loadpatents
name:-0.10710477828979
name:-0.043426990509033
name:-0.013949871063232
Shimizu; Akitaka Patent Filings

Shimizu; Akitaka

Patent Applications and Registrations

Patent applications and USPTO patent grants for Shimizu; Akitaka.The latest application filed is for "etching method and etching apparatus".

Company Profile
12.39.59
  • Shimizu; Akitaka - Nirasaki JP
  • SHIMIZU; Akitaka - Nirasaki City JP
  • Shimizu; Akitaka - Yamanashi JP
  • Shimizu; Akitaka - Miyagi JP
  • Shimizu; Akitaka - Wakayama JP
  • SHIMIZU; Akitaka - Wakayama-shi JP
  • Shimizu; Akitaka - Nirasaki-shi JP
  • Shimizu; Akitaka - Kurokawa-gun JP
  • Shimizu; Akitaka - Yamanashi-Ken JP
  • Shimizu; Akitaka - Osaka JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Etching method and etching device
Grant 11,443,952 - Shimizu , et al. September 13, 2
2022-09-13
Etching Method And Etching Apparatus
App 20220189783 - SHIMIZU; Akitaka ;   et al.
2022-06-16
Substrate processing apparatus
Grant 11,328,904 - Doba , et al. May 10, 2
2022-05-10
Etching Method, Method Of Removing Etching Residue, And Storage Medium
App 20210358761 - TAKAHASHI; Nobuhiro ;   et al.
2021-11-18
Etching method and etching apparatus
Grant 11,024,514 - Abe , et al. June 1, 2
2021-06-01
Etching Method and Etching Device
App 20210151326 - SHIMIZU; Akitaka ;   et al.
2021-05-20
Substrate processing apparatus and substrate processing method
Grant 10,985,029 - Ogawa , et al. April 20, 2
2021-04-20
Method of cleaning plasma processing apparatus
Grant 10,975,468 - Kishi , et al. April 13, 2
2021-04-13
Substrate Processing Method, Substrate Processing Apparatus And Substrate Processing System
App 20210104412 - HADA; Keiko ;   et al.
2021-04-08
Etching Method, Damage Layer Removal Method, And Storage Medium
App 20210090896 - SHIMIZU; Akitaka
2021-03-25
Substrate processing method
Grant 10,923,358 - Imai , et al. February 16, 2
2021-02-16
Substrate processing apparatus and substrate processing method
Grant 10,923,329 - Nishimura , et al. February 16, 2
2021-02-16
Substrate processing method, substrate processing apparatus and substrate processing system
Grant 10,903,083 - Hada , et al. January 26, 2
2021-01-26
Substrate Processing Apparatus
App 20200321195 - DOBA; Shigeki ;   et al.
2020-10-08
Substrate processing apparatus
Grant 10,734,201 - Doba , et al.
2020-08-04
Substrate Processing Apparatus And Substrate Processing Method
App 20200118830 - OGAWA; Hiroyuki ;   et al.
2020-04-16
Substrate Processing Apparatus And Substrate Processing Method
App 20200111646 - NISHIMURA; Eiichi ;   et al.
2020-04-09
Etching Method And Etching Apparatus
App 20200035504 - ABE; Takuya ;   et al.
2020-01-30
Substrate processing apparatus and substrate processing method
Grant 10,541,145 - Ogawa , et al. Ja
2020-01-21
Substrate Processing Method
App 20190109012 - IMAI; Muneyuki ;   et al.
2019-04-11
Method for manufacturing toner for electrostatic image development
Grant 10,254,669 - Shimizu
2019-04-09
Method Of Cleaning Plasma Processing Apparatus
App 20180327901 - KISHI; Hiroki ;   et al.
2018-11-15
Substrate Processing Apparatus And Substrate Processing Method
App 20180286696 - OGAWA; Hiroyuki ;   et al.
2018-10-04
Method of cleaning plasma processing apparatus
Grant 10,053,773 - Kishi , et al. August 21, 2
2018-08-21
Substrate Processing Apparatus And Heat Shield Plate
App 20180151380 - OGAWA; Hiroyuki ;   et al.
2018-05-31
Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming system
Grant 9,984,892 - Kobayashi , et al. May 29, 2
2018-05-29
Etching method and substrate processing apparatus
