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Pattern-forming Method App 20140363773 - Nakamura; Atsushi ;   et al. | 2014-12-11 |
Pattern forming method Grant 8,450,045 - Sugita , et al. May 28, 2 | 2013-05-28 |
Radiation-sensitive resin composition Grant 8,431,324 - Shimokawa , et al. April 30, 2 | 2013-04-30 |
Compound and radiation-sensitive composition Grant 8,377,627 - Shimizu , et al. February 19, 2 | 2013-02-19 |
Method for pattern formation and resin composition for use in the method Grant 8,211,624 - Nakamura , et al. July 3, 2 | 2012-07-03 |
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Compound and radiation-sensitive composition Grant 8,173,351 - Shimizu , et al. May 8, 2 | 2012-05-08 |
Method of forming pattern and composition for forming of organic thin-film for use therein Grant 8,173,348 - Shimizu , et al. May 8, 2 | 2012-05-08 |
Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film Grant 8,119,324 - Sugita , et al. February 21, 2 | 2012-02-21 |
Radiation-sensitive Resin Composition App 20110143279 - SHIMOKAWA; Tsutomu ;   et al. | 2011-06-16 |
Compound And Radiation-sensitive Composition App 20110117489 - Shimizu; Daisuke ;   et al. | 2011-05-19 |
Sulfonium compound Grant 7,897,821 - Nagai , et al. March 1, 2 | 2011-03-01 |
Compound App 20100324329 - Nagai; Tomoki ;   et al. | 2010-12-23 |
Radiation-sensitive Resin Composition App 20100285405 - SHIMOKAWA; Tsutomu ;   et al. | 2010-11-11 |
Compound, polymer, and radiation-sensitive composition Grant 7,812,105 - Nagai , et al. October 12, 2 | 2010-10-12 |
Method Of Forming Pattern And Composition For Forming Of Organic Thin-film For Use Therein App 20100233635 - Shimizu; Daisuke ;   et al. | 2010-09-16 |
Method For Pattern Formation And Resin Composition For Use In The Method App 20100190104 - Nakamura; Atsushi ;   et al. | 2010-07-29 |
Method Of Forming Pattern, Composition For Forming Upper-layer Film, And Composition For Forming Under-layer Film App 20090311622 - Sugita; Hikaru ;   et al. | 2009-12-17 |
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Novel Compound, Polymer, and Radiation-Sensitive Composition App 20090069521 - Nagai; Tomoki ;   et al. | 2009-03-12 |
Radiation-Sensitive Resin Composition App 20080187859 - Nishimura; Isao ;   et al. | 2008-08-07 |
Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition App 20080026314 - Nishimura; Isao ;   et al. | 2008-01-31 |
Radiation sensitive resin composition Grant 7,297,461 - Nishimura , et al. November 20, 2 | 2007-11-20 |
Radiation-sensitive resin composition Grant 7,288,359 - Iwasawa , et al. October 30, 2 | 2007-10-30 |
Pattern forming method and bilayer film App 20070248911 - Iwasawa; Haruo ;   et al. | 2007-10-25 |
Pattern forming method and bilayer film Grant 7,244,549 - Iwasawa , et al. July 17, 2 | 2007-07-17 |
Radiation-sensitive resin composition Grant 7,202,016 - Miyaji , et al. April 10, 2 | 2007-04-10 |
Radiation-sensitive resin composition App 20060234154 - Nishimura; Isao ;   et al. | 2006-10-19 |
Polysiloxane, process for production thereof and radiation-sensitive resin composition Grant 7,108,955 - Iwasawa , et al. September 19, 2 | 2006-09-19 |
Radiation-sensitive composition changing in refractive index and method of changing refractive index Grant 7,108,954 - Nishimura , et al. September 19, 2 | 2006-09-19 |
Copolymer, polymer mixture, and radiation-sensitive resin composition Grant 7,105,269 - Nagai , et al. September 12, 2 | 2006-09-12 |
Acenaphthylene derivative, polymer, and antireflection film-forming composition Grant 7,037,994 - Sugita , et al. May 2, 2 | 2006-05-02 |
Radiation-sensitive resin composition Grant 6,964,840 - Nishimura , et al. November 15, 2 | 2005-11-15 |
