Shimodaira; Noriaki

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shimodaira; Noriaki.The latest application filed is for "method for manufacturing glass substrate for magnetic recording medium".

Company Profile

1.11.10

Shimodaira; Noriaki - Yokohama JP
Shimodaira; Noriaki - Tokyo JP
Shimodaira; Noriaki - Yokohama-shi JP
Shimodaira; Noriaki - Kanagawa JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Synthetic silica glass optical component and process for its production Grant 8,402,786 - Ikuta , et al. March 26, 2	2013-03-26
Glass for information recording media substrate, glass substrate for magnetic disk and magnetic disk Grant 8,119,268 - Nakashima , et al. February 21, 2	2012-02-21
Method For Manufacturing Glass Substrate For Magnetic Recording Medium App 20110189505 - ONO; Takeaki ; et al.	2011-08-04
Method for polishing glass substrate and process for producing glass substrate Grant 7,959,493 - Horie , et al. June 14, 2	2011-06-14
Glass For Information Recording Media Substrate, Glass Substrate For Magnetic Disk And Magnetic Disk App 20100330396 - NAKASHIMA; Tetsuya ; et al.	2010-12-30
Glass for information recording media substrate, glass substrate for magnetic disk and magnetic disk Grant 7,838,136 - Nakashima , et al. November 23, 2	2010-11-23
Method Of Glass Surface Fine Processing App 20100159808 - Shimodaira; Noriaki ; et al.	2010-06-24
Method For Polishing Glass Substrate And Process For Producing Glass Substrate App 20100048375 - HORIE; Mitsuru ; et al.	2010-02-25
Process For Producing Silica Glass Containing Tio2, And Optical Material For Euv Lithography Employing Silica Glass Containing Tio2 App 20090242387 - KOIKE; Akio ; et al.	2009-10-01
Glass For Information Recording Media Substrate, Glass Substrate For Magnetic Disk And Magnetic Disk App 20090110963 - NAKASHIMA; Tetsuya ; et al.	2009-04-30
Process For Producing Silica Glass Containing Tio2, And Optical Material For Euv Lithography Employing Silica Glass Containing Tio2 App 20070207911 - KOIKE; Akio ; et al.	2007-09-06
Synthetic quartz glass and process for producing it Grant 7,022,633 - Ikuta , et al. April 4, 2	2006-04-04
Wavelength-selective diffraction element and an optical head device Grant 6,891,147 - Goto , et al. May 10, 2	2005-05-10
Wavelength-selective diffraction element and an optical head device App 20040094699 - Goto, Ryuichiro ; et al.	2004-05-20
Synthetic quartz glass and process for producing it App 20030195107 - Ikuta, Yoshiaki ; et al.	2003-10-16
Exposure apparatus, semiconductor device, and photomask Grant 6,611,317 - Ogawa , et al. August 26, 2	2003-08-26
Synthetic quartz glass and method for preparing the same Grant 6,576,578 - Ikuta , et al. June 10, 2	2003-06-10
Synthetic quartz glass for optical member, process for producing the same, and method of using the same Grant 6,544,914 - Kikugawa , et al. April 8, 2	2003-04-08
Synthetic silica glass optical component and process for its production App 20030051507 - Ikuta, Yoshiaki ; et al.	2003-03-20
Electric double layer capacitor, and carbon material and electrode therefor Grant 6,038,123 - Shimodaira , et al. March 14, 2	2000-03-14

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