Grant 9,882,124 - Nishimura , et al. January 30, 2
2018-01-30
Method For Manufacturing Toner For Electrostatic Image Development
App 20170371255 - SHIMIZU; Akitaka
2017-12-28
Oxide Film Removing Method, Oxide Film Removing Apparatus, Contact Forming Method, And Contact Forming System
App 20170338120 - Kobayashi; Takashi ;   et al.
2017-11-23
Substrate Processing Apparatus
App 20170256382 - DOBA; Shigeki ;   et al.
2017-09-07
Plasma Processing Apparatus
App 20170243725 - YAMAZAKI; Ryoji ;   et al.
2017-08-24
Substrate Processing Method, Substrate Processing Apparatus And Substrate Processing System
App 20170200618 - HADA; Keiko ;   et al.
2017-07-13
Plasma processing apparatus
Grant 9,245,776 - Himori , et al. January 26, 2
2016-01-26
Substrate cleaning apparatus and vacuum processing system
Grant 9,214,364 - Dobashi , et al. December 15, 2
2015-12-15
Method of etching copper layer and mask
Grant 9,208,997 - Nishimura , et al. December 8, 2
2015-12-08
Method Of Cleaning Plasma Processing Apparatus
App 20150247235 - KISHI; Hiroki ;   et al.
2015-09-03
Etching Method And Substrate Processing Apparatus
App 20150214474 - NISHIMURA; Eiichi ;   et al.
2015-07-30
Substrate Processing Apparatus And Substrate Processing Method
App 20150132970 - Nishimura; Eiichi ;   et al.
2015-05-14
Substrate Processing Apparatus And Substrate Processing Method
App 20150132960 - Nishimura; Eiichi ;   et al.
2015-05-14
Plasma Processing Method
App 20150083580 - SHIMIZU; Akitaka ;   et al.
2015-03-26
Plasma Etching Method And Plasma Etching Apparatus
App 20140284308 - MATSUYAMA; Shoichiro ;   et al.
2014-09-25
Method Of Etching Copper Layer And Mask
App 20140110373 - Nishimura; Eiichi ;   et al.
2014-04-24
Substrate processing method and substrate processing apparatus for performing a deposition process and calculating a termination time of the deposition process
Grant 8,642,136 - Kushibiki , et al. February 4, 2
2014-02-04
Plasma Etching Method
App 20130295774 - Shimizu; Akitaka ;   et al.
2013-11-07
Substrate processing method and substrate processing apparatus
Grant 8,383,517 - Nishimura , et al. February 26, 2
2013-02-26
Plasma etchimg method and plasma etching apparatus
Grant 8,298,957 - Sakao , et al. October 30, 2
2012-10-30
Substrate Cleaning Apparatus And Vacuum Processing System
App 20120247670 - DOBASHI; Kazuya ;   et al.
2012-10-04
Substrate processing control method and storage medium
Grant RE43,652 - Saito , et al. September 11, 2
2012-09-11
Plasma processing apparatus
Grant 8,251,011 - Yamazawa , et al. August 28, 2
2012-08-28
Component cleaning method and storage medium
Grant 8,236,109 - Moriya , et al. August 7, 2
2012-08-07
Substrate Processing Apparatus And Side Wall Component
App 20120037314 - ENDOH; Shosuke ;   et al.
2012-02-16
Plasma Etching Method And Plasma Etching Apparatus
App 20110220609 - Yaegashi; Hidetami ;   et al.
2011-09-15
Etching Method And Apparatus
App 20110217796 - Saito; Susumu ;   et al.
2011-09-08
Plasma Processing Apparatus
App 20110155322 - HIMORI; Shinji ;   et al.
2011-06-30
Method for manufacturing semiconductor device
Grant 7,897,498 - Gale , et al. March 1, 2
2011-03-01
Plasma processing method and post-processing method
Grant 7,871,532 - Shimizu , et al. January 18, 2
2011-01-18
Substrate processing control method and storage medium
Grant 7,824,931 - Saito , et al. November 2, 2
2010-11-02
Plasma etching method
Grant 7,811,939 - Kushibiki , et al. October 12, 2
2010-10-12
Substrate Processing Apparatus And Substrate Processing Method
