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Patent applications and USPTO patent grants for SHIMIZU; Naohiro.The latest application filed is for "electric field communication system".
Patent | Date |
---|---|
Electric Field Communication System App 20220255586 - SHINAGAWA; Mitsuru ;   et al. | 2022-08-11 |
Plasma treatment method Grant 9,415,127 - Imanishi , et al. August 16, 2 | 2016-08-16 |
Buried gate static induction thyristor Grant 9,159,820 - Yokoi , et al. October 13, 2 | 2015-10-13 |
Plasma Treatment Method App 20150217013 - IMANISHI; Yuichiro ;   et al. | 2015-08-06 |
Semiconductor device and method for producing the same Grant 9,048,281 - Shimizu , et al. June 2, 2 | 2015-06-02 |
Plasma treating apparatus Grant 8,545,765 - Shionoya , et al. October 1, 2 | 2013-10-01 |
Semiconductor Device And Method For Producing The Same App 20130214327 - SHIMIZU; Naohiro ;   et al. | 2013-08-22 |
Semiconductor Device App 20130161690 - YOKOI; Shoji ;   et al. | 2013-06-27 |
Semiconductor Device App 20130161691 - YOKOI; Shoji ;   et al. | 2013-06-27 |
Gas reforming device Grant 8,454,899 - Shimizu , et al. June 4, 2 | 2013-06-04 |
Plasma igniter and ignition device for internal combustion engine Grant 8,418,668 - Shimizu April 16, 2 | 2013-04-16 |
Plasma processing methods for inactivating toxins Grant 8,241,580 - Shimizu , et al. August 14, 2 | 2012-08-14 |
Plasma Treating Apparatus App 20120199286 - SHIONOYA; Wataru ;   et al. | 2012-08-09 |
Plasma processing apparatus App 20110135536 - Shimizu; Naohiro ;   et al. | 2011-06-09 |
Gas Reforming Device App 20110135542 - SHIMIZU; Naohiro ;   et al. | 2011-06-09 |
Plasma Reactor App 20100329940 - TAKAHASHI; Michio ;   et al. | 2010-12-30 |
Sterilization/Aseptization Apparatus App 20100221155 - Shimizu; Naohiro ;   et al. | 2010-09-02 |
Plasma igniter and ignition device for internal combustion engine App 20100212620 - SHIMIZU; Naohiro | 2010-08-26 |
Surface treatment apparatus App 20080245478 - Hotta; Eiki ;   et al. | 2008-10-09 |
surface treatment apparatus App 20080193330 - Hotta; Eiki ;   et al. | 2008-08-14 |
Plasma processing apparatus App 20080159925 - Shimizu; Naohiro ;   et al. | 2008-07-03 |
Junction-gate type static induction thyristor and high-voltage pulse generator using such junction-gate type static induction thyristor Grant 7,332,749 - Shimizu , et al. February 19, 2 | 2008-02-19 |
Junction-gate type static induction thyristor and high-voltage pulse generator using such junction-gate type static induction thyristor App 20050218423 - Shimizu, Naohiro ;   et al. | 2005-10-06 |
Method of treating substance and apparatus for carrying out the same Grant 6,767,434 - Imanishi , et al. July 27, 2 | 2004-07-27 |
Semiconductor device with reverse conducting faculty App 20010023963 - Iida, Katsuji ;   et al. | 2001-09-27 |
Reverse conducting thyristor with a planar-gate, buried-gate, or recessed-gate structure Grant 5,682,044 - Tamamushi , et al. October 28, 1 | 1997-10-28 |
Static induction semiconductor device with a distributed main electrode structure and static induction semiconductor device with a static induction main electrode shorted structure Grant 5,418,376 - Muraoka , et al. May 23, 1 | 1995-05-23 |
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