Shimizu; Sumito

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shimizu; Sumito.The latest application filed is for "solar cell and method for manufacturing same".

Company Profile

0.7.7

Shimizu; Sumito - Osaka JP
Shimizu; Sumito - Kyoto JP
Shimizu; Sumito - Tokyo JP
Shimizu; Sumito - Yokohama JP
Shimizu, Sumito - Yokohama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Solar cell with silicon nitride layer and method for manufacturing same Grant 9,508,888 - Shimizu , et al. November 29, 2	2016-11-29
Solar cell and method for manufacturing same Grant 9,431,555 - Shimizu , et al. August 30, 2	2016-08-30
Solar Cell And Method For Manufacturing Same App 20150007887 - SHIMIZU; Sumito ; et al.	2015-01-08
Solar Cell And Method For Manufacturing Same App 20150011043 - SHIMIZU; Sumito ; et al.	2015-01-08
Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons Grant 6,972,417 - Suganuma , et al. December 6, 2	2005-12-06
Charged-particle-beam microlithography methods exhibiting reduced coulomb effects Grant 6,756,182 - Shimizu , et al. June 29, 2	2004-06-29
Semiconductor light receiving element Grant 6,734,515 - Tadatomo , et al. May 11, 2	2004-05-11
Methods and apparatus for correcting the proximity effect in a charged-particle-beam microlithography system and devices manufactured from the same App 20030044697 - Shimizu, Sumito	2003-03-06
Charged-particle-beam microlithography methods exhibiting reduced coulomb effects App 20020187411 - Shimizu, Sumito ; et al.	2002-12-12
Method of repairing a mask with high electron scattering and low electron absorption properties Grant 6,440,615 - Shimizu August 27, 2	2002-08-27
Methods and apparatus for cleaning an object using an electron beam, and device-fabrication apparatus comprising same App 20020053353 - Kawata, Shintaro ; et al.	2002-05-09
Method for correcting opaque defects in reticles for charged-particle-beam microlithography, and reticles produced using same App 20020024011 - Shimizu, Sumito	2002-02-28
Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons App 20020012853 - Suganuma, Wakako ; et al.	2002-01-31
Light absorption measurement apparatus and methods Grant 6,108,096 - Ushio , et al. August 22, 2	2000-08-22

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