314 - Nishimura; Isao ; et al.	2008-01-31
Radiation sensitive resin composition Grant 7,297,461 - Nishimura , et al. November 20, 2	2007-11-20
Radiation-sensitive resin composition Grant 7,288,359 - Iwasawa , et al. October 30, 2	2007-10-30
Pattern forming method and bilayer film App 20070248911 - Iwasawa; Haruo ; et al.	2007-10-25
Pattern forming method and bilayer film Grant 7,244,549 - Iwasawa , et al. July 17, 2	2007-07-17
Radiation-sensitive resin composition Grant 7,202,016 - Miyaji , et al. April 10, 2	2007-04-10
Radiation-sensitive resin composition App 20060234154 - Nishimura; Isao ; et al.	2006-10-19
Polysiloxane, process for production thereof and radiation-sensitive resin composition Grant 7,108,955 - Iwasawa , et al. September 19, 2	2006-09-19
Radiation-sensitive composition changing in refractive index and method of changing refractive index Grant 7,108,954 - Nishimura , et al. September 19, 2	2006-09-19
Copolymer, polymer mixture, and radiation-sensitive resin composition Grant 7,105,269 - Nagai , et al. September 12, 2	2006-09-12
Acenaphthylene derivative, polymer, and antireflection film-forming composition Grant 7,037,994 - Sugita , et al. May 2, 2	2006-05-02
Radiation-sensitive resin composition Grant 6,964,840 - Nishimura , et al. November 15, 2	2005-11-15
Radiation-sensitive resin composition App 20050214680 - Miyaji, Masaaki ; et al.	2005-09-29
Radiation-sensitive resin composition Grant 6,933,094 - Miyaji , et al. August 23, 2	2005-08-23
Radiation sensitive resin composition App 20050171226 - Nishimura, Isao ; et al.	2005-08-04
Anti-reflection coating forming composition Grant 6,852,791 - Kawaguchi , et al. February 8, 2	2005-02-08
Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition Grant 6,846,895 - Iwasawa , et al. January 25, 2	2005-01-25
Anthracene derivative and radiation-sensitive resin composition Grant 6,830,868 - Nagai , et al. December 14, 2	2004-12-14
Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern Grant 6,828,078 - Nishimura , et al. December 7, 2	2004-12-07
Radiation-sensitive resin composition App 20040241580 - Nishimura, Yukio ; et al.	2004-12-02
Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same Grant 6,824,954 - Yoneda , et al. November 30, 2	2004-11-30
Radiation-sensitive resin composition Grant 6,821,705 - Nagai , et al. November 23, 2	2004-11-23
Radiation-sensitive resin composition Grant 6,800,414 - Nishimura , et al. October 5, 2	2004-10-05
Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition Grant 6,770,780 - Wang , et al. August 3, 2	2004-08-03
Polysiloxane, process for production thereof and radiation-sensitive resin composition App 20040143082 - Iwasawa, Haruo ; et al.	2004-07-22
Radiation-sensitive resin composition Grant 6,753,124 - Nishimura , et al. June 22, 2	2004-06-22
Acenaphthylene derivative, polymer, and antireflection film-forming composition App 20040034155 - Sugita, Hikaru ; et al.	2004-02-19
Radiation-sensitive composition changing in refractive index and method of changing refractive index App 20040013972 - Nishimura, Isao ; et al.	2004-01-22
Novel anthracene derivative and radiation-sensitive resin composition App 20030194634 - Nagai, Tomoki ; et al.	2003-10-16
Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition App 20030191268 - Iwasawa, Haruo ; et al.	2003-10-09
Radiation-sensitive resin composition Grant 6,623,907 - Numata , et al. September 23, 2	2003-09-23
Radiation-sensitive resin composition App 20030170561 - Iwasawa, Haruo ; et al.	2003-09-11
Copolymer, polymer mixture, and radiation-sensitive resin composition App 20030157423 - Nagai, Tomoki ; et al.	2003-08-21
Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same App 20030113660 - Yoneda, Eiji ; et al.	2003-06-19
Pattern forming method and bilayer film App 20030073040 - Iwasawa, Haruo ; et al.	2003-04-17
Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern App 20030064303 - Nishimura, Isao ; et al.	2003-04-03
N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same Grant 6,517,992 - Wang , et al. February 11, 2	2003-02-11
Radiation-sensitive resin composition App 20020192593 - Nagai, Tomoki ; et al.	2002-12-19
Anti-reflection coating forming composition App 20020086934 - Kawaguchi, Kazuo ; et al.	2002-07-04
Radiation-sensitive resin composition App 20020058201 - Miyaji, Masaaki ; et al.	2002-05-16
Radiation-sensitive resin composition App 20020009667 - Nishimura, Yukio ; et al.	2002-01-24
Radiation-sensitive resin composition App 20020009668 - Nishimura, Yukio ; et al.	2002-01-24
Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition App 20010041769 - Iwasawa, Haruo ; et al.	2001-11-15
Radiation-sensitive resin composition App 20010023050 - Numata, Jun ; et al.	2001-09-20
I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive Grant 5,110,706 - Yumoto , et al. May 5, 1	1992-05-05