Radiation-sensitive resin composition App 20050214680 - Miyaji, Masaaki ;   et al. | 2005-09-29 |
Radiation-sensitive resin composition Grant 6,933,094 - Miyaji , et al. August 23, 2 | 2005-08-23 |
Radiation sensitive resin composition App 20050171226 - Nishimura, Isao ;   et al. | 2005-08-04 |
Anti-reflection coating forming composition Grant 6,852,791 - Kawaguchi , et al. February 8, 2 | 2005-02-08 |
Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition Grant 6,846,895 - Iwasawa , et al. January 25, 2 | 2005-01-25 |
Anthracene derivative and radiation-sensitive resin composition Grant 6,830,868 - Nagai , et al. December 14, 2 | 2004-12-14 |
Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern Grant 6,828,078 - Nishimura , et al. December 7, 2 | 2004-12-07 |
Radiation-sensitive resin composition App 20040241580 - Nishimura, Yukio ;   et al. | 2004-12-02 |
Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same Grant 6,824,954 - Yoneda , et al. November 30, 2 | 2004-11-30 |
Radiation-sensitive resin composition Grant 6,821,705 - Nagai , et al. November 23, 2 | 2004-11-23 |
Radiation-sensitive resin composition Grant 6,800,414 - Nishimura , et al. October 5, 2 | 2004-10-05 |
Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition Grant 6,770,780 - Wang , et al. August 3, 2 | 2004-08-03 |
Polysiloxane, process for production thereof and radiation-sensitive resin composition App 20040143082 - Iwasawa, Haruo ;   et al. | 2004-07-22 |
Radiation-sensitive resin composition Grant 6,753,124 - Nishimura , et al. June 22, 2 | 2004-06-22 |
Acenaphthylene derivative, polymer, and antireflection film-forming composition App 20040034155 - Sugita, Hikaru ;   et al. | 2004-02-19 |
Radiation-sensitive composition changing in refractive index and method of changing refractive index App 20040013972 - Nishimura, Isao ;   et al. | 2004-01-22 |
Novel anthracene derivative and radiation-sensitive resin composition App 20030194634 - Nagai, Tomoki ;   et al. | 2003-10-16 |
Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition App 20030191268 - Iwasawa, Haruo ;   et al. | 2003-10-09 |
Radiation-sensitive resin composition Grant 6,623,907 - Numata , et al. September 23, 2 | 2003-09-23 |
Radiation-sensitive resin composition App 20030170561 - Iwasawa, Haruo ;   et al. | 2003-09-11 |
Copolymer, polymer mixture, and radiation-sensitive resin composition App 20030157423 - Nagai, Tomoki ;   et al. | 2003-08-21 |
Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same App 20030113660 - Yoneda, Eiji ;   et al. | 2003-06-19 |
Pattern forming method and bilayer film App 20030073040 - Iwasawa, Haruo ;   et al. | 2003-04-17 |
Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern App 20030064303 - Nishimura, Isao ;   et al. | 2003-04-03 |
N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same Grant 6,517,992 - Wang , et al. February 11, 2 | 2003-02-11 |
Radiation-sensitive resin composition App 20020192593 - Nagai, Tomoki ;   et al. | 2002-12-19 |
Anti-reflection coating forming composition App 20020086934 - Kawaguchi, Kazuo ;   et al. | 2002-07-04 |
Radiation-sensitive resin composition App 20020058201 - Miyaji, Masaaki ;   et al. | 2002-05-16 |
Radiation-sensitive resin composition App 20020009667 - Nishimura, Yukio ;   et al. | 2002-01-24 |
Radiation-sensitive resin composition App 20020009668 - Nishimura, Yukio ;   et al. | 2002-01-24 |
Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition App 20010041769 - Iwasawa, Haruo ;   et al. | 2001-11-15 |
Radiation-sensitive resin composition App 20010023050 - Numata, Jun ;   et al. | 2001-09-20 |
I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive Grant 5,110,706 - Yumoto , et al. May 5, 1 | 1992-05-05 |