App 20100206846 - Nishimura; Eiichi ;   et al.
2010-08-19
Component Cleaning Method And Storage Medium
App 20100154821 - MORIYA; TSUYOSHI ;   et al.
2010-06-24
Substrate Processing Method, Substrate Processing Apparatus, And Storage Medium
App 20100086670 - Kushibiki; Masato ;   et al.
2010-04-08
Substrate Processing Control Method And Storage Medium
App 20100029020 - SAITO; Susumu ;   et al.
2010-02-04
Fine pattern forming method
Grant 7,604,908 - Kushibiki , et al. October 20, 2
2009-10-20
Plasma etchimg method and plasma etching apparatus
App 20090233450 - Sakao; Yosuke ;   et al.
2009-09-17
Plasma Etching Method, Plasma Etching Apparatus, Control Program And Computer-readable Storage Medium
App 20090206053 - Shimizu; Akitaka ;   et al.
2009-08-20
Plasma processing apparatus
Grant 7,527,016 - Yamazawa , et al. May 5, 2
2009-05-05
Etching method and apparatus
Grant 7,514,277 - Saito , et al. April 7, 2
2009-04-07
Method for Manufacturing Semiconductor Device
App 20080268655 - Gale; Glenn ;   et al.
2008-10-30
Plasma etching method
Grant 7,432,172 - Shimizu , et al. October 7, 2
2008-10-07
Substrate Processing Method And Substrate Processing Apparatus
App 20080182421 - NISHIMURA; Eiichi ;   et al.
2008-07-31
Plasma Processing Apparatus
App 20070236148 - Yamazawa; Yohei ;   et al.
2007-10-11
Substrate Processing Apparatus And Side Wall Component
App 20070227663 - Endoh; Shosuke ;   et al.
2007-10-04
Etching Method And Apparatus
App 20070221258 - SAITO; Susumu ;   et al.
2007-09-27
Plasma Etching Method
App 20070224828 - KUSHIBIKI; Masato ;   et al.
2007-09-27
Substrate Processing Apparatus And Substrate Processing Method
App 20070187363 - OKA; Hiromi ;   et al.
2007-08-16
Etching method and computer storage medium storing program for controlling same
Grant 7,256,135 - Kushibiki , et al. August 14, 2
2007-08-14
Optical disk apparatus
Grant 7,242,643 - Shimizu July 10, 2
2007-07-10
Travel device
App 20070118288 - Tani; Takao ;   et al.
2007-05-24
Dry etching method
Grant 7,192,532 - Koh , et al. March 20, 2
2007-03-20
Dry etching method
Grant 7,179,752 - Shimizu , et al. February 20, 2
2007-02-20
Atmospheric transfer chamber, processed object transfer method, program for performing the transfer method, and storage medium storing the program
App 20060207971 - Moriya; Tsuyoshi ;   et al.
2006-09-21
Fine pattern forming method
App 20060204899 - Kushibiki; Masato ;   et al.
2006-09-14
Plasma processing method and post-processing method
App 20060191877 - Shimizu; Akitaka ;   et al.
2006-08-31
Plasma etching method
App 20060163202 - Shimizu; Akitaka ;   et al.
2006-07-27
Self-propelled cleaner and self-propelled traveling apparatus
App 20060132318 - Shimizu; Akitaka
2006-06-22
Cleaner with security function and travel device with security function
App 20060088204 - Shimizu; Akitaka
2006-04-27
Etching method and apparatus
App 20060057804 - Saito; Susumu ;   et al.
2006-03-16
Self-propelling cleaner
App 20060037170 - Shimizu; Akitaka
2006-02-23
Plasma processing method and post-processing method
App 20060011580 - Shimizu; Akitaka
2006-01-19
Etching method and computer storage medium storing program for controlling same
App 20050070111 - Kushibiki, Masato ;   et al.
2005-03-31
Dry etching method
App 20050045588 - Koh, Akiteru ;   et al.
2005-03-03
Dry etching method
App 20040214445 - Shimizu, Akitaka ;   et al.
2004-10-28
Optical disk apparatus
App 20040184363 - Shimizu, Akitaka
2004-09-23
Plasma processing apparatus
App 20040035365 - Yamazawa, Yohei ;   et al.
2004-02-26